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公开(公告)号:US12062565B2
公开(公告)日:2024-08-13
申请号:US17848824
申请日:2022-06-24
Applicant: ASM IP Holding B.V.
Inventor: Joaquin Aguilar Santillan , Hong Gao , Shanker Kuttath , ChangMin Lee
IPC: H01L21/683 , H01L21/67
CPC classification number: H01L21/6833 , H01L21/67103 , H01L21/67248
Abstract: Electrostatic chucks and methods of using electrostatic chucks are disclosed. Exemplary electrostatic chucks include a ceramic body, a heating element embedded within the ceramic body, and two or more temperature measurement devices embedded within the ceramic body. Exemplary methods include measuring temperatures within the electrostatic chuck using two or more vertically spaced-apart temperature measurement devices.
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公开(公告)号:US20240297063A1
公开(公告)日:2024-09-05
申请号:US18662796
申请日:2024-05-13
Applicant: ASM IP Holding B.V.
Inventor: Joaquin Aguilar Santillan , Hong Gao , Shanker Kuttath
IPC: H01L21/683 , H01L21/67 , H05B3/12 , H05B3/18
CPC classification number: H01L21/6833 , H01L21/67103 , H05B3/12 , H05B3/18 , H05B2203/017
Abstract: Electrostatic chucks and methods of forming electrostatic chucks are disclosed. Exemplary electrostatic chucks include a ceramic body, a device embedded within the ceramic body, and an interface layer formed overlying the device. Exemplary methods include providing ceramic precursor material within a mold, providing a device, coating the device with an interface material to form a coated device, placing the coated device on or within the ceramic precursor material, and sintering the ceramic precursor material to form the electrostatic chuck and an interface layer between the device and ceramic material formed during the step of sintering.
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3.
公开(公告)号:US20230235428A1
公开(公告)日:2023-07-27
申请号:US18100048
申请日:2023-01-23
Applicant: ASM IP Holding B.V.
Inventor: Joaquin Aguilar Santillan , Hong Gao , Shanker Kuttath , Shaofeng Chen , Gary Urban Keppers , Felix Rabinovich
IPC: C22C1/02 , C22C21/08 , B22D21/00 , H01L21/67 , H01L21/687
CPC classification number: C22C1/026 , C22C21/08 , B22D21/007 , H01L21/67167 , H01L21/68707 , H01L21/6719 , H01L21/67196 , H01L21/67201
Abstract: A substrate handling chamber body is formed from a castable aluminum alloy including a manganese (Mn) constituent and an iron (Fe) constituent. The castable aluminum alloy has a manganese (Mn) constituent-to-iron (Fe) constituent ratio that between about 1.125 and about 1.525 to limit microporosity and shrinkage porosity within the castable aluminum alloy forming the substrate handling chamber body. Semiconductor processing systems and methods of making substrate handling chamber bodies for semiconductor processing systems are also described.
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公开(公告)号:US11996312B2
公开(公告)日:2024-05-28
申请号:US17570232
申请日:2022-01-06
Applicant: ASM IP Holding B.V.
Inventor: Joaquin Aguilar Santillan , Hong Gao , Shanker Kuttath
IPC: H01T23/00 , H01L21/67 , H01L21/683 , H05B3/12 , H05B3/18
CPC classification number: H01L21/6833 , H01L21/67103 , H05B3/12 , H05B3/18 , H05B2203/017
Abstract: Electrostatic chucks and methods of forming electrostatic chucks are disclosed. Exemplary electrostatic chucks include a ceramic body, a device embedded within the ceramic body, and an interface layer formed overlying the device. Exemplary methods include providing ceramic precursor material within a mold, providing a device, coating the device with an interface material to form a coated device, placing the coated device on or within the ceramic precursor material, and sintering the ceramic precursor material to form the electrostatic chuck and an interface layer between the device and ceramic material formed during the step of sintering.
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公开(公告)号:US20230245905A1
公开(公告)日:2023-08-03
申请号:US18101656
申请日:2023-01-26
Applicant: ASM IP Holding B.V.
Inventor: Joaquin Aguilar Santillan , Shubham Garg , Hong Gao , Todd Dunn , Shanker Kuttath
CPC classification number: H01L21/67109 , H05B3/283 , G01K1/026 , B32B18/00 , B32B3/26 , B32B3/08 , H01L21/67248 , H01L21/6833 , H05B2203/005 , B32B2307/3065 , B32B2307/302
Abstract: A heater assembly having a laminate heater plate and a shaft. The laminate heater plate is formed from a plurality of layers, wherein one or more layers may comprise one or more of a heating element, an RF electrode, a cooling channel, and an RTD sensor.
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公开(公告)号:US20220223453A1
公开(公告)日:2022-07-14
申请号:US17570232
申请日:2022-01-06
Applicant: ASM IP Holding B.V.
Inventor: Joaquin Aguilar Santillan , Hong Gao , Shanker Kuttath
IPC: H01L21/683 , H01L21/67 , H05B3/12 , H05B3/18
Abstract: Electrostatic chucks and methods of forming electrostatic chucks are disclosed. Exemplary electrostatic chucks include a ceramic body, a device embedded within the ceramic body, and an interface layer formed overlying the device. Exemplary methods include providing ceramic precursor material within a mold, providing a device, coating the device with an interface material to form a coated device, placing the coated device on or within the ceramic precursor material, and sintering the ceramic precursor material to form the electrostatic chuck and an interface layer between the device and ceramic material formed during the step of sintering.
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公开(公告)号:US20230411198A1
公开(公告)日:2023-12-21
申请号:US18208421
申请日:2023-06-12
Applicant: ASM IP Holding B.V.
Inventor: Joaquin Aguilar Santillan , Hong Gao , Shanker Kuttath
IPC: H01L21/683
CPC classification number: H01L21/6833
Abstract: Various embodiment of the present technology may provide an article formed from a ceramic material. The article may further include a protective coating overlying one or more surfaces of the article. The protective coating may include a first layer including aluminum and magnesium and a second layer including alumina, or alumina and magnesium oxide.
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8.
公开(公告)号:US20230389134A1
公开(公告)日:2023-11-30
申请号:US18201601
申请日:2023-05-24
Applicant: ASM IP Holding B.V.
Inventor: ChangMin Lee , Joaquin Aguilar Santillan , Nobuaki Tanabe , Hong Gao , Shanker Kuttath
IPC: H05B3/28 , C04B35/581 , C04B35/645 , C04B37/02 , H01L21/687
CPC classification number: H05B3/283 , C04B35/581 , C04B35/645 , C04B37/023 , H01L21/68757 , C04B2235/3865 , C04B2235/3206 , C04B2235/3222 , C04B2235/612 , C04B2237/366 , C04B2237/40 , C04B2237/80 , H05B2203/016 , H05B2203/017
Abstract: A method of manufacturing a heating block includes a first step of providing a ceramic material to a mold, a second step of sintering the ceramic material and forming a plate, and a third step of machining the plate. A shaft is connected to the plate in a fourth step, and rods are bonded to the plate in a fifth step of the method. Heating blocks and semiconductor processing systems having heating blocks are also described.
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公开(公告)号:US20230013637A1
公开(公告)日:2023-01-19
申请号:US17857344
申请日:2022-07-05
Applicant: ASM IP Holding B.V.
Inventor: Joaquin Aguilar Santillan , Shanker Kuttath , Hong Gao
IPC: C23C16/458 , C04B35/581 , C23C16/455 , C04B35/505 , C04B35/64 , C23C16/40
Abstract: A substrate support structure includes a substrate support structure body formed from a ceramic composite and having a first surface, a second surface spaced apart from the first surface, and a periphery spanning the first surface and the second surface of the substrate support structure body. The first surface, the second surface, and the periphery of the substrate support structure body are defined by the ceramic composite. The ceramic composite includes two or more of a (a) an aluminum nitride (AlN) constituent, (b) an aluminum oxynitride (Al2.81O3.56N0.44, AlON) constituent, (c) an alpha-alumina (α-Al2O3) constituent, (d) a yttrium alumina garnet (Y3Al5O12, YAG) constituent, (e) a yttrium alumina monoclinic (Y4Al2O9, YAM) constituent, (f) a yttrium alumina perovskite (YAlO3, YAP) constituent, and (g) a yttrium oxide (Y2O3) constituent. Semiconductor processing systems and methods of making substrate support structures are also described.
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公开(公告)号:US20220415694A1
公开(公告)日:2022-12-29
申请号:US17848824
申请日:2022-06-24
Applicant: ASM IP Holding B.V.
Inventor: Joaquin Aguilar Santillan , Hong Gao , Shanker Kuttath , ChangMin Lee
IPC: H01L21/683 , H01L21/67
Abstract: Electrostatic chucks and methods of using electrostatic chucks are disclosed. Exemplary electrostatic chucks include a ceramic body, a heating element embedded within the ceramic body, and two or more temperature measurement devices embedded within the ceramic body. Exemplary methods include measuring temperatures within the electrostatic chuck using two or more vertically spaced-apart temperature measurement devices.
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