-
公开(公告)号：US20160223920A1
公开(公告)日：2016-08-04
申请号：US15023075
申请日：2014-09-11
发明人： Patricius Aloysius Jacobus TINNEMANS , Arie Jeffrey DEN BOEF , Justin Lloyd KREUZER , Simon Gijsbert Josephus MATHIJSSEN
CPC分类号： G03F9/7069 , G01B9/02011 , G01B9/02015 , G01B11/272 , G01B2290/70 , G03F9/7049 , G03F9/7088
摘要： Apparatus, systems, and methods are used for detecting the alignment of a feature on a substrate using a polarization independent interferometer. The apparatus, system, and methods include optical elements that receive light that has diffracted or scattered from a mark on a substrate. The optical elements may split the diffracted light into multiple subbeams of light which are detected by one or more detectors. The diffracted light may be combined optically or during processing after detection. The system may determine alignment and/or overlay based on the received diffracted light having any polarization angle or state.
摘要翻译： 装置，系统和方法用于使用偏振无关干涉仪来检测基板上特征的对准。 该装置，系统和方法包括从基板上的标记衍射或散射的光的光学元件。 光学元件可以将衍射光分成由一个或多个检测器检测的多个子光束。 衍射光可以在光学上或在检测后的处理期间组合。 该系统可以基于接收到的具有任何偏振角或状态的衍射光来确定对准和/或覆盖。
-
公开(公告)号：US20230017491A1
公开(公告)日：2023-01-19
申请号：US17784566
申请日：2020-12-03
发明人： Patricius Aloysius Jacobus TINNEMANS , Igor Matheus Petronalla AARTS , Kaustuve BHATTACHARYYA , Ralph BRINKHOF , Leendert Jan KARSSEMEIJER , Stefan Carolus Jacobus A KEIJ , Haico Victor KOK , Simon Gijsbert Josephus MATHIJSSEN , Henricus Johannes Lambertu MEGENS , Samee Ur REHMAN
摘要： A metrology method relating to measurement of a structure on a substrate, the structure being subject to one or more asymmetric deviation. The method includes obtaining at least one intensity asymmetry value relating to the one or more asymmetric deviations, wherein the at least one intensity asymmetry value includes a metric related to a difference or imbalance between the respective intensities or amplitudes of at least two diffraction orders of radiation diffracted by the structure; determining at least one phase offset value corresponding to the one or more asymmetric deviations based on the at least one intensity asymmetry value; and determining one or more measurement corrections for the one or more asymmetric deviations from the at least one phase offset value.
-
公开(公告)号：US20220350260A1
公开(公告)日：2022-11-03
申请号：US17761475
申请日：2020-09-03
发明人： Armand Eugene Albert , Justin Lloyd KREUZER , Nikhil MEHTA , Patrick WARNAAR , Vasco Tomas TENNER , Patricius Aloysius Jacobus TINNEMANS , Hugo Augustinus Joseph CRAMER
IPC分类号： G03F7/20 , G01N21/956 , G01N21/95
摘要： Disclosed is a method for a metrology measurement on an area of a substrate comprising at least a portion of a target structure. The method comprises receiving a radiation information representing a portion of radiation scattered by the are, and using a filter in a Fourier domain for removing or suppressing at least a portion of the received radiation information that does not relate to radiation that has been scattered by the target structure for obtaining a filtered radiation information for the metrology measurement, wherein characteristics of the filter are based on target information about the target structure.
-
公开(公告)号：US20170212434A1
公开(公告)日：2017-07-27
申请号：US15328194
申请日：2015-07-07
发明人： Simon Gijsbert Josephus MATHIJSSEN , Arie Jeffrey DEN BOEF , Justin Lloyd KREUZER , Patricius Aloysius Jacobus TINNEMANS
IPC分类号： G03F9/00
CPC分类号： G03F9/7088 , G03F9/7065 , G03F9/7069
摘要： An alignment sensor for a lithographic apparatus is arranged and constructed to measure an alignment of a movable part of the lithographic apparatus in respect of a stationary part of the lithographic apparatus. The alignment sensor comprises a light source configured to generate a pulse train at a optical wavelength and a pulse repetition frequency, a non-linear optical element, arranged in an optical propagation path of the pulse train, the non-linear optical element configured to transform the pulse train at the optical wavelength into a transformed pulse train in an optical wavelength range, an optical imaging system configured to project the transformed pulse train onto an alignment mark comprising a diffraction grating; a detector to detect a diffraction pattern as diffracted by the diffraction grating, and a data processing device configured to derive alignment data from the detected diffraction pattern as detected by the detector.
-
公开(公告)号：US20180329316A1
公开(公告)日：2018-11-15
申请号：US15756057
申请日：2016-08-23
发明人： Alessandro POLO , Simon Gijsbert Josephus MATHIJSSEN , Patricius Aloysius Jacobus TINNEMANS , Scott Douglas COSTON , Ronan James HAVELIN
摘要： A lithographic apparatus includes an alignment sensor configured to determine the position of an alignment target having a periodic structure. The alignment sensor includes a demultiplexer to demultiplex a number of intensity channels. The demultiplexer includes a number of stages arranged in series and a number of demultiplexing components, each demultiplexing component operable to divide an input radiation beam into two radiation beam portions. The first stage has a first demultiplexing component that is arranged to receive as an input radiation beam an incident radiation beam. Each successive stage is arranged such that it has twice the number of demultiplexing components as a preceding stage, each demultiplexing component of each stage after the first stage receiving as an input one of the radiation beam portions output from a demultiplexing component of the preceding stage.
-
公开(公告)号：US20210325174A1
公开(公告)日：2021-10-21
申请号：US17314469
申请日：2021-05-07
发明人： Patricius Aloysius Jacobus TINNEMANS , Vasco Tomas Tenner , Arie Jeffrey Den Boef , Hugo Augustinus Joseph Cramer , Patrick Warnaar , Grzegorz Grzela , Martin Jacobus Johan Jak
摘要： Disclosed is a method and associated apparatus for measuring a characteristic of interest relating to a structure on a substrate. The method comprises calculating a value for the characteristic of interest directly from the effect of the characteristic of interest on at least the phase of illuminating radiation when scattered by the structure, subsequent to illuminating said structure with said illuminating radiation.
-
公开(公告)号：US20210149316A1
公开(公告)日：2021-05-20
申请号：US16623912
申请日：2018-05-28
发明人： Edo Maria HULSEBOS , Patricius Aloysius Jacobus TINNEMANS , Franciscus Godefridus Casper BIJNEN
摘要： A method for determining substrate deformation includes obtaining first measurement data associated with mark positions, from measurements of a plurality of substrates; obtaining second measurement data associated with mark positions, from measurements of the plurality of substrates; determining a mapping between the first measurement data and the second measurement data; and decomposing the mapping, by calculating an eigenvalue decomposition for the mapping, to separately determine a first deformation (e.g. mark deformation) that scales differently from a second deformation (e.g. substrate deformation) in the mapping between the data. The steps of determining a mapping and decomposing the mapping may be performed together using non-linear optimization.
-
公开(公告)号：US20200272061A1
公开(公告)日：2020-08-27
申请号：US16650520
申请日：2018-09-04
发明人： Patricius Aloysius Jacobus TINNEMANS , Edo Maria HULSEBOS , Henricus Johannes Lambertus MEGENS , Ahmet Koray ERDAMAR , Loek Johannes Petrus VERHEES , Willem Seine Christian ROELOFS , Wendy Johanna Martina VAN DE VEN , Hadi YAGUBIZADE , Hakki Ergün CEKLI , Ralph BRINKHOF , Tran Thanh Thuy VU , Maikel Robert GOOSEN , Maaike VAN T WESTEINDE , Weitian KOU , Manouk RIJPSTRA , Matthijs COX , Franciscus Godefridus Casper BIJNEN
IPC分类号： G03F7/20
摘要： A method for determining one or more optimized values of an operational parameter of a sensor system configured for measuring a property of a substrate. The method includes: determining a quality parameter for a plurality of substrates; determining measurement parameters for the plurality of substrates obtained using the sensor system for a plurality of values of the operational parameter; comparing a substrate to substrate variation of the quality parameter and a substrate to substrate variation of a mapping of the measurement parameters; and determining the one or more optimized values of the operational parameter based on the comparing.
-
公开(公告)号：US20190265598A1
公开(公告)日：2019-08-29
申请号：US16408605
申请日：2019-05-10
发明人： Edo Maria HULSEBOS , Patricius Aloysius Jacobus TINNEMANS , Ralp BRINKHOF , Pieter Jacob HERES , Jorn Kjeld LUCAS , Loek Johannes Petrus VERHEES , Ingrid Margaretha Ardina VAN DONKELAAR , Franciscus Godefridus Casper BIJNEN
摘要： In a method of controlling a lithographic apparatus, historical performance measurements are used to calculate a process model relating to a lithographic process. Current positions of a plurality of alignment marks provided on a current substrate are measured and used to calculate a substrate model relating to a current substrate. Additionally, historical position measurements obtained at the time of processing the prior substrates are used with the historical performance measurements to calculate a model mapping. The model mapping is applied to modify the substrate model. The lithographic apparatus is controlled using the process model and the modified substrate model together. Overlay performance is improved by avoiding over- or under-correction of correlated components of the process model and the substrate model. The model mapping may be a subspace mapping, and dimensionality of the model mapping may be reduced, before it is used.
-
公开(公告)号：US20180231900A1
公开(公告)日：2018-08-16
申请号：US15749209
申请日：2016-07-27
CPC分类号： G03F9/7046 , G03F7/70633 , G03F7/70691 , G03F9/7019 , G03F9/7023 , G03F9/7088
摘要： An initialization method including estimating a characteristic of a property of an object based on a plurality of measurements by the sensor of the property using a respective plurality of different measurement parameters, different ones of the measurements using different measurement parameters, the characteristic including a combination of respective outcomes of respective ones of the measurements weighted by a respective weighting coefficient; performing, for each of a plurality of models of the object, each model configured to enable respective simulation of the performing of the measurements, a respective simulation, the respective simulation including simulating the measurements under control of a respective plurality of different simulation parameters to obtain a respective plurality of simulated characteristics of the property, the different simulation parameters being indicative of the different measurement parameters; determining, for each of the models, a respective bias representative of a respective difference between a respective theoretical characteristic of the property in accordance with the respective model and a respective further combination of the simulated characteristics of the property in the respective model, the respective further combination of the simulated characteristics including the weight coefficients, each particular one of the weight coefficients associated with a particular one of the different simulation parameters; using a cost function configured to optimize a correspondence between the simulated characteristic of the property and the theoretical characteristic of the property, the cost function being a function of the respective biases of the models; and optimizing the cost function to derive the weight coefficients from the cost function; and using the weight coefficients and the associated simulation parameters in a controller associated with the sensor.
-
-
-
-
-
-
-
-
-
搜索结果
45 条记录 (耗时 0.031 秒)
