公开(公告)号：US20150338753A1

公开(公告)日：2015-11-26

申请号：US14409048

申请日：2013-06-13

Applicant: ASML Netherlands B.V.

Inventor： Michel RIEPEN ,  Dzmitry LEBETSKI ,  Wilbert Jan MESTROM ,  Wim Ronald KAMPINGA ,  Jan Okke NIEUWENKAMP ,  Jacob BRINKERT ,  Henricus Jozef CASTELIJNS ,  Nicolaas TEN KATE ,  Hendrikus Gijsbertus SCHIMMEL ,  Hans JANSEN ,  Dennis Jozef Maria PAULUSSEN ,  Brian Vernon VIRGO ,  Reinier Theodorus Martinus JILISEN ,  Ramin BADIE ,  Albert Pieter RIJPMA ,  Johannes Christiaan Leonardus FRANKEN ,  Peter VAN PUTTEN ,  Gerrit VAN DER STRAATEN

IPC: G03F7/20 ,  G21K5/08 ,  F15D1/00 ,  H05G2/00

CPC classification number: G03F7/70983 ,  F15D1/0065 ,  G03F7/70033 ,  G03F7/70916 ,  G21K1/06 ,  G21K5/08 ,  H05G2/005 ,  H05G2/008 ,  Y10T137/206

Abstract: A radiation source comprising a fuel source configured to deliver fuel to a location from which the fuel emits EUV radiation. The radiation source further comprises an immobile fuel debris receiving surface provided with a plurality of grooves. The grooves have orientations which are arranged to direct the flow of liquid fuel under the influence of gravity in one or more desired directions.

Abstract translation: 一种辐射源，包括燃料源，其构造成将燃料输送到燃料发射EUV辐射的位置。 辐射源还包括设置有多个凹槽的不动的燃料碎屑接收表面。 凹槽具有定向，其布置成在一个或多个所需方向上在重力的影响下引导液体燃料的流动。

公开(公告)号：US20160274467A1

公开(公告)日：2016-09-22

申请号：US14442415

申请日：2013-10-23

Applicant: ASML NETHERLANDS B.V.

Inventor： Hendrikus Gijsbertus SCHIMMEL ,  Michel RIEPEN ,  Reinier Theodorus Martinus JULISEN ,  Dennis DE GRAAF

IPC: G03F7/20 ,  H05G2/00

CPC classification number: G03F7/70058 ,  G03F7/70033 ,  G03F7/70916 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

Abstract: A radiation source suitable for providing radiation to a lithographic apparatus generates radiation from a plasma (12) generated from a fuel (31) within an enclosure comprising a gas. The plasma generates primary fuel debris collected as a fuel layer on a debris-receiving surface ((33a), (33b)). The debris-receiving surface is heated to a temperature to maintain the fuel layer as a liquid, and to provide a reduced or zero rate of formation gas bubbles within the liquid fuel layer in order to reduce contamination of optical surfaces (14) by secondary debris arising from gas bubble eruption from the liquid fuel layer. Additionally or alternatively, the radiation source may have a debris receiving surface positioned and/or oriented such that substantially all lines normal to the debris receiving surface do not intersect an optically active surface of the radiation source.

Abstract translation: 适于向光刻设备提供辐射的辐射源产生从包括气体的外壳内的燃料（31）产生的等离子体（12）的辐射。 等离子体产生作为燃料层收集的碎屑接收表面（（33a），（33b））上的主要燃料碎片。 碎片接收表面被加热到一个温度以将燃料层保持为液体，并且在液体燃料层内提供降低或零速率的地层气泡，以便减少光学表面（14）由二次碎屑的污染 来自液体燃料层的气泡喷发。 附加地或替代地，辐射源可以具有定位和/或定向的碎片接收表面，使得基本上所有垂直于碎片接收表面的线不与辐射源的光学活性表面相交。

公开(公告)号：US20150077729A1

公开(公告)日：2015-03-19

申请号：US14532897

申请日：2014-11-04

Applicant: ASML NETHERLANDS B.V.

Inventor： Tjarko Adriaan Rudolf VAN EMPEL ,  Vadim Yevgenyevich BANINE ,  Vladimir Vitalevich IVANOV ,  Erik Roelof LOOPSTRA ,  Johannes Hubertus Josephina MOORS ,  Jan Bernard Plechelmus VAN SCHOOT ,  Yuri Johannes Gabriël VAN DE VIJVER ,  Gerardus Hubertus Petrus Maria SWINKELS ,  Hendrikus Gijsbertus SCHIMMEL ,  Dzmitry LABETSKI

IPC: H05G2/00 ,  G03F7/20 ,  H05K7/20

CPC classification number: H05G2/008 ,  G03F7/70175 ,  G03F7/70891 ,  G03F7/70916 ,  G03F7/70983 ,  H05G2/003 ,  H05G2/006 ,  H05K7/2039

Abstract: A module for producing extreme ultraviolet radiation, including an extreme ultraviolet radiation-emitting source, the source being provided with a supply configured to supply a fluid of an ignition material to a predetermined target ignition position and a target-igniting mechanism constructed and arranged to produce a plasma from the ignition material at the target ignition position, the plasma emitting the extreme ultraviolet radiation; a collector mirror constructed and arranged to focus radiation emitted by the plasma at a focal point; and a heat sink having a thermal energy-diverting surface constructed and arranged to divert thermal energy away from the target ignition position, wherein the heat sink is located at a position proximate the target ignition position.

Abstract translation: 一种用于产生极紫外辐射源的模块，包括极紫外辐射发射源，该源提供有被配置为将点火材料的流体供应到预定的目标点火位置的供应，以及构造和布置以产生的点火机构 来自点火材料的等离子体在目标点火位置，等离子体发射极紫外线辐射; 收集器镜，构造和布置成将等离子体发射的辐射聚焦在焦点处; 以及散热器，其具有构造和布置成将热能转移离开目标点火位置的热能转向表面，其中散热器位于靠近目标点火位置的位置。

公开(公告)号：US20180307146A1

公开(公告)日：2018-10-25

申请号：US15766225

申请日：2016-10-25

Applicant: ASML Netherlands B.V.

Inventor： Hendrikus Gijsbertus SCHIMMEL ,  Jeroen Marcel HUIJBREGTSE ,  Maarten VAN KAMPEN ,  Pieter-Jan VAN ZWOL

IPC: G03F7/20 ,  G21K1/06 ,  H05G2/00

CPC classification number: G03F7/70883 ,  G03F7/70033 ,  G03F7/70908 ,  G03F7/70925 ,  G21K1/062 ,  H05G2/00 ,  H05G2/001 ,  H05G2/005 ,  H05G2/008

Abstract: A radiation system comprises a fuel emitter configured to provide fuel to a plasma formation region, a laser arranged to provide a laser beam at the plasma formation region incident on the fuel to generate a radiation emitting plasma, and a reflective or transmissive device (30) arranged to receive radiation emitted by the plasma and to reflect or transmit at least some of the received radiation along a desired path, wherein the reflective or transmissive device comprises a body configured to reflect and/or transmit said at least some of the radiation, and selected secondary electron emission (SEE) material (34) arranged relative to the body such as to emit secondary electrons in response to the received radiation, thereby to clean material from a surface of the device.32