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公开(公告)号:JP5523242B2
公开(公告)日:2014-06-18
申请号:JP2010175611
申请日:2010-08-04
Applicant: 学校法人トヨタ学園 , 日本プラズマトリート株式会社
IPC: H05H1/24
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公开(公告)号:JP5300283B2
公开(公告)日:2013-09-25
申请号:JP2008046171
申请日:2008-02-27
Applicant: 学校法人トヨタ学園 , 日本プラズマトリート株式会社
Abstract: PROBLEM TO BE SOLVED: To provide a nitridation method (a method for nitriding a material) having low environmental loads and high efficiency. SOLUTION: The nitridation method comprises a step of irradiating a material (a glass substrate 30 having a TiO 2 film 32 on the surface thereof) with an atmospheric-pressure plasma jet 2 generated by using a gaseous raw material 40 containing nitrogen at the least. Nitrogen molecules are not only ionized but also efficiently dissociated to produce nitrogen atoms of high concentration by a high-voltage pulse discharge inside the atmospheric-pressure plasma jet 2. When the surface of the material is irradiated with the atmospheric-pressure plasma jet 2 generated by using the gaseous raw material 40 (even air can be used) containing nitrogen at the least, the surface of the material is nitrided in a short period of time by nitrogen atoms of high concentration contained in a plasma flame. COPYRIGHT: (C)2009,JPO&INPIT
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公开(公告)号:JP4420611B2
公开(公告)日:2010-02-24
申请号:JP2003056196
申请日:2003-03-03
Applicant: 学校法人トヨタ学園 , 独立行政法人産業技術総合研究所
CPC classification number: B01J19/088 , B01J2219/0879
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