公开(公告)号：US20170277042A1

公开(公告)日：2017-09-28

申请号：US15505885

申请日：2015-07-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Johannes Antonius Gerardus AKKERMANS ,  Ruud Antonius Catharina Maria BEERENS ,  Sander Christiaan BROERS ,  Jeroen Johannes Theodorus Hendrikus DE BEST ,  Adrianus Marinus Wouter HEEREN ,  George Alois Leonie LEENKNEGT ,  Bo LENSSEN ,  Hendrikus Johannes SCHELLENS ,  Peter VAN DER KRIEKEN ,  Theodorus Petrus Maria CADEE ,  Jan VAN EIJK ,  Richard Henricus Adrianus VAN LIESHOUT

IPC: G03F7/20 ,  G01L1/16

CPC classification number: G03F7/70775 ,  G01L1/16 ,  G01P15/0915 ,  G01P15/18 ,  G03F7/70716 ,  G03F7/70783 ,  G03F7/7085

Abstract: A sensor includes two shear-mode piezoelectric transducers, wherein each piezoelectric transducer has a bottom surface and a top surface, wherein the top surfaces of the piezoelectric transducers are rigidly connected to each other, and wherein the bottom surfaces of the piezoelectric transducers are configured to be attached to an object to be measured.

公开(公告)号：US20160026091A1

公开(公告)日：2016-01-28

申请号：US14775263

申请日：2014-02-26

Applicant: ASML NETHERLANDS B.V. ,  CARL ZEISS SMT GMBH

Inventor： Erik Roelof LOOPSTRA ,  Olav Waldemar Vladimir FRIJNS ,  Stig BIELING ,  Antonius Theodorus Wilhelmus KEMPEN ,  Ivo VANDERHALLEN ,  Nicolaas TEN KATE ,  Ruud Antonius Catharina Maria BEERENS ,  Richard Henricus Adrianus VAN LIESHOUT ,  Theodorus Petrus Maria CADEE ,  Sjoerd Nicolaas Lambertus DONDERS ,  Alexander Matthijs STRUYCKEN ,  Marcus Petrus SCHEEPERS

IPC: G03F7/20 ,  G21K1/06 ,  G02B5/08 ,  H05G2/00 ,  G02B19/00

CPC classification number: G03F7/70033 ,  G02B5/0891 ,  G02B19/0095 ,  G03F7/70166 ,  G03F7/702 ,  G03F7/70916 ,  G03F7/70983 ,  G21K1/067 ,  H05G2/003 ,  H05G2/008

Abstract: A radiation collector comprising a first collector segment comprising a plurality of grazing incidence reflector shells configured to direct radiation to converge in a first location at a distance from the radiation collector, a second collector segment comprising a plurality of grazing incidence reflector shells configured to direct radiation to converge in a second location at said distance from the radiation collector, wherein the first location and the second location are separated from one another.

Abstract translation: 一种辐射收集器，包括第一收集器段，该第一收集器段包括多个掠入射反射器壳体，所述多个入射反射器壳体被配置为引导辐射在离辐射收集器一定距离处的第一位置会聚;第二收集器部分，其包括多个入射入射反射器壳体， 以在距离辐射收集器的所述距离处会聚在第二位置，其中第一位置和第二位置彼此分离。

公开(公告)号：US20130162963A1

公开(公告)日：2013-06-27

申请号：US13720369

申请日：2012-12-19

Applicant: ASML Netherlands B.V.

Inventor： Johannes Hendrikus Maria SPRUIT ,  Ruud Antonius Catharina BEERENS ,  Richard Henricus Adrianus VAN LIESHOUT ,  Cristian DAN

IPC: G03B27/52

CPC classification number: G03F7/70783 ,  G03B27/522 ,  G03F7/7085

Abstract: Disclosed is a lithographic apparatus comprising a member susceptible to deformation and a deformation sensor for measuring a deformation of said member. The deformation sensor comprises a first birefringence sensing element arranged to be subjected to stress in dependency of the deformation of said member and a light system configured to transmit polarized light through the first birefringence sensing element, wherein said polarized light has a first polarization state prior to being transmitted through the first birefringence sensing element. The deformation sensor further comprises a detector for detecting a second polarization state of the polarized light after being transmitted through the first birefringence sensing element and a calculation unit to determine the deformation of said member based on the first and second polarization state.

Abstract translation: 公开了一种包括易于变形的构件的光刻设备和用于测量所述构件的变形的变形传感器。 变形传感器包括第一双折射感测元件，其被布置为根据所述构件的变形而受到应力，以及被配置为透射偏振光通过第一双折射感测元件的光系统，其中所述偏振光具有第一偏振态 通过第一双折射检测元件透射。 变形传感器还包括检测器，用于检测通过第一双折射检测元件透射后的偏振光的第二偏振态，以及计算单元，用于基于第一和第二偏振状态确定所述构件的变形。