Abstract:
PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition having an excellent pattern profile and focal depth margin even if a pattern is formed directly using a high-reflection substrate without an antireflection film, and suited for implantation, and to provide a pattern forming method.SOLUTION: The actinic ray-sensitive or radiation-sensitive resin composition includes: (A) a resin containing at least a type of repeating unit represented by general formulas (PG1), (PG2), and (PG3), and a lactone structure; (B) a photo-acid-generating agent; and (C) solvent.
Abstract:
PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition which is excellent in the temporal stability of line width of a pattern, and an actinic ray-sensitive or radiation-sensitive film using the composition and a pattern formation method.SOLUTION: An actinic ray-sensitive or radiation-sensitive resin composition contains (A) a resin which is decomposed by the action of an acid to thereby exhibit increased solubility in an alkali developer and (B) a compound represented by the following general formula (1-1).
Abstract:
PROBLEM TO BE SOLVED: To provide a compound suitable as an acid generator for resist composition, an acid generator made from the compound, a resist composition including the acid generator, and a method for forming a resist pattern using the resist composition.SOLUTION: The present invention relates to an acid generator comprising a compound expressed by the general formula (b1), and a resist composition comprises: a base component whose solubility in an alkali developing solution changes by an action of acid; and the acid generator component generating acid by light exposure that is a compound expressed by the formula (b1). In the formula, Rrepresents a hydrogen atom, a linear, a branched or a cyclic alkyl group having 1 to 10 carbon atoms or heterocyclic group; Rrepresents a linear or a branched alkyl group having 1 to 10 carbon atoms; x represents an integer of 0 to 6; n represents an integer of 0 to 3; and Xrepresents an anion.
Abstract:
Perfluoropolyether lubricants containing sulphonylfluoride groups pending along the perfluoropolyether chain and having the following formula: wherein: T are end groups selected from -CF2X (X=F,CF3,Cl), -C3F7, -COF, -CF(CF3)COF, -CF2COF, -CF2COCF3; d,e,f,h are integers; a,b,c can be zero or integers; said units are statistically distributed along the chain, being a+b+c+d+e+f+h such that the number average molecular weight ranges from 500 to 5x10 , preferably from 1,000 to 50,000.
Abstract:
PROBLEM TO BE SOLVED: To provide an acid generator comprising a new compound, a resist composition containing the acid generator, and to provide a method for forming a resist pattern that uses the resist composition. SOLUTION: The resist composition contains a base material in which the solubility with respect to alkaline developer changes through the action of an acid, and a photoacid generator. The photoacid generator comprises a compound represented by formula (b1-1), and in the formula, Y 10 is a cyclic hydrocarbon group whose number of carbons is 5 or more and represents an acid-dissociable group; R 6 and R 7 are each a hydrogen atom, an alkyl group or an aryl group which may combine together, to form a ring; Y 11 and Y 12 are each an alkyl group or an aryl group which may combine together, to form a ring; and X - is an anion. COPYRIGHT: (C)2011,JPO&INPIT
Abstract translation:要解决的问题:提供一种含有新化合物的酸发生剂,含有酸产生剂的抗蚀剂组合物,并提供一种形成使用抗蚀剂组合物的抗蚀剂图案的方法。 解决方案:抗蚀剂组合物含有其中相对于碱性显影剂的溶解度通过酸的作用而变化的基材和光酸产生剂。 光酸产生剂含有式(b1-1)所示的化合物,式中,Y“SP”是碳原子数为5以上且表示酸解离基的环状烃基, R 6和R 7各自是可以结合在一起形成环的氢原子,烷基或芳基; Y 11 SP>和Y - SP>是阴离子。 版权所有(C)2011,JPO&INPIT
Abstract:
PROBLEM TO BE SOLVED: To provide a method for producing a nanocarbon derivative which is a nanocarbon derivative comprising nanocarbon and -SO 2 X (X is a halogen atom ) or -SO 3 H connected by perfluoroalkylene groups and containing perfluoroalkylene groups of various carbon numbers. SOLUTION: The method for producing a nanocarbon derivative comprises reacting a diacyl peroxide containing -R f -SO 2 X (R f is a perfluoroalkylene group which may contain an ethereal oxygen group; X is a halogen atom) with nanocarbon to give a nanocarbon derivative containing -R f -SO 2 X. COPYRIGHT: (C)2007,JPO&INPIT