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Patent Agency Ranking
公开(公告)号：US20210165336A1
公开(公告)日：2021-06-03
申请号：US17048834
申请日：2019-04-10
Applicant: ASML Netherlands B.V.
Inventor： Ramon Mark HOFSTRA , Andrey Sergeevich TYCHKOV , Francois Charles Dominique DENEUVILLE , Gerardus Hubertus Petrus Maria SWINKELS , Petrus Adrianu Theodorus Maria RUIJS
Abstract: A system comprises a reflective optical element with a reflective surface that is configured to reflect a radiation beam. The reflective optical element also has a body. The system includes a thermal conditioning mechanism operative to thermally induce a deformation of the body under control of a controller. By means of controllably deforming the body, the shape of the reflective surface can be adjusted in a controlled manner.
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公开(公告)号：US20240361698A1
公开(公告)日：2024-10-31
申请号：US18565200
申请日：2022-06-20
Applicant: ASML NETHERLANDS B.V.
Inventor： Albertus HARTGERS , Marco Matheus Louis STEEGHS , Gerardus Hubertus Petrus Maria SWINKELS , Giovanni IMPONENTE , Nicholas William Maria PLANTZ , Wouter Joep ENGELEN , Marcus Adrianus VAN DE KERKHOF
IPC: G03F7/20
CPC classification number: G03F7/2002
Abstract: A plate for use in an imaging system to determine at least two optical properties of an illumination beam of the imaging system, the imaging system configured to illuminate an illumination region with the illumination beam, the plate including a plurality of markers, wherein a first subset of the plurality of markers includes a first type of markers for determining a first optical property of the illumination beam, and a second subset of the plurality of markers includes a second type of markers for determining a second optical property of the illumination beam, wherein the plurality of markers are located within a marker region of the plate and the marker region generally corresponds to the illumination region.
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公开(公告)号：US20160054663A1
公开(公告)日：2016-02-25
申请号：US14781262
申请日：2014-03-05
Applicant: ASML NETHERLANDS B.V.
Inventor： Niek Antonius Jacobus Maria KLEEMANS , Denis Alexandrovich GLUSHKOV , Ronald Johannes HULTERMANS , Benedictus Mathijs RENKENS , Gerardus Hubertus Petrus Maria SWINKELS , Christiaan Johannes Petrus VERSPEEK
CPC classification number: G03F7/70033 , H05G2/003 , H05G2/008
Abstract: A source collector apparatus for use in a lithographic apparatus includes a fuel droplet generator configured in use to generate a stream of fuel droplets directed from an outlet of the fuel droplet generator towards a plasma formation location. In order to prevent droplet satellites from interfering with plasma formation, a gas supply is provided that in use provides a flow of gas (e.g., hydrogen) that deflects any droplet satellites out of the fuel droplet stream. Additionally, a detection apparatus may be provided as part of a shroud to determine the point at which coalescence of fuel droplets occurs thereby providing an indication of the likelihood of satellite droplets being present in the fuel droplet stream.
Abstract translation: 用于光刻设备的源极收集器装置包括燃料液滴发生器，其构造成用于产生从燃料液滴发生器的出口朝向等离子体形成位置引导的燃料液滴流。 为了防止液滴卫星干扰等离子体形成，提供气体供应，其在使用中提供将任何液滴卫星偏离燃料液滴流的气体（例如氢气）流。 另外，检测装置可以被设置为护罩的一部分，以确定出现燃料液滴聚结的点，从而提供卫星液滴存在于燃料液滴流中的可能性的指示。
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公开(公告)号：US20180120711A1
公开(公告)日：2018-05-03
申请号：US15803448
申请日：2017-11-03
Applicant: ASML Netherlands B.V.
Inventor： Niek Antonius Jacobus Maria KLEEMANS , Denis Alexandrovich GLUSHKOV , Ronald Johannes HULTERMANS , Benedictus Mathijs RENKENS , Gerardus Hubertus Petrus Maria SWINKELS , Christiaan Johannes Petrus VERSPEEK
CPC classification number: G03F7/70033 , H05G2/003 , H05G2/008
Abstract: A source collector apparatus for use in a lithographic apparatus includes a fuel droplet generator configured in use to generate a stream of fuel droplets directed from an outlet of the fuel droplet generator towards a plasma formation location. In order to prevent droplet satellites from interfering with plasma formation, a gas supply is provided that in use provides a flow of gas (e.g., hydrogen) that deflects any droplet satellites out of the fuel droplet stream. Additionally, a detection apparatus may be provided as part of a shroud to determine the point at which coalescence of fuel droplets occurs thereby providing an indication of the likelihood of satellite droplets being present in the fuel droplet stream.
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公开(公告)号：US20150077729A1
公开(公告)日：2015-03-19
申请号：US14532897
申请日：2014-11-04
Applicant: ASML NETHERLANDS B.V.
Inventor： Tjarko Adriaan Rudolf VAN EMPEL , Vadim Yevgenyevich BANINE , Vladimir Vitalevich IVANOV , Erik Roelof LOOPSTRA , Johannes Hubertus Josephina MOORS , Jan Bernard Plechelmus VAN SCHOOT , Yuri Johannes Gabriël VAN DE VIJVER , Gerardus Hubertus Petrus Maria SWINKELS , Hendrikus Gijsbertus SCHIMMEL , Dzmitry LABETSKI
CPC classification number: H05G2/008 , G03F7/70175 , G03F7/70891 , G03F7/70916 , G03F7/70983 , H05G2/003 , H05G2/006 , H05K7/2039
Abstract: A module for producing extreme ultraviolet radiation, including an extreme ultraviolet radiation-emitting source, the source being provided with a supply configured to supply a fluid of an ignition material to a predetermined target ignition position and a target-igniting mechanism constructed and arranged to produce a plasma from the ignition material at the target ignition position, the plasma emitting the extreme ultraviolet radiation; a collector mirror constructed and arranged to focus radiation emitted by the plasma at a focal point; and a heat sink having a thermal energy-diverting surface constructed and arranged to divert thermal energy away from the target ignition position, wherein the heat sink is located at a position proximate the target ignition position.
Abstract translation: 一种用于产生极紫外辐射源的模块，包括极紫外辐射发射源，该源提供有被配置为将点火材料的流体供应到预定的目标点火位置的供应，以及构造和布置以产生的点火机构 来自点火材料的等离子体在目标点火位置，等离子体发射极紫外线辐射; 收集器镜，构造和布置成将等离子体发射的辐射聚焦在焦点处; 以及散热器，其具有构造和布置成将热能转移离开目标点火位置的热能转向表面，其中散热器位于靠近目标点火位置的位置。
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