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公开(公告)号：US20210325174A1
公开(公告)日：2021-10-21
申请号：US17314469
申请日：2021-05-07
Applicant: ASML Netherlands B.V.
Inventor： Patricius Aloysius Jacobus TINNEMANS , Vasco Tomas Tenner , Arie Jeffrey Den Boef , Hugo Augustinus Joseph Cramer , Patrick Warnaar , Grzegorz Grzela , Martin Jacobus Johan Jak
Abstract: Disclosed is a method and associated apparatus for measuring a characteristic of interest relating to a structure on a substrate. The method comprises calculating a value for the characteristic of interest directly from the effect of the characteristic of interest on at least the phase of illuminating radiation when scattered by the structure, subsequent to illuminating said structure with said illuminating radiation.
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公开(公告)号：US20210149316A1
公开(公告)日：2021-05-20
申请号：US16623912
申请日：2018-05-28
Applicant: ASML NETHERLANDS B.V.
Inventor： Edo Maria HULSEBOS , Patricius Aloysius Jacobus TINNEMANS , Franciscus Godefridus Casper BIJNEN
Abstract: A method for determining substrate deformation includes obtaining first measurement data associated with mark positions, from measurements of a plurality of substrates; obtaining second measurement data associated with mark positions, from measurements of the plurality of substrates; determining a mapping between the first measurement data and the second measurement data; and decomposing the mapping, by calculating an eigenvalue decomposition for the mapping, to separately determine a first deformation (e.g. mark deformation) that scales differently from a second deformation (e.g. substrate deformation) in the mapping between the data. The steps of determining a mapping and decomposing the mapping may be performed together using non-linear optimization.
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公开(公告)号：US20200272061A1
公开(公告)日：2020-08-27
申请号：US16650520
申请日：2018-09-04
Applicant: ASML NETHERLANDS B.V.
Inventor： Patricius Aloysius Jacobus TINNEMANS , Edo Maria HULSEBOS , Henricus Johannes Lambertus MEGENS , Ahmet Koray ERDAMAR , Loek Johannes Petrus VERHEES , Willem Seine Christian ROELOFS , Wendy Johanna Martina VAN DE VEN , Hadi YAGUBIZADE , Hakki Ergün CEKLI , Ralph BRINKHOF , Tran Thanh Thuy VU , Maikel Robert GOOSEN , Maaike VAN T WESTEINDE , Weitian KOU , Manouk RIJPSTRA , Matthijs COX , Franciscus Godefridus Casper BIJNEN
IPC: G03F7/20
Abstract: A method for determining one or more optimized values of an operational parameter of a sensor system configured for measuring a property of a substrate. The method includes: determining a quality parameter for a plurality of substrates; determining measurement parameters for the plurality of substrates obtained using the sensor system for a plurality of values of the operational parameter; comparing a substrate to substrate variation of the quality parameter and a substrate to substrate variation of a mapping of the measurement parameters; and determining the one or more optimized values of the operational parameter based on the comparing.
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公开(公告)号：US20190265598A1
公开(公告)日：2019-08-29
申请号：US16408605
申请日：2019-05-10
Applicant: ASML NETHERLANDS B.V.
Inventor： Edo Maria HULSEBOS , Patricius Aloysius Jacobus TINNEMANS , Ralp BRINKHOF , Pieter Jacob HERES , Jorn Kjeld LUCAS , Loek Johannes Petrus VERHEES , Ingrid Margaretha Ardina VAN DONKELAAR , Franciscus Godefridus Casper BIJNEN
Abstract: In a method of controlling a lithographic apparatus, historical performance measurements are used to calculate a process model relating to a lithographic process. Current positions of a plurality of alignment marks provided on a current substrate are measured and used to calculate a substrate model relating to a current substrate. Additionally, historical position measurements obtained at the time of processing the prior substrates are used with the historical performance measurements to calculate a model mapping. The model mapping is applied to modify the substrate model. The lithographic apparatus is controlled using the process model and the modified substrate model together. Overlay performance is improved by avoiding over- or under-correction of correlated components of the process model and the substrate model. The model mapping may be a subspace mapping, and dimensionality of the model mapping may be reduced, before it is used.
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公开(公告)号：US20180231900A1
公开(公告)日：2018-08-16
申请号：US15749209
申请日：2016-07-27
Applicant: ASML NETHERLANDS B.V.
Inventor： Patricius Aloysius Jacobus TINNEMANS
CPC classification number: G03F9/7046 , G03F7/70633 , G03F7/70691 , G03F9/7019 , G03F9/7023 , G03F9/7088
Abstract: An initialization method including estimating a characteristic of a property of an object based on a plurality of measurements by the sensor of the property using a respective plurality of different measurement parameters, different ones of the measurements using different measurement parameters, the characteristic including a combination of respective outcomes of respective ones of the measurements weighted by a respective weighting coefficient; performing, for each of a plurality of models of the object, each model configured to enable respective simulation of the performing of the measurements, a respective simulation, the respective simulation including simulating the measurements under control of a respective plurality of different simulation parameters to obtain a respective plurality of simulated characteristics of the property, the different simulation parameters being indicative of the different measurement parameters; determining, for each of the models, a respective bias representative of a respective difference between a respective theoretical characteristic of the property in accordance with the respective model and a respective further combination of the simulated characteristics of the property in the respective model, the respective further combination of the simulated characteristics including the weight coefficients, each particular one of the weight coefficients associated with a particular one of the different simulation parameters; using a cost function configured to optimize a correspondence between the simulated characteristic of the property and the theoretical characteristic of the property, the cost function being a function of the respective biases of the models; and optimizing the cost function to derive the weight coefficients from the cost function; and using the weight coefficients and the associated simulation parameters in a controller associated with the sensor.
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Patent Agency Ranking
公开(公告)号：US20160223920A1
公开(公告)日：2016-08-04
申请号：US15023075
申请日：2014-09-11
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： Patricius Aloysius Jacobus TINNEMANS , Arie Jeffrey DEN BOEF , Justin Lloyd KREUZER , Simon Gijsbert Josephus MATHIJSSEN
CPC classification number: G03F9/7069 , G01B9/02011 , G01B9/02015 , G01B11/272 , G01B2290/70 , G03F9/7049 , G03F9/7088
Abstract: Apparatus, systems, and methods are used for detecting the alignment of a feature on a substrate using a polarization independent interferometer. The apparatus, system, and methods include optical elements that receive light that has diffracted or scattered from a mark on a substrate. The optical elements may split the diffracted light into multiple subbeams of light which are detected by one or more detectors. The diffracted light may be combined optically or during processing after detection. The system may determine alignment and/or overlay based on the received diffracted light having any polarization angle or state.
Abstract translation: 装置，系统和方法用于使用偏振无关干涉仪来检测基板上特征的对准。 该装置，系统和方法包括从基板上的标记衍射或散射的光的光学元件。 光学元件可以将衍射光分成由一个或多个检测器检测的多个子光束。 衍射光可以在光学上或在检测后的处理期间组合。 该系统可以基于接收到的具有任何偏振角或状态的衍射光来确定对准和/或覆盖。
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7.发明申请Method of Measuring a Property of a Target Structure, Inspection Apparatus, Lithographic System and Device Manufacturing Method 有权测量目标结构属性的方法，检测装置，平版印刷系统和装置制造方法公开(公告)号：US20160086324A1
公开(公告)日：2016-03-24
申请号：US14839325
申请日：2015-08-28
Applicant: ASML Netherlands B.V.
CPC classification number: G06T7/0004 , G03F7/705 , G03F7/70591 , G03F7/70633 , G06T7/11 , G06T2207/10061 , G06T2207/20224 , G06T2207/30148
Abstract: A property of a target structure is measured based on intensity of an image of the target. The method includes (a) obtaining an image of the target structure; (b) defining (1204) a plurality of candidate regions of interest, each candidate region of interest comprising a plurality of pixels in the image; (c) defining (1208, 1216) an optimization metric value for the candidate regions of interest based at least partly on signal values of pixels within the region of interest; (d) defining (1208, 1216) a target signal function which defines a contribution of each pixel in the image to a target signal value. The contribution of each pixel depends on (i) which candidate regions of interest contain that pixel and (ii) optimization metric values of those candidate regions of interest.
Abstract translation: 基于目标的图像的强度来测量目标结构的属性。 该方法包括（a）获得目标结构的图像; （b）定义（1204）多个候选兴趣区域，每个候选区域包括图像中的多个像素; （c）至少部分地基于所述感兴趣区域内的像素的信号值来定义（1208,1216）所述候选区域的优化度量值; （d）定义（1208,1216）目标信号功能，其将图像中的每个像素的贡献定义为目标信号值。 每个像素的贡献取决于（i）感兴趣的哪个候选区域包含该像素，以及（ii）感兴趣的候选区域的优化度量值。
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公开(公告)号：US20230064193A1
公开(公告)日：2023-03-02
申请号：US17796641
申请日：2021-01-20
Applicant: ASML Netherlands B.V.
Inventor： Patricius Aloysius Jacobus TINNEMANS , Patrick WARNAAR , Vasco Tomas TENNER , Hugo Augustinus Joseph CRAMER , Bram Antonius Gerardus LOMANS , Bastiaan Lambertus Wilhelmus Marinus VAN DE VEN , Ahmet Burak CUNBUL , Alexander Prasetya KONIJNENBERG
Abstract: Disclosed is a method of measuring a periodic structure on a substrate with illumination radiation having at least one wavelength, the periodic structure having at least one pitch. The method comprises configuring, based on a ratio of said pitch and said wavelength, one or more of: an illumination aperture profile comprising one or more illumination regions in Fourier space; an orientation of the periodic structure for a measurement; and a detection aperture profile comprising one or more separated detection regions in Fourier space. This configuration is such that: i) diffracted radiation of at least a pair of complementary diffraction orders is captured within the detection aperture profile, and ii) said diffracted radiation fills at least 80% of the one or more separated detection regions. The periodic structure is measured while applying the configured one or more of illumination aperture profile, detection aperture profile and orientation of the periodic structure.
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公开(公告)号：US20220350260A1
公开(公告)日：2022-11-03
申请号：US17761475
申请日：2020-09-03
Applicant: ASML Holding N.V. , ASML Netherlands B.V.
Inventor： Armand Eugene Albert , Justin Lloyd KREUZER , Nikhil MEHTA , Patrick WARNAAR , Vasco Tomas TENNER , Patricius Aloysius Jacobus TINNEMANS , Hugo Augustinus Joseph CRAMER
IPC: G03F7/20 , G01N21/956 , G01N21/95
Abstract: Disclosed is a method for a metrology measurement on an area of a substrate comprising at least a portion of a target structure. The method comprises receiving a radiation information representing a portion of radiation scattered by the are, and using a filter in a Fourier domain for removing or suppressing at least a portion of the received radiation information that does not relate to radiation that has been scattered by the target structure for obtaining a filtered radiation information for the metrology measurement, wherein characteristics of the filter are based on target information about the target structure.
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公开(公告)号：US20200081356A1
公开(公告)日：2020-03-12
申请号：US16686418
申请日：2019-11-18
Applicant: ASML NETHERLANDS B.V.
Inventor： Patricius Aloysius Jacobus TINNEMANS , Edo Maria HULSEBOS , Henricus Johannes Lambertus MEGENS , Sudharshanan RAGHUNATHAN , Boris MENCHTCHIKOV , Ahmet Koray ERDAMAR , Loek Johannes Petrus VERHEES , Willem Seine Christian ROELOFS , Wendy Johanna Martina VAN DE VEN , Hadi YAGUBIZADE , Hakki Ergün CEKLI , Ralph BRINKHOF , Tran Thanh Thuy VU , Maikel Robert GOOSEN , Maaike VAN'T WESTEINDE , Weitian KOU , Manouk RIJPSTRA , Matthijs COX , Franciscus Godefridus Casper BIJNEN
Abstract: A method for determining one or more optimized values of an operational parameter of a sensor system configured for measuring a property of a substrate is disclosed the method comprising: determining a quality parameter for a plurality of substrates; determining measurement parameters for the plurality of substrates obtained using the sensor system for a plurality of values of the operational parameter; comparing a substrate to substrate variation of the quality parameter and a substrate to substrate variation of a mapping of the measurement parameters; and determining the one or more optimized values of the operational parameter based on the comparing.
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