Light controlling part and forming method thereof
    1.
    发明专利
    Light controlling part and forming method thereof 有权
    光控部分及其形成方法

    公开(公告)号:JP2002372690A

    公开(公告)日:2002-12-26

    申请号:JP2001181854

    申请日:2001-06-15

    摘要: PROBLEM TO BE SOLVED: To provide a method which easily manufactures a photonic crystal which becomes a light controlling part on the edge surface of an optical fiber. SOLUTION: The edge surface 7a of the optical fiber 7 and the edge surface 8a of the optical fiber 8 are arranged in a V groove 23 of a base 21 so as to be opposed to each other leaving a prescribed interval. A solution 27 which contains fine particles which come to the material of the photonic crystal is dropped into a space part 25 which is formed by the edge surface 7a, edge surface 8a and V groove 23. In such a manner, the photonic crystal is grown from each of the edge surfaces 7a and 8a and, thereby, the light controlling part which contains the photonic crystal 2 is formed on each of the edge surfaces 7a, 8a.

    摘要翻译: 要解决的问题:提供一种在光纤的边缘表面上容易地制造成为光控制部件的光子晶体的方法。 解决方案:将光纤7的边缘表面7a和光纤8的边缘表面8a布置在基座21的V形槽23中,以便彼此相对留出规定的间隔。 包含进入光子晶体材料的细颗粒的溶液27落入由边缘表面7a,边缘表面8a和V沟槽23形成的空间部分25中。以这种方式,使光子晶体生长 从每个边缘表面7a和8a以及因此包含光子晶体2的光控制部分形成在每个边缘表面7a,8a上。

    応力表示部材および応力表示部材を用いたひずみ測定方法
    2.
    发明专利
    応力表示部材および応力表示部材を用いたひずみ測定方法 审中-公开
    使用应力显示构件和应力显示构件应变的测量方法

    公开(公告)号:JPWO2015030176A1

    公开(公告)日:2017-03-02

    申请号:JP2015534328

    申请日:2014-08-29

    摘要: 本発明により、選択反射層を含み、上記選択反射層は重合性液晶化合物を含む液晶組成物の硬化により得られるコレステリック液晶層を含み、上記選択反射層は特定の波長域で右円偏光または左円偏光のいずれか一方のセンスの円偏光を選択的に反射する層である応力表示部材、または複屈折性層および任意に円偏光分離層をさらに含む上記応力表示部材、ならびに上記いずれかの応力表示部材を用いて行われるひずみ測定方法が提供される。本発明の応力表示部材により、大面積の対象物に生じるひずみを安価に測定、可視化するとともに、測定精度が高いひずみ測定が可能である。

    摘要翻译: 本发明包括一选择性反射层,所述选择性反射层包括通过固化含有可聚合液晶化合物的液晶组合物得到的胆甾型液晶层,选择性反射层是右圆偏振光或左在特定波长范围内 无论是圆的感觉是,选择性地反射偏振光应力显示构件或双折射层和应力显示部件任选地还包含圆偏振光分离层,所述圆偏振光和应力的一种的层, 通过使用显示部件进行应变测量方法。 本发明的应力显示部件,低成本的措施应变发生大面积的对象,以及可视化,能够测量的高应变的测量精度的。

    Calcium fluoride (CaF2) stress plate and a method for making the same

    公开(公告)号:JP4210058B2

    公开(公告)日:2009-01-14

    申请号:JP2001550056

    申请日:2000-12-21

    摘要: A calcium fluoride (CaF2) stress plate provides a predetermined amount of optical delay. The CaF2 stress plate has surfaces that lie in CaF2 cubic planes, and delays an optical wavefront that is incident to a set of cubic planes along a transmission axis. To implement the desired delay, the CaF2 stress plate has a first index of refraction that is seen by a first field component of the optical wavefront, and a second index of refraction that is seen by a second field component of the optical wavefront. The optical delay of the stress plate is proportional to the differences between the two indexes of refraction. Embodiments of the invention include a method of fabricating the CaF2 stress plate from a sample of CaF2 material. The method includes the step of determining the orientation of the cubic planes for the CaF2 sample, as the sample is typically oriented along the cleave planes. Next, the sample is processed to generate a CaF2 plate whose surfaces are oriented in CaF2 cubic planes. Next, a compressive or tensile force is applied perpendicular to at least one pair of cubic plane surfaces and perpendicular to the transmission axis for the incident optical wavefront. The compressive/tensile force has the effect of changing the index of refraction for electromagnetic fields that are oriented along the direction of the force vector from the characteristic index of refraction for CaF2. After which, the CaF2 stress plate effectively has two indexes of refraction, where the amount optical delay is proportional to the difference between the indexes of refraction. Next, the amount of optical delay is measured to determine if the measured delay is sufficiently close to the specified delay. If it is not, then more compression or stress can be applied until the desired delay is achieved. In alternate embodiment, shear forces are applied to the CaF2 plate instead of compressive or tensile forces. The shear forces are applied along mechanical surfaces that are rotated 45 degrees to the CaF cubic planes of the plate. As with the compressive/tensile forces, the shear forces operate to change the index of refraction of the CaF2 plate in the direction of a resultant force vector.