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    Pattern inspection apparatus and method
    4.
    发明专利
    Pattern inspection apparatus and method 有权

    公开(公告)号：JP4235284B2

    公开(公告)日：2009-03-11

    申请号：JP23881298

    申请日：1998-08-25

    Applicant: 株式会社日立製作所

    Inventor： 朝宏 久邇 ,  博之 品田 ,  康継 宇佐見 ,  千絵 宍戸 ,  朗 嶋瀬 ,  有俊 杉本 ,  久弥 村越 ,  淳三 東 ,  麻紀 田中 ,  洋哉 越柴

    IPC: G01N23/225 ,  H01J37/28 ,  G01N21/88 ,  G01N21/93 ,  G01N21/956 ,  G06T1/00 ,  G06T7/00 ,  H01J37/22 ,  H01L21/66

    Abstract: PROBLEM TO BE SOLVED: To realize a high speed inspection by deciding inspection parameters so that inspection sensitivity with a plurality of inspection optical systems becomes a similar level, based on image quality evaluation results. SOLUTION: When an image is evaluated, an image signal 9 of an evaluation sample or an inspection objective sample is inputted, evaluated with an image evaluation part 33, and an image quality evaluation result is sent to a whole control part 12. The whole control part 12 synthetically evaluates the results of the evaluation similarly conducted in each microscope part, and based on the evaluation results, a processing pattern in each microscope part is decided. An image obtained is inspected, defective information is compared, and fine adjustment of a parameter is conducted. If many small defectives are outputted to the microscope part which is decided that inspection sensitivity is high, an input filter or a threshold value is changed to reduce sensitivity. When many pieces of defective information are outputted to the results of the microscope part where is previously evaluated so that noise is much, the threshold value is raised. As a result of fine adjustment, if the inspection sensitivity in all the microscope part becomes a similar level, inspection is conducted in that condition.

    Appearance inspection method and apparatus
    6.
    发明专利
    Appearance inspection method and apparatus 失效

    公开(公告)号：JP4016472B2

    公开(公告)日：2007-12-05

    申请号：JP279398

    申请日：1998-01-09

    Applicant: 株式会社日立製作所

    Inventor： 朝宏 久邇 ,  俊二 前田 ,  千絵 宍戸 ,  高志 広井 ,  淳三 東 ,  幸雄 松山 ,  麻紀 田中 ,  裕治 高木

    IPC: G01B11/30 ,  G01N21/956 ,  G01B15/04 ,  G01B15/08 ,  G01N21/88 ,  G01N21/93 ,  G01N23/225 ,  G01R31/302 ,  H01J37/22 ,  H01L21/66

    Abstract: PROBLEM TO BE SOLVED: To eliminate an erroneous detection by correcting uneven density and distortions of two images containing patterns which should be originally identical and comparing the both to detect and discriminate parts differing from each other as defects. SOLUTION: Images f (x, y) and g (x, y) from an image memory section are inputted by a roughly positioning circuit 21 to be roughly positioned. An uneven density correction circuit 22 receiving the results inputted corrects uneven density values of the patterns which should be originally identical and reduces any uneven density difference existing at parts without defect to such an extent that the difference can be recognized to be normal. Then, to remove effect by unsteady distortions of the images, positional deviations are corrected by a distortion correcting circuit 23 so that any distortion of the images will not be detected and discriminated as defects. The two images subjected to the correction of the distortions further undergoes a highly accurate positioning with a precisely positioning circuit 24. A density circuit 25 performs a comparison processing of the images thus finished with the correction of the uneven density and distortions and the positioning and any different part therebetween is detected and discriminated as defect. This eliminates erroneous detection, thereby enabling highly reliable detection of fine defects.

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