SUBSTRATE PROCESSING APPARATUS INCLUDING ELECTROSTATIC CHUCK

    公开(公告)号:US20240352587A1

    公开(公告)日:2024-10-24

    申请号:US18635185

    申请日:2024-04-15

    Inventor: Nobuaki Tanabe

    CPC classification number: C23C16/4586 H02N13/00

    Abstract: A substrate processing apparatus including an electrostatic chuck includes a lower electrode, an upper electrode, a first AC power supply, a first filter circuit connected to the heater, an isolation transformer connected to the heater through the first filter circuit, a second AC power supply connected to the isolation transformer, an internal electrode provided in the lower electrode, a second filter circuit, and a DC power supply, in which the DC power supply is driven under constant current control, and a secondary coil of the isolation transformer is electrically floating.

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