公开(公告)号：US07826049B2

公开(公告)日：2010-11-02

申请号：US12142416

申请日：2008-06-19

申请人： Dov Furman ,  Ehud Tirosh ,  Shai Silberstein

发明人： Dov Furman ,  Ehud Tirosh ,  Shai Silberstein

IPC分类号： G01N21/00

CPC分类号： G01N21/9501 ,  G01N21/21 ,  G01N21/95623 ,  G01N2021/8825 ,  G01N2021/8848

摘要： An inspection system can support operation in multiple states. For instance, when inspecting an article, such as a semiconductor wafer, the tool can switch between imaging multiple locations using respective detectors to another operating state wherein multiple detectors operating in multiple imaging modes inspect a single location. An inspection system may combine the use of multiple detectors for multiple locations and the use of multiple viewing angles or modes for the same locations and thereby achieve high throughput. The different imaging modes can comprise, for example, different collection angles, polarizations, different spectral bands, different attenuations, different focal positions relative to the wafer, and other different types of imaging.

摘要翻译： 检查系统可以支持多种状态的操作。 例如，当检查诸如半导体晶片的物品时，工具可以使用相应的检测器在成像多个位置之间切换到另一操作状态，其中以多个成像模式操作的多个检测器检查单个位置。 检查系统可以组合使用多个检测器用于多个位置，并且对于相同位置使用多个视角或模式，从而实现高吞吐量。 不同的成像模式可以包括例如不同的收集角，极化，不同的光谱带，不同的衰减，相对于晶片的不同焦点位置以及其它不同类型的成像。

公开(公告)号：US07796807B2

公开(公告)日：2010-09-14

申请号：US12354555

申请日：2009-01-15

申请人： David Alumot ,  Gad Neumann ,  Rivka Sherman ,  Ehud Tirosh

发明人： David Alumot ,  Gad Neumann ,  Rivka Sherman ,  Ehud Tirosh

IPC分类号： G06K9/00 ,  G06K9/62

CPC分类号： G01N21/9501 ,  G01N21/94 ,  G01N21/956 ,  G01N2021/8822 ,  G01N2021/8825 ,  G01N2021/8854 ,  G01N2021/8861 ,  G01N2021/8864 ,  G01N2021/8867 ,  G01N2021/887

摘要： A method and apparatus for inspecting the surface of articles, such as chips and wafers, for defects, includes a first phase of optically examining the complete surface of the article inspected at a relatively high speed and with a relatively low spatial resolution, and a second phase of optically examining with a relatively high spatial resolution only the suspected locations for the presence or absence of a defect therein.

摘要翻译： 用于检查用于缺陷的物品（例如碎片和晶片）的表面的方法和装置包括以相对高的速度和相对较低的空间分辨率光学检查被检查物品的整个表面的第一阶段，以及第二阶段 以相对高的空间分辨率进行光学检查的相位只是其中存在或不存在缺陷的可疑位置。

公开(公告)号：US20090201494A1

公开(公告)日：2009-08-13

申请号：US12142416

申请日：2008-06-19

申请人： Dov Furman ,  Ehud Tirosh ,  Shai Silberstein

发明人： Dov Furman ,  Ehud Tirosh ,  Shai Silberstein

IPC分类号： G01N21/88

CPC分类号： G01N21/9501 ,  G01N21/21 ,  G01N21/95623 ,  G01N2021/8825 ,  G01N2021/8848

摘要： An inspection system can support operation in multiple states. For instance, when inspecting an article, such as a semiconductor wafer, the tool can switch between imaging multiple locations using respective detectors to another operating state wherein multiple detectors operating in multiple imaging modes inspect a single location. An inspection system may combine the use of multiple detectors for multiple locations and the use of multiple viewing angles or modes for the same locations and thereby achieve high throughput. The different imaging modes can comprise, for example, different collection angles, polarizations, different spectral bands, different attenuations, different focal positions relative to the wafer, and other different types of imaging.

摘要翻译： 检查系统可以支持多种状态的操作。 例如，当检查诸如半导体晶片的物品时，工具可以使用相应的检测器在成像多个位置之间切换到另一操作状态，其中以多个成像模式操作的多个检测器检查单个位置。 检查系统可以组合使用多个检测器用于多个位置，并且对于相同位置使用多个视角或模式，从而实现高吞吐量。 不同的成像模式可以包括例如不同的收集角，极化，不同的光谱带，不同的衰减，相对于晶片的不同焦点位置以及其它不同类型的成像。

公开(公告)号：US20090148033A1

公开(公告)日：2009-06-11

申请号：US12354555

申请日：2009-01-15

申请人： David Alumot ,  Gad Neumann ,  Rivka Sherman ,  Ehud Tirosh

发明人： David Alumot ,  Gad Neumann ,  Rivka Sherman ,  Ehud Tirosh

IPC分类号： G06K9/00

CPC分类号： G01N21/9501 ,  G01N21/94 ,  G01N21/956 ,  G01N2021/8822 ,  G01N2021/8825 ,  G01N2021/8854 ,  G01N2021/8861 ,  G01N2021/8864 ,  G01N2021/8867 ,  G01N2021/887

摘要： A method and apparatus for inspecting the surface of articles, such as chips and wafers, for defects, includes a first phase of optically examining the complete surface of the article inspected at a relatively high speed and with a relatively low spatial resolution, and a second phase of optically examining with a relatively high spatial resolution only the suspected locations for the presence or absence of a defect therein.

摘要翻译： 用于检查用于缺陷的物品（例如碎片和晶片）的表面的方法和装置包括以相对高的速度和相对较低的空间分辨率光学检查被检查物品的整个表面的第一阶段，以及第二阶段 以相对高的空间分辨率进行光学检查的相位只是其中存在或不存在缺陷的可疑位置。

公开(公告)号：US07518391B2

公开(公告)日：2009-04-14

申请号：US11059141

申请日：2005-02-15

申请人： Moshe Langer ,  Ehud Tirosh

发明人： Moshe Langer ,  Ehud Tirosh

IPC分类号： G01R31/26 ,  G01R31/02

CPC分类号： G01R31/2887

摘要： A method and system for defect localization including (i) receiving a test structure that includes at least one conductor that is at least partially covered by an electro-optically active material; (ii) providing an electrical signal to the conductor, so as to charge at least a portion of the conductor; and (iii) imaging the test structure to locate a defect.

摘要翻译： 一种用于缺陷定位的方法和系统，包括（i）接收包括至少部分被电光活性材料覆盖的导体的测试结构; （ii）向导体提供电信号，以对导体的至少一部分充电; 和（iii）对测试结构进行成像以定位缺陷。

公开(公告)号：US20060055911A1

公开(公告)日：2006-03-16

申请号：US10940347

申请日：2004-09-13

申请人： Ehud Tirosh ,  Gilad Almogy ,  Meir Aloni ,  Doron Meshulach

发明人： Ehud Tirosh ,  Gilad Almogy ,  Meir Aloni ,  Doron Meshulach

IPC分类号： G03B27/32 ,  G03F7/20

CPC分类号： G03F7/70291 ,  G03F7/70408

摘要： The invention provides a method and printer for printing an image that comprises at least one group of highly dense shapes, the method includes: (i) determining multiple intermediate schemes such as to allow printing corresponding intermediate images on an object; whereas at least one intermediate scheme comprises directing at least one interference pattern toward at least one location corresponding to at least one group of highly dense shapes; (ii) generating an array of light entities in response to an intermediate scheme; (iii) directing the array of light entities towards the object to form the intermediate image; and (iv) moving the object relative to the light entities while repeating the steps of generating and directing to expose the object with the image. The invention provides a system that includes: (i) means for determining multiple intermediate schemes such as to allow printing corresponding intermediate images on an object; whereas at least one intermediate scheme comprises directing at least one interference pattern towards at least one location corresponding to at least one group of highly dense shapes; (ii) a programmable optical radiation source for generating an array of light entities in response to an intermediate scheme; (iii) optics for directing the array of light entities towards the object to form the intermediate image; and (iv) a translator for moving the object relative to the light entities while repeating the steps of generating and directing to expose the object with the image.

摘要翻译： 本发明提供了一种用于打印包括至少一组高密度形状的图像的方法和打印机，所述方法包括：（i）确定多个中间方案，以允许在对象上打印相应的中间图像; 而至少一个中间方案包括将至少一个干涉图案引向至少一个对应于至少一组高度致密形状的位置; （ii）响应于中间方案产生光实体阵列; （iii）将光实体阵列引向物体以形成中间图像; 以及（iv）相对于光实体移动对象，同时重复生成并指示以图像曝光对象的步骤。 本发明提供了一种系统，其包括：（i）用于确定多个中间方案的装置，例如允许在对象上打印对应的中间图像; 而至少一个中间方案包括将至少一个干涉图案引导至对应于至少一组高密度形状的至少一个位置; （ii）可编程光辐射源，用于响应于中间方案产生光实体阵列; （iii）用于将光实体阵列引向物体以形成中间图像的光学器件; 以及（iv）用于相对于光实体移动物体的翻译器，同时重复生成并指示以图像曝光对象的步骤。

公开(公告)号：US06175645B1

公开(公告)日：2001-01-16

申请号：US09010570

申请日：1998-01-22

申请人： Emanuel Elyasaf ,  Ehud Tirosh

发明人： Emanuel Elyasaf ,  Ehud Tirosh

IPC分类号： G06K900

CPC分类号： G01N21/8806

摘要： A method and an apparatus for an optical inspection of an object, having upper and lower faces, so as to detect defects existing on the object. First and second beams of an incident radiation are produced and directed onto the object. A light component of the first incident beam, which is reflected from one face of the object, and a light component of the second incident beam, which is transmitted through the upper and lower faces of the object, are simultaneously sensed. First and second images, formed, respectively by reflected and transmitted light components are acquired and analyzed so as to provide data indicative of the defects.

摘要翻译： 一种用于对物体进行光学检查的方法和装置，具有上表面和下表面，以便检测存在于物体上的缺陷。 产生入射辐射的第一和第二光束并将其引导到物体上。 同时感测从物体的一个面反射的第一入射光束的光分量和透过物体的上表面和下表面的第二入射光束的光分量。 获取并分析通过反射和透射光分量形成的第一和第二图像，以便提供指示缺陷的数据。

公开(公告)号：US07844103B2

公开(公告)日：2010-11-30

申请号：US11549059

申请日：2006-10-12

申请人： Ehud Tirosh

发明人： Ehud Tirosh

IPC分类号： G06K9/00

CPC分类号： G06T7/0004 ,  G06T2207/10016 ,  G06T2207/10056 ,  G06T2207/10152 ,  G06T2207/30148

摘要： An automated optical inspection system includes a pulsed light source illuminating an article to be inspected thereby to generate at least one image thereof, at least one camera having a field of view, and a relative motion provider operative to provide relative motion between the camera and at least one image of at least a portion of the article. The relative motion provider may include a first continuous motion provider and a second, velocity-during-imaging-lessening motion provider. The relative motion is a superposition of a first continuous component of motion provided by the first motion provider and a second, smaller component of motion provided by the second motion provider which lessens the velocity of the at least one image relative to the camera, during imaging.

摘要翻译： 一种自动光学检查系统包括：一个脉冲光源，用于照亮待检查的物品，从而产生至少一个图像，至少一个具有视场的照相机;以及相对运动提供器，其可操作以提供相机和在相机之间的相对运动 文件的至少一部分的至少一个图像。 相对运动提供者可以包括第一连续运动提供者和第二速成像减影运动提供者。 相对运动是由第一运动提供者提供的运动的第一连续分量和第二运动提供者提供的第二运动提供者的较小分量的叠加，其在成像期间降低至少一幅图像相对于照相机的速度 。

公开(公告)号：US20080186556A1

公开(公告)日：2008-08-07

申请号：US12099709

申请日：2008-04-08

申请人： Gilad Almogy ,  Bryan C. Bolt ,  Oded Arnon ,  Boaz Kenan ,  Ehud Tirosh ,  Michael Corliss

发明人： Gilad Almogy ,  Bryan C. Bolt ,  Oded Arnon ,  Boaz Kenan ,  Ehud Tirosh ,  Michael Corliss

IPC分类号： G02B26/08

CPC分类号： G01N21/8903

摘要： Apparatus and techniques for automated optical inspection (AOI) utilizing image scanning modules with multiple objectives for each camera are provided. A scanning mechanism includes optical components to sequentially steer optical signals from each of the multiple objectives to the corresponding camera.

摘要翻译： 提供了利用每个摄像机具有多个目标的图像扫描模块的自动光学检测（AOI）的装置和技术。 扫描机构包括光学部件，以顺序地将来自多个目标中的每一个的光学信号转向对应的相机。

公开(公告)号：US20050278134A1

公开(公告)日：2005-12-15

申请号：US11059141

申请日：2005-02-15

申请人： Moshe Langer ,  Ehud Tirosh

发明人： Moshe Langer ,  Ehud Tirosh

IPC分类号： G01R31/28 ,  G06F19/00

CPC分类号： G01R31/2887

摘要： A method and system for defect localization includes: (i) receiving a test structure that includes at least one conductor that is at least partially covered by an electro-optically active material; (ii) providing an electrical signal to the conductor, so as to charge at least a portion of the conductor; and (iii) imaging the test structure to locate a defect.

摘要翻译： 用于缺陷定位的方法和系统包括：（i）接收包括至少部分被电光活性材料覆盖的导体的测试结构; （ii）向导体提供电信号，以对导体的至少一部分充电; 和（iii）对测试结构进行成像以定位缺陷。