PLASMA SOURCE
    1.
    发明申请
    PLASMA SOURCE 有权
    等离子体源

    公开(公告)号:US20160005575A1

    公开(公告)日:2016-01-07

    申请号:US14765817

    申请日:2013-02-06

    Abstract: The invention relates to a plasma source (1) for depositing a coating onto a substrate (9), which is connectable to a power source (P) and includes: an electrode (2); a magnetic assembly (4) located circumferentially relative to said electrode and including a set of magnets mutually connected by a magnetic bracket (46) including a first and second central magnet (43, 44) and at least one head magnet (45); and an electrically insulating enclosure (5) arranged such as to surround the electrode and the magnets.

    Abstract translation: 本发明涉及一种用于将涂层沉积在可连接到电源(P)上的衬底(9)上的等离子体源(1),包括:电极(2); 磁性组件(4),其位于周向相对于所述电极并且包括通过包括第一和第二中心磁体(43,44)和至少一个磁头磁体(45)的磁性支架(46)相互连接的一组磁体; 以及布置成围绕电极和磁体的电绝缘外壳(5)。

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