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公开(公告)号：US20170160652A1
公开(公告)日：2017-06-08
申请号：US15438376
申请日：2017-02-21
Applicant: ASML Holding N.V. , ASML Netherlands B.V.
Inventor： Earl William EBERT , Johannes ONVLEE , Samir A. NAYFEH , Mark Josef SCHUSTER , Peter A. DELMASTRO , Christopher Charles WARD , Frank Johannes Jacobus VAN BOXTEL , Abdullah ALIKHAN , Daniel Nathan BURBANK , Daniel Nicholas GALBURT , Justin Matthew VERDIRAME
IPC: G03F7/20
CPC classification number: G03F7/70875 , G03F7/70341 , G03F7/70716 , G03F7/70808 , G03F7/70858 , G03F7/70866
Abstract: A patterning device support for controlling a temperature of a patterning device can include a movable component. The movable component can include a gas inlet for supplying a gas flow across a surface of the patterning device and a gas outlet for extracting the gas flow. The patterning device support can also include a gas flow generator coupled to a duct, for recirculating the gas flow from the gas outlet to the gas inlet.
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Patent Agency Ranking
2.发明公开公开(公告)号：US20230324817A1
公开(公告)日：2023-10-12
申请号：US18023162
申请日：2021-07-24
Applicant: ASML Holding N.V.
Inventor： Earl William EBERT , Roxana REZVANI NARAGHI
CPC classification number: G03F9/7088 , G03F7/70625 , G03F7/70633 , G03F7/706851
Abstract: A metrology system includes a beam splitter and first and second sensors. The beam splitter splits scattered radiation scattered by a target into first and second portions of radiation. The first sensor receives the first portion. The second sensor receives the second portion after the second portion propagates along a path that includes a wedge system comprising a first wedge configured to diverge the second portion.
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公开(公告)号：US20170307986A1
公开(公告)日：2017-10-26
申请号：US15649161
申请日：2017-07-13
Applicant: ASML Holding N.V. , ASML Netherlands B.V.
Inventor： Earl William EBERT , Johannes ONVLEE , Samir A. NAYFEH , Mark Josef SCHUSTER , Peter A. DELMASTRO , Christopher Charles WARD , Frank Johannes Jacobus VAN BOXTEL , Abdullah ALIKHAN , Daniel Nathan BURBANK , Daniel Nicholas GALBURT , Justin Matthew VERDIRAME
IPC: G03F7/20
CPC classification number: G03F7/70875 , G03F7/70341 , G03F7/70716 , G03F7/70808 , G03F7/70858 , G03F7/70866
Abstract: A patterning device support for controlling a temperature of a patterning device can include a movable component. The movable component can include a gas inlet for supplying a gas flow across a surface of the patterning device and a gas outlet for extracting the gas flow. The patterning device support can also include a gas flow generator coupled to a duct, for recirculating the gas flow from the gas outlet to the gas inlet.
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公开(公告)号：US20130258316A1
公开(公告)日：2013-10-03
申请号：US13898973
申请日：2013-05-21
Applicant: ASML Holding N.V.
Inventor： Arie Jeffrey DEN BOEF , Earl William EBERT , Harry SEWELL , Keith William ANDRESEN , Sanjeev Kumar SINGH
CPC classification number: G03F7/70141 , G01B11/14 , G02F1/116 , G03F7/70191 , G03F9/7065
Abstract: A lithographic apparatus has an alignment system including a radiation source configured to convert narrow-band radiation into continuous, flat and broad-band radiation. An acoustically tunable narrow pass-band filter filters the broad-band radiation into narrow-band linearly polarized radiation. The narrow-band radiation may be focused on alignment targets of a wafer so as to enable alignment of the wafer. In an embodiment, the filter is configured to modulate an intensity and wavelength of radiation produced by the radiation source and to have multiple simultaneous pass-bands. The radiation source generates radiation that has high spatial coherence and low temporal coherence.
Abstract translation: 光刻设备具有对准系统，其包括被配置为将窄带辐射转换成连续，平坦和宽带辐射的辐射源。 声可调窄带通滤波器将宽带辐射滤波成窄带线偏振辐射。 窄带辐射可以聚焦在晶片的对准目标上，以便能够对准晶片。 在一个实施例中，滤波器被配置为调制由辐射源产生的辐射的强度和波长并且具有多个同时的通带。 辐射源产生具有高空间相干性和低时间相干性的辐射。
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公开(公告)号：US20240045346A1
公开(公告)日：2024-02-08
申请号：US18266361
申请日：2021-12-09
Applicant: ASML Holding N.V. , ASML Netherlands B.V.
IPC: G03F7/00
CPC classification number: G03F7/70925 , G03F7/70741
Abstract: A reticle stage cleaning apparatus for a reticle stage in a lithographic apparatus includes a substrate having a frontside and a backside opposite the frontside and a conductive layer disposed on the frontside of the substrate. The conductive layer is configured to contact the reticle stage to dissipate charge on the reticle stage and to remove particles on the reticle stage via an electrostatic field generated between the conductive layer and the reticle stage. The substrate can include a plurality of grooves and the conductive layer can be disposed on the frontside of the substrate and on a bottom surface of the plurality of grooves. The reticle stage cleaning apparatus can include a second conductive layer configured to remove particles on the reticle stage via a second electrostatic field and be disposed atop the conductive layer in the bottom surface of the plurality of grooves.
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6.发明申请公开(公告)号：US20170235230A1
公开(公告)日：2017-08-17
申请号：US15504621
申请日：2015-05-29
Applicant: ASML HOLDING N.V. , ASML NETHERLANDS B.V.
CPC classification number: G03F7/7085 , G01B11/14 , G03F9/7088
Abstract: A measurement apparatus including an optical system to provide illumination radiation into a spot on a periodic structure and to receive radiation redirected by the periodic structure, the optical system including a first stop to block zero order radiation from the periodic structure and allow non-zero order radiation to pass, and a second stop to block zero order radiation passing the first stop and to allow the non-zero order radiation to pass, and a radiation detector, downstream of the optical system, to receive the non-zero order radiation.
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