Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film using the same, and pattern forming method
    2.
    发明专利
    Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film using the same, and pattern forming method 有权
    化学敏感性或辐射敏感性树脂组合物,使用它们的丙烯酸敏感或辐射敏感性膜,以及图案形成方法

    公开(公告)号:JP2013025050A

    公开(公告)日:2013-02-04

    申请号:JP2011159325

    申请日:2011-07-20

    Inventor: IWATO KAORU

    Abstract: PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition having an excellent pattern profile and focal depth margin even if a pattern is formed directly using a high-reflection substrate without an antireflection film, and suited for implantation, and to provide a pattern forming method.SOLUTION: The actinic ray-sensitive or radiation-sensitive resin composition includes: (A) a resin containing at least a type of repeating unit represented by general formulas (PG1), (PG2), and (PG3), and a lactone structure; (B) a photo-acid-generating agent; and (C) solvent.

    Abstract translation: 要解决的问题:即使使用没有抗反射膜的高反射基板直接形成图案,也可以提供具有优异的图案轮廓和焦距深度余量的光化射线敏感或辐射敏感性树脂组合物,并且适合 用于植入,并提供图案形成方法。 光敏射线敏感性树脂组合物包含:(A)含有至少一种由通式(PG1),(PG2)和(PG3)表示的重复单元的树脂,和 内酯结构; (B)光酸生成剂; 和(C)溶剂。 版权所有(C)2013,JPO&INPIT

    Resist composition, method for forming resist pattern, novel compound and acid generator
    4.
    发明专利
    Resist composition, method for forming resist pattern, novel compound and acid generator 审中-公开
    抗蚀剂组合物,形成抗蚀剂图案,新型化合物和酸产生剂的方法

    公开(公告)号:JP2012022212A

    公开(公告)日:2012-02-02

    申请号:JP2010161090

    申请日:2010-07-15

    Abstract: PROBLEM TO BE SOLVED: To provide a compound suitable as an acid generator for resist composition, an acid generator made from the compound, a resist composition including the acid generator, and a method for forming a resist pattern using the resist composition.SOLUTION: The present invention relates to an acid generator comprising a compound expressed by the general formula (b1), and a resist composition comprises: a base component whose solubility in an alkali developing solution changes by an action of acid; and the acid generator component generating acid by light exposure that is a compound expressed by the formula (b1). In the formula, Rrepresents a hydrogen atom, a linear, a branched or a cyclic alkyl group having 1 to 10 carbon atoms or heterocyclic group; Rrepresents a linear or a branched alkyl group having 1 to 10 carbon atoms; x represents an integer of 0 to 6; n represents an integer of 0 to 3; and Xrepresents an anion.

    Abstract translation: 要解决的问题:提供适合作为抗蚀剂组合物的酸发生剂的化合物,由该化合物制成的酸发生剂,包含酸产生剂的抗蚀剂组合物和使用该抗蚀剂组合物形成抗蚀剂图案的方法。 解决方案:本发明涉及一种含有由通式(b1)表示的化合物的酸产生剂,抗蚀剂组合物包括:其在碱性显影液中的溶解度随酸的作用而变化的碱成分; 酸产生剂组分通过曝光产生酸,其是由式(b1)表示的化合物。 式中,R 1表示氢原子,碳原子数为1〜10的直链状,支链状或环状的烷基或杂环基; R 2表示具有1〜10个碳原子的直链或支链烷基; x表示0〜6的整数, n表示0〜3的整数, 并且X - 表示阴离子。 版权所有(C)2012,JPO&INPIT

    Resist composition, method for forming resist pattern, new compound and acid generator
    6.
    发明专利
    Resist composition, method for forming resist pattern, new compound and acid generator 有权
    耐蚀组合物,形成耐火图案的方法,新化合物和酸发生器

    公开(公告)号:JP2011043783A

    公开(公告)日:2011-03-03

    申请号:JP2009257072

    申请日:2009-11-10

    Abstract: PROBLEM TO BE SOLVED: To provide an acid generator comprising a new compound, a resist composition containing the acid generator, and to provide a method for forming a resist pattern that uses the resist composition.
    SOLUTION: The resist composition contains a base material in which the solubility with respect to alkaline developer changes through the action of an acid, and a photoacid generator. The photoacid generator comprises a compound represented by formula (b1-1), and in the formula, Y
    10 is a cyclic hydrocarbon group whose number of carbons is 5 or more and represents an acid-dissociable group; R
    6 and R
    7 are each a hydrogen atom, an alkyl group or an aryl group which may combine together, to form a ring; Y
    11 and Y
    12 are each an alkyl group or an aryl group which may combine together, to form a ring; and X
    - is an anion.
    COPYRIGHT: (C)2011,JPO&INPIT

    Abstract translation: 要解决的问题:提供一种含有新化合物的酸发生剂,含有酸产生剂的抗蚀剂组合物,并提供一种形成使用抗蚀剂组合物的抗蚀剂图案的方法。 解决方案:抗蚀剂组合物含有其中相对于碱性显影剂的溶解度通过酸的作用而变化的基材和光酸产生剂。 光酸产生剂含有式(b1-1)所示的化合物,式中,Y“SP”是碳原子数为5以上且表示酸解离基的环状烃基, R 6和R 7各自是可以结合在一起形成环的氢原子,烷基或芳基; Y 11 和Y - 是阴离子。 版权所有(C)2011,JPO&INPIT

    Method for producing nanocarbon derivative
    8.
    发明专利
    Method for producing nanocarbon derivative 审中-公开
    生产纳米碳衍生物的方法

    公开(公告)号:JP2007176843A

    公开(公告)日:2007-07-12

    申请号:JP2005375757

    申请日:2005-12-27

    Abstract: PROBLEM TO BE SOLVED: To provide a method for producing a nanocarbon derivative which is a nanocarbon derivative comprising nanocarbon and -SO
    2 X (X is a halogen atom ) or -SO
    3 H connected by perfluoroalkylene groups and containing perfluoroalkylene groups of various carbon numbers.
    SOLUTION: The method for producing a nanocarbon derivative comprises reacting a diacyl peroxide containing -R
    f -SO
    2 X (R
    f is a perfluoroalkylene group which may contain an ethereal oxygen group; X is a halogen atom) with nanocarbon to give a nanocarbon derivative containing -R
    f -SO
    2 X.
    COPYRIGHT: (C)2007,JPO&INPIT

    Abstract translation: 待解决的问题:提供一种纳米碳衍生物的制造方法,该纳米碳衍生物是纳米碳衍生物,其包含纳米碳和-SO 2 SB(X为卤素原子)或-SO 3 SB 通过全氟亚烷基连接并含有各种碳数的全氟亚烷基。 解决方案:制备纳米碳衍生物的方法包括使含有R 2的二酰基过氧化物与(R 2 = 可以含有醚氧基的全氟亚烷基; X是卤素原子)与纳米碳反应,得到含有R 2的X射线衍射的纳米碳衍生物。 版权所有(C)2007,JPO&INPIT

Patent Agency Ranking