Washbasin
    4.
    外观设计

    公开(公告)号:USD1014714S1

    公开(公告)日:2024-02-13

    申请号:US29771038

    申请日:2021-02-19

    申请人: LIXIL Corporation

    设计人: Hiroshi Kobayashi

    摘要: FIG. 1 is a perspective view of a washbasin, showing my new design.
    FIG. 2 is a front elevation view thereof.
    FIG. 3 is a rear elevation view thereof.
    FIG. 4 is a right side elevation view thereof.
    FIG. 5 is a left side elevation view thereof.
    FIG. 6 is a top plan view thereof.
    FIG. 7 is a bottom plan view thereof.
    FIG. 8 is a cross-sectional view taken along the Line 8-8 in FIG. 6; and,
    FIG. 9 is a cross-sectional view taken along the Line 9-9 in FIG. 6.
    The dark portions in cross-sectional FIGS. 8 and 9 form no part of the claimed design.

    Glass panel support structure
    5.
    发明授权

    公开(公告)号:US11834894B2

    公开(公告)日:2023-12-05

    申请号:US17043632

    申请日:2019-03-18

    申请人: LIXIL Corporation

    发明人: Hisashi Ishii

    摘要: A glass panel support structure supports multi-glazed glass of which a circumferential edge part is bonded to a frame that frames all sides. The glass panel support structure includes a first structural sealant that bonds an indoor-side glass plate of the multi-glazed glass and the frame over an entire circumference, and a spacer provided between glass plates of the multi-glazed glass over the entire circumference. Along a first direction perpendicular to an indoor and outdoor direction of the multi-glazed glass, a position of an inner circumferential surface of the spacer is identical with a position of an inner circumferential surface of the first structural sealant or is located on outer circumferential side with respect to position of the inner circumferential surface of the first structural sealant.

    SANITARY WASHING DEVICE
    7.
    发明申请

    公开(公告)号:US20220333365A1

    公开(公告)日:2022-10-20

    申请号:US17696534

    申请日:2022-03-16

    申请人: LIXIL Corporation

    IPC分类号: E03D9/08

    摘要: The present disclosure provides a sanitary washing device including a shutter that opens and closes an opening and a shutter washing unit that is configured to wash the front surface of the shutter, the shutter having a simple structure. A sanitary washing device includes: a shutter configured to open and close an opening formed in a functional unit; and a shutter washing unit arranged above the shutter and configured to wash a front surface of the shutter in a state in which the shutter closes the opening.

    DETERMINATION DEVICE, DETERMINATION METHOD, AND PROGRAM

    公开(公告)号:US20220237906A1

    公开(公告)日:2022-07-28

    申请号:US17611897

    申请日:2020-05-15

    申请人: LIXIL Corporation

    摘要: A determination device includes an image information acquirer configured to acquire image information of a subject image obtained by photographing an internal space of a toilet bowl in excretion; an estimator configured to perform estimation regarding a determination matter relating to excretion by inputting the image information to a learned model, the learned model having learned a correspondence relationship between an image for learning and a determination result of the determination matter relating to excretion, the learned model learned by machine learning using a neural network, the image for learning representing an internal space of a toilet bowl in excretion; and a determiner configured to perform determination regarding the determination matter of the subject image based on an estimation result obtained by the estimator.

    DEVICE FOR WATER SUPPLY
    9.
    发明申请

    公开(公告)号:US20210372100A1

    公开(公告)日:2021-12-02

    申请号:US17266840

    申请日:2019-05-24

    申请人: LIXIL Corporation

    IPC分类号: E03C1/04 C25D3/12 C25D7/04

    摘要: The purpose of the present invention is to provide a tool for water supply, which has luster and rarely undergoes the leaching out of nickel. A tool for water supply 100 which is provided with a nickel-plated layer 102 formed on a base material 101, wherein the nickel-plated layer 102 contains no sulfur component, the corrosion potential of the nickel-plated layer 102 in a leaching solution as measured against a saturated calomel electrode is −0.01 or more (preferably +0.04 V or more), and the Wa value of the nickel-plated layer 102 as measured using a WaveScan device manufactured by BYK is 5.1 or less.