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    Radiation Source
    1.
    发明申请
    Radiation Source 有权
    辐射源

    公开(公告)号：US20160334711A1

    公开(公告)日：2016-11-17

    申请号：US15112602

    申请日：2014-12-19

    Applicant: ASML NETHERLANDS B.V.

    Inventor： Markus Franciscus Antonius EURLINGS ,  Niek Antonius Jacobus Maria KLEEMANS ,  Antonius Johannes Josephus VAN DIJSSELDONK ,  Ramon Mark HOFSTRA ,  Oscar Franciscus Jozephus NOORDMAN ,  Tien Nang PHAM ,  Jan Bernard Plechelmus VAN SCHOOT ,  Jiun-Cheng WANG ,  Kevin Weimin ZHANG

    IPC: G03F7/20 ,  G02B19/00 ,  H05G2/00

    CPC classification number: G03F7/70091 ,  G02B19/0019 ,  G02B27/0905 ,  G02B27/0983 ,  G03F7/70033 ,  G03F7/70175 ,  H05G2/005 ,  H05G2/008

    Abstract: A faceted reflector (32, 32″) for receiving an incident radiation beam (2) and directing a reflected radiation beam at a target. The faceted reflector comprises a plurality of facets, each of the plurality of facets comprising a reflective surface. The reflective surfaces of each of a first subset of the plurality of facets define respective parts of a first continuous surface and are arranged to reflect respective first portions of the incident radiation beam in a first direction to provide a first portion of the reflected radiation beam. The reflective surfaces of each of a second subset of the plurality of facets define respective parts of a second continuous surface and are arranged to reflect respective second portions of the incident radiation beam in a second direction to provide a second portion of the reflected radiation beam.

    Abstract translation: 用于接收入射辐射束（2）并将反射的辐射束引导到目标的小面反射器（32,32“）。 小面反射器包括多个小平面，多个小面中的每个小面包括反射表面。 多个小平面的第一子集中的每一个的反射表面限定第一连续表面的相应部分，并且被布置成在第一方向上反射入射辐射束的相应第一部分以提供反射辐射束的第一部分。 多个小平面的第二子集中的每一个的反射表面限定第二连续表面的相应部分，并且被布置成在第二方向上反射入射辐射束的相应第二部分以提供反射辐射束的第二部分。

    RADIATION SOURCE
    2.
    发明申请
    RADIATION SOURCE 审中-公开
    辐射源

    公开(公告)号：US20160278196A1

    公开(公告)日：2016-09-22

    申请号：US15035983

    申请日：2014-10-23

    Applicant: ASML NETHERLANDS B.V.

    Inventor： Rolf Theodorus Nicolaas BEIJSENS ,  Kornelis Frits FEENSTRA ,  Arjen Teake DE JONG ,  Reinier Theodorus Martinus JILISEN ,  Niek Antonius Jacobus Maria KLEEMANS ,  Andrey NIKIPELOV ,  Pavel SEROGLAZOV ,  Nicolaas Antonius Allegondus Johannes VAN ASTEN ,  Harald Ernest VERBRAAK

    IPC: H05G2/00

    Abstract: A radiation system to generate a radiation emitting plasma, the radiation system include a fuel emitter to provide a fuel target at a plasma formation region, a first laser arranged to provide a first laser beam at the plasma formation region incident on the fuel target to generate a radiation emitting plasma, an imaging device arranged to obtain a first image of the radiation emitting plasma at the plasma formation region, the first image indicating at least one image property of the radiation emitting plasma, and a controller. The controller is arranged to receive the first image, and to generate at least one instruction based on the at least one image property of the radiation emitting plasma to modify operation of at least one component of the radiation system to reduce a detrimental effect of debris.

    Abstract translation: 一种用于产生辐射发射等离子体的辐射系统，所述辐射系统包括燃料发射器，以在等离子体形成区域处提供燃料靶;布置成在入射到燃料靶上的等离子体形成区域处提供第一激光束的第一激光器，以产生 辐射发射等离子体，成像装置，被配置为获得等离子体形成区域处的发射等离子体的第一图像，第一图像表示发射等离子体的至少一个图像特性，以及控制器。 控制器布置成接收第一图像，并且基于辐射发射等离子体的至少一个图像特性生成至少一个指令，以修改辐射系统的至少一个分量的操作，以减少碎片的有害影响。

    SOURCE COLLECTOR APPARATUS, LITHOGRAPHIC APPARATUS AND METHOD
    3.
    发明申请
    SOURCE COLLECTOR APPARATUS, LITHOGRAPHIC APPARATUS AND METHOD 有权
    源收集器装置，光刻装置和方法

    公开(公告)号：US20160054663A1

    公开(公告)日：2016-02-25

    申请号：US14781262

    申请日：2014-03-05

    Applicant: ASML NETHERLANDS B.V.

    Inventor： Niek Antonius Jacobus Maria KLEEMANS ,  Denis Alexandrovich GLUSHKOV ,  Ronald Johannes HULTERMANS ,  Benedictus Mathijs RENKENS ,  Gerardus Hubertus Petrus Maria SWINKELS ,  Christiaan Johannes Petrus VERSPEEK

    IPC: G03F7/20 ,  H05G2/00

    CPC classification number: G03F7/70033 ,  H05G2/003 ,  H05G2/008

    Abstract: A source collector apparatus for use in a lithographic apparatus includes a fuel droplet generator configured in use to generate a stream of fuel droplets directed from an outlet of the fuel droplet generator towards a plasma formation location. In order to prevent droplet satellites from interfering with plasma formation, a gas supply is provided that in use provides a flow of gas (e.g., hydrogen) that deflects any droplet satellites out of the fuel droplet stream. Additionally, a detection apparatus may be provided as part of a shroud to determine the point at which coalescence of fuel droplets occurs thereby providing an indication of the likelihood of satellite droplets being present in the fuel droplet stream.

    Abstract translation: 用于光刻设备的源极收集器装置包括燃料液滴发生器，其构造成用于产生从燃料液滴发生器的出口朝向等离子体形成位置引导的燃料液滴流。 为了防止液滴卫星干扰等离子体形成，提供气体供应，其在使用中提供将任何液滴卫星偏离燃料液滴流的气体（例如氢气）流。 另外，检测装置可以被设置为护罩的一部分，以确定出现燃料液滴聚结的点，从而提供卫星液滴存在于燃料液滴流中的可能性的指示。

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