公开(公告)号：US06686601B2

公开(公告)日：2004-02-03

申请号：US10307499

申请日：2002-12-02

Applicant: Adrian Murrell ,  Peter Michael Banks ,  Andrew Allen ,  Neil L. Clarke ,  Matthew Peter Dobson

Inventor： Adrian Murrell ,  Peter Michael Banks ,  Andrew Allen ,  Neil L. Clarke ,  Matthew Peter Dobson

IPC: H01J3708

CPC classification number: H01J37/08 ,  H01J37/3171

Abstract: The invention relates to an ion source for an ion implanter in which source material for providing desired ions is provided in the form of a plate or liner which can be fitted into the reactant chamber of the ion source.

公开(公告)号：US07611975B2

公开(公告)日：2009-11-03

申请号：US11527594

申请日：2006-09-27

Applicant: Adrian Murrell ,  Peter Michael Banks ,  Matthew Peter Dobson ,  Peter Kindersley ,  Takao Sakase ,  Marvin Farley ,  Shu Satoh ,  Geoffrey Ryding

Inventor： Adrian Murrell ,  Peter Michael Banks ,  Matthew Peter Dobson ,  Peter Kindersley ,  Takao Sakase ,  Marvin Farley ,  Shu Satoh ,  Geoffrey Ryding

IPC: H01L21/12 ,  H01L21/20 ,  H01J37/304 ,  H01J37/317

CPC classification number: H01J37/3171 ,  H01J37/3023 ,  H01J49/30 ,  H01J2237/20228 ,  H01J2237/20285 ,  H01J2237/2487 ,  H01J2237/30488 ,  H01J2237/31703 ,  H01J2237/31708 ,  H01L21/265 ,  H01L21/67005 ,  H01L21/68714 ,  H01L21/68764 ,  Y10S438/961

Abstract: An implanter provides two-dimensional scanning of a substrate relative to an implant beam so that the beam draws a raster of scan lines on the substrate. The beam current is measured at turnaround points off the substrate and the current value is used to control the subsequent fast scan speed so as to compensate for the effect of any variation in beam current on dose uniformity in the slow scan direction. The scanning may produce a raster of non-intersecting uniformly spaced parallel scan lines and the spacing between the lines is selected to ensure appropriate dose uniformity.

Abstract translation: 注入器提供相对于注入束的衬底的二维扫描，使得光束在衬底上绘制扫描线的光栅。 在离开衬底的周转点处测量束电流，并且使用电流值来控制随后的快速扫描速度，以补偿束电流中任何变化对慢扫描方向上的剂量均匀性的影响。 扫描可以产生不相交的均匀间隔的平行扫描线的光栅，并且选择线之间的间隔以确保适当的剂量均匀性。

公开(公告)号：US06818909B2

公开(公告)日：2004-11-16

申请号：US10703165

申请日：2003-11-07

Applicant: Adrian Murrell ,  Peter Michael Banks ,  Andrew Allen ,  Neil L. Clarke ,  Matthew Peter Dobson

Inventor： Adrian Murrell ,  Peter Michael Banks ,  Andrew Allen ,  Neil L. Clarke ,  Matthew Peter Dobson

IPC: H01J4910

CPC classification number: H01J37/08 ,  H01J37/3171

Abstract: The invention relates to an ion source for an ion implanter in which source material for providing desired ions is provided in the form of a plate or liner which can be fitted into the reactant chamber of the ion source.

Abstract translation: 本发明涉及一种用于离子注入机的离子源，其中用于提供期望离子的源材料以可装配到离子源的反应物室中的板或衬里的形式提供。