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公开(公告)号:JP5468496B2
公开(公告)日:2014-04-09
申请号:JP2010188836
申请日:2010-08-25
Applicant: 株式会社東芝
IPC: H01L21/3205 , H01L21/321 , H01L21/768 , H01L23/522 , H01L23/532
CPC classification number: H01L21/76879 , H01L21/28556 , H01L21/76876 , H01L21/76883 , H01L23/53276 , H01L2221/1094 , H01L2924/0002 , H01L2924/00
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公开(公告)号:JP4799623B2
公开(公告)日:2011-10-26
申请号:JP2009008437
申请日:2009-01-19
Applicant: 富士通セミコンダクター株式会社 , 株式会社東芝
IPC: C01B31/02
CPC classification number: H01J37/32422 , B82Y30/00 , B82Y40/00 , C01B32/16 , C23C16/02 , C23C16/26 , H01J37/32357
Abstract: In the growth of carbon nanotubes, the aggregation of catalytic fine particles therefor is a problem. In order to realize the growth of carbon nanotubes into a high density, the carbon nanotube growing process includes a first plasma treatment step of treating a surface having catalytic fine particles with a plasma species generated from a gas which contains at least hydrogen or a rare gas without carbon element, a second plasma treatment step of forming a carbon layer on the surface of the catalytic fine particles by a plasma generated from a gas which contains at least a hydrocarbon after the first plasma treatment step, and a carbon nanotube growing step of growing carbon nanotubes by use of a plasma generated from a gas which contains at least a hydrocarbon after the second plasma treatment step.
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公开(公告)号:JP4267652B2
公开(公告)日:2009-05-27
申请号:JP2006251810
申请日:2006-09-15
Applicant: 株式会社東芝
CPC classification number: H01J61/0732 , H01J9/04 , H01J9/247 , H01J61/0735 , H01J61/12 , H01J61/302 , H01J61/82 , H01J61/827
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公开(公告)号:JP3889411B2
公开(公告)日:2007-03-07
申请号:JP2004162102
申请日:2004-05-31
Applicant: 株式会社東芝
IPC: H01J61/06 , H01J1/00 , H01J1/05 , H01J1/14 , H01J1/308 , H01J61/067 , H01J61/073
CPC classification number: H01J1/308 , H01J61/0677 , H01J61/0737
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公开(公告)号:JP4869362B2
公开(公告)日:2012-02-08
申请号:JP2009017687
申请日:2009-01-29
Applicant: 株式会社東芝
IPC: H01L23/522 , C01B31/02 , H01L21/28 , H01L21/285 , H01L21/768
Abstract: PROBLEM TO BE SOLVED: To provide a method of manufacturing a carbon nanotube on a CoWP. SOLUTION: The method of manufacturing a carbon nanotube wiring structure includes: a plasma treatment step of plasma-treating a plating layer containing Co on a Cu wiring; an auxiliary catalyst providing step of providing an auxiliary catalyst for growing carbon nanotube to the Co-contained plating layer before or after the plasma treatment step; a heat treatment step of heat-treating the Co-contained plating layer and the auxiliary catalyst provided to the Co-contained plating layer after the plasma treatment step and the auxiliary catalyst providing step; and a carbon nanotube growing step in a plasma CVD method after the heat treatment step. COPYRIGHT: (C)2010,JPO&INPIT
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