公开(公告)号：US06175645B1

公开(公告)日：2001-01-16

申请号：US09010570

申请日：1998-01-22

申请人： Emanuel Elyasaf ,  Ehud Tirosh

发明人： Emanuel Elyasaf ,  Ehud Tirosh

IPC分类号： G06K900

CPC分类号： G01N21/8806

摘要： A method and an apparatus for an optical inspection of an object, having upper and lower faces, so as to detect defects existing on the object. First and second beams of an incident radiation are produced and directed onto the object. A light component of the first incident beam, which is reflected from one face of the object, and a light component of the second incident beam, which is transmitted through the upper and lower faces of the object, are simultaneously sensed. First and second images, formed, respectively by reflected and transmitted light components are acquired and analyzed so as to provide data indicative of the defects.

摘要翻译： 一种用于对物体进行光学检查的方法和装置，具有上表面和下表面，以便检测存在于物体上的缺陷。 产生入射辐射的第一和第二光束并将其引导到物体上。 同时感测从物体的一个面反射的第一入射光束的光分量和透过物体的上表面和下表面的第二入射光束的光分量。 获取并分析通过反射和透射光分量形成的第一和第二图像，以便提供指示缺陷的数据。

公开(公告)号：US06268093B1

公开(公告)日：2001-07-31

申请号：US09417518

申请日：1999-10-13

申请人： Boaz Kenan ,  Yair Eran ,  Avner Karpol ,  Emanuel Elyasaf ,  Ehud Tirosh

发明人： Boaz Kenan ,  Yair Eran ,  Avner Karpol ,  Emanuel Elyasaf ,  Ehud Tirosh

IPC分类号： G03F900

CPC分类号： G03F7/701 ,  G03F1/84 ,  G03F7/70125 ,  G03F7/70616 ,  G03F7/70633

摘要： A reticle inspection system for inspecting reticles can be used as an incoming inspection tool, and as a periodic and pre-exposure inspection tool. Mask shops can use it as an inspection tool compatible to their customers, and as a printable error detection tool. The inventive system detects two kinds of defects: (1) line width errors in the printed image; (2) surface defects. The line width errors are detected on the die area. The detection is performed by acquiring the image of the reticle under the same optical conditions as the exposure conditions, (i.e. wavelength, numerical aperture, sigma, and illumination aperture type) and by comparing multiple dies to find errors in the line width. Surface defects are detected all over the reticle. The detection of surface defects is performed by acquiring transmission and dark-field reflection images of the reticle and using the combined information to detect particles, and other surface defects.

摘要翻译： 可以使用用于检查掩模版的掩模版检查系统作为进入的检查工具，以及作为周期性和预曝光检查工具。 面具店可以将其用作与客户兼容的检测工具，也可以作为可打印的错误检测工具。 本发明系统检测出两种缺陷：（1）打印图像中的线宽错误; （2）表面缺陷。 在模具区域上检测线宽错误。 通过在与曝光条件（即波长，数值孔径，西格玛和照明孔径类型）相同的光学条件下获取掩模版的图像，并且通过比较多个管芯以发现线宽中的误差来执行检测。 在掩模版上遍历表面缺陷。 通过获取掩模版的透射和暗场反射图像并使用组合信息来检测颗粒和其它表面缺陷来执行表面缺陷的检测。

公开(公告)号：US07133548B2

公开(公告)日：2006-11-07

申请号：US09851779

申请日：2001-05-08

申请人： Boaz Kenan ,  Yair Eran ,  Avner Karpol ,  Emanuel Elyasaf ,  Ehud Tirosh

发明人： Boaz Kenan ,  Yair Eran ,  Avner Karpol ,  Emanuel Elyasaf ,  Ehud Tirosh

IPC分类号： G06K9/00

CPC分类号： G03F7/701 ,  G03F1/84 ,  G03F7/70125 ,  G03F7/70616 ,  G03F7/70633

摘要： A reticle inspection system for inspecting reticles can be used as an incoming inspection tool, and as a periodic and pre-exposure inspection tool. Mask shops can use it as an inspection tool compatible to their customers, and as a printable error detection tool. The inventive system detects two kinds of defects: (1) line width errors in the printed image; (2) surface defects. The line width errors are detected on the die area. The detection is performed by acquiring the image of the reticle under the same optical conditions as the exposure conditions, (i.e. wavelength, numerical aperture, sigma, and illumination aperture type) and by comparing multiple dies to find errors in the line width. Surface defects are detected all over the reticle. The detection of surface defects is performed by acquiring transmission and dark-field reflection images of the reticle and using the combined information to detect particles, and other surface defects.

摘要翻译： 可以使用用于检查掩模版的掩模版检查系统作为进入的检查工具，以及作为周期性和预曝光检查工具。 面具店可以将其用作与客户兼容的检测工具，并可作为可打印的错误检测工具。 本发明系统检测出两种缺陷：（1）打印图像中的线宽错误; （2）表面缺陷。 在模具区域上检测线宽错误。 通过在与曝光条件（即波长，数值孔径，西格玛和照明孔径类型）相同的光学条件下获取掩模版的图像，并且通过比较多个管芯以发现线宽中的误差来执行检测。 在掩模版上遍历表面缺陷。 通过获取掩模版的透射和暗场反射图像并使用组合信息来检测颗粒和其它表面缺陷来执行表面缺陷的检测。

公开(公告)号：US20060221331A1

公开(公告)日：2006-10-05

申请号：US11425101

申请日：2006-06-19

申请人： Emanuel Elyasaf ,  Haim Feldman ,  Simon Yalov ,  Eitan Lahat

发明人： Emanuel Elyasaf ,  Haim Feldman ,  Simon Yalov ,  Eitan Lahat

IPC分类号： G01N21/88

CPC分类号： G01N21/8806 ,  G01N21/956

摘要： Inspection system and method for high-throughput inspection, the system and method is capable to generate and sense transmitted and/or reflected short duration beams. According to one embodiment of the invention the transmitted and reflected short duration beams are generated and sensed simultaneously thus provide a reflected image and a transmitted image simultaneously. The reflected and transmitted short duration radiation beams are manipulated either in the frequency domain or are distinctly polarized such that they are directed to the appropriate area sensors. According to another aspect of the invention the system changes the manipulation of a short duration beam of radiation to selectively direct the short duration beam to distinct area sensors.

摘要翻译： 用于高通量检测的检测系统和方法，该系统和方法能够产生和感测传输和/或反射的短持续时间波束。 根据本发明的一个实施例，同时产生和感测发射和反射的短持续时间波束，同时提供反射图像和透射图像。 反射和发射的短持续时间的辐射束在频域中被操纵或被明显极化，使得它们被引导到适当的区域传感器。 根据本发明的另一方面，系统改变对短持续时间的射束的操纵，以选择性地将短持续时间的射束引导到不同的区域传感器。

公开(公告)号：US20060114453A1

公开(公告)日：2006-06-01

申请号：US10999227

申请日：2004-11-29

申请人： Alex Goldenshtein ,  Emanuel Elyasaf

发明人： Alex Goldenshtein ,  Emanuel Elyasaf

IPC分类号： G01N21/88

CPC分类号： G03F7/70666 ,  G01N21/956

摘要： A method for inspecting a reticle, that includes the following stages: providing a reticle designed to be exposed by light of a first wavelength during a photolithography process; defining optical characteristics of an inspection system, whereas the optical characteristics include a second wavelength that differs from the first wavelength; and configuring an inspection system in response to the defined optical characteristics. An inspection system that includes: an illumination path adapted to direct light of a second wavelength towards a reticle designed to be exposed by light of a first wavelength during a photolithography process; a collection path adapted to collect light transmitted through the reticle; whereas at least one of the illumination path and collection path is configurable such that the inspection system emulates the photolithographic process while utilizing light of the second wavelength.

摘要翻译： 一种用于检查掩模版的方法，包括以下阶段：在光刻工艺期间提供设计成被第一波长的光曝光的掩模版; 定义检查系统的光学特性，而光学特性包括不同于第一波长的第二波长; 以及响应于所定义的光学特性配置检查系统。 一种检查系统，包括：照明路径，其适于将第二波长的光引向设计成在光刻工艺期间被第一波长的光曝光的掩模版; 收集路径，其适于收集透过所述标线的光; 而照明路径和收集路径中的至少一个是可配置的，使得检查系统在利用第二波长的光的同时模拟光刻工艺。

公开(公告)号：US07355690B2

公开(公告)日：2008-04-08

申请号：US10780374

申请日：2004-02-17

申请人： Emanuel Elyasaf ,  Oren Boiman

发明人： Emanuel Elyasaf ,  Oren Boiman

IPC分类号： G01N21/00

CPC分类号： G01N21/95607 ,  G01N21/8851 ,  G06T7/001 ,  G06T7/97 ,  G06T2207/30148

摘要： During mask or reticle inspection, each region is scanned at least twice, using an overlap between each pair of consecutive frames. System contamination and camera blemishes have approximately constant frame coordinates, while mask defects have constant reticle coordinates, but inconstant scan frame coordinates. True defects are detected at different coordinates in consecutive frames with a known displacement therebetween.

摘要翻译： 在掩模或掩模版检查期间，使用每对连续帧之间的重叠来扫描每个区域至少两次。 系统污染和相机瑕疵具有近似恒定的框架坐标，而掩模缺陷具有恒定的掩模版坐标，但不确定的扫描框架坐标。 在具有已知的位移的连续帧中的不同坐标处检测到真实缺陷。

公开(公告)号：US07326901B2

公开(公告)日：2008-02-05

申请号：US10910117

申请日：2004-08-02

申请人： Emanuel Elyasaf ,  Steven R. Rogers

发明人： Emanuel Elyasaf ,  Steven R. Rogers

IPC分类号： H01L27/00

CPC分类号： G01N21/9501 ,  G01N21/8806

摘要： A system and method for inspecting an article, the system includes a spatial filter that is shaped such as to direct output beams towards predefined locations and an optical beam directing entity, for directing the multiple output beams toward multiple detector arrays. The method includes spatially filtering multiple input light beams to provide substantially aberration free output light beams; and directing the multiple output beams by an optical beam directing entity, toward multiple detector arrays.

摘要翻译： 一种用于检查制品的系统和方法，所述系统包括空间滤波器，其被成形为将输出光束引向预定位置，以及光束指导实体，用于将多个输出光束引向多个检测器阵列。 该方法包括对多个输入光束进行空间滤波以提供基本上无畸变的输出光束; 以及通过光束引导实体将多个输出光束引导到多个检测器阵列。

公开(公告)号：US06930770B2

公开(公告)日：2005-08-16

申请号：US10215972

申请日：2002-08-08

申请人： Emanuel Elyasaf ,  Haim Feldman ,  Simon Yalov ,  Eitan Lahat

发明人： Emanuel Elyasaf ,  Haim Feldman ,  Simon Yalov ,  Eitan Lahat

IPC分类号： G01N21/88 ,  G01N21/956

CPC分类号： G01N21/8806 ,  G01N21/956

摘要： Inspection system and method for high-throughput inspection, the system and method is capable to generate and sense transmitted and/or reflected short duration beams. According to one embodiment of the invention the transmitted and reflected short duration beams are generated and sensed simultaneously thus provide a reflected image and a transmitted image simultaneously. The reflected and transmitted short duration radiation beams are manipulated either in the frequency domain or are distinctly polarized such that they are directed to the appropriate area sensors. According to another aspect of the invention the system changes the manipulation of a short duration beam of radiation to selectively direct the short duration beam to distinct area sensors.

摘要翻译： 用于高通量检测的检测系统和方法，该系统和方法能够产生和感测传输和/或反射的短持续时间波束。 根据本发明的一个实施例，同时产生和感测发射和反射的短持续时间波束，同时提供反射图像和透射图像。 反射和发射的短持续时间的辐射束在频域中被操纵或被明显极化，使得它们被引导到适当的区域传感器。 根据本发明的另一方面，系统改变对短持续时间的射束的操纵，以选择性地将短持续时间的射束引导到不同的区域传感器。

公开(公告)号：US06798505B2

公开(公告)日：2004-09-28

申请号：US10436920

申请日：2003-05-12

申请人： Avner Karpol ,  Silviu Reinhorn ,  Emanuel Elyasaf ,  Shimon Yalov ,  Boaz Kenan

发明人： Avner Karpol ,  Silviu Reinhorn ,  Emanuel Elyasaf ,  Shimon Yalov ,  Boaz Kenan

IPC分类号： G01N2100

CPC分类号： G03F7/70616 ,  G01N21/4788 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/479 ,  G02B27/48 ,  G03F1/84

摘要： A method and apparatus for reducing speckle during inspection of articles used in the manufacture of semiconductor devices, including wafers, masks, photomasks, and reticles. The coherence of a light beam output by a coherent light source, such as a pulsed laser, is reduced by disposing elements in a light path. Examples of such elements include optical fiber bundles; optical light guides; optical gratings; an integrating sphere; and an acousto-optic modulator. These various elements may be combined as desired, such that light beams output by the element combinations have optical path length differences that are greater than a coherence length of the light beam output by the coherent light source.

摘要翻译： 一种用于在用于制造半导体器件（包括晶片，掩模，光掩模和掩模版）的制品的检查期间减少斑点的方法和装置。 通过在光路中设置元件来减少由相干光源（例如脉冲激光）输出的光束的相干性。 这些元件的实例包括光纤束; 光学导光板; 光栅; 积分球; 和声光调制器。 这些各种元件可以根据需要组合，使得由元件组合输出的光束具有的光路长度差大于由相干光源输出的光束的相干长度。

公开(公告)号：US5892579A

公开(公告)日：1999-04-06

申请号：US843453

申请日：1997-04-16

申请人： Emanuel Elyasaf ,  Yair Eran

发明人： Emanuel Elyasaf ,  Yair Eran

IPC分类号： G01N21/88 ,  G01N21/956 ,  G03F1/84 ,  H01L21/66

CPC分类号： G01N21/88

摘要： This invention discloses an apparatus for optically inspecting an object having upper and lower faces for indicating the condition of the object, including a lighting system periodically reflecting a beam of light from one face of the object to produce a series of short-duration time-spaced reflected beams, and periodically transmitting a beam of light through both faces of the object to produce a series of short-duration time-spaced transmitted beams time-interlaced with the reflected beams, a sensor sensing the short-duration time-spaced reflected beams and transmitted beams, and generating electrical outputs corresponding thereto, and a processor receiving the electrical outputs and processing them to provide an indication of the condition of the object.A method of optically inspecting an object having upper and lower faces for indicating the condition of the object is also described.

摘要翻译： 本发明公开了一种用于光学检查具有上表面和下表面的物体以指示物体的状态的装置，包括周期性地反射来自物体的一个面的光束的照明系统，以产生一系列短时间间隔 反射光束，并且周期性地发射光束通过物体的两个面，以产生与反射光束时间隔行的一系列短时间间隔的发射光束;传感器感测短时间间隔反射光束， 发射光束，以及产生对应于其的电输出，以及处理器，其接收电输出并对其进行处理以提供对象的状况的指示。 还描述了用于光学检查具有用于指示对象的状况的上表面和下表面的对象的方法。