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公开(公告)号：US20160026091A1
公开(公告)日：2016-01-28
申请号：US14775263
申请日：2014-02-26
Applicant: ASML NETHERLANDS B.V. , CARL ZEISS SMT GMBH
Inventor： Erik Roelof LOOPSTRA , Olav Waldemar Vladimir FRIJNS , Stig BIELING , Antonius Theodorus Wilhelmus KEMPEN , Ivo VANDERHALLEN , Nicolaas TEN KATE , Ruud Antonius Catharina Maria BEERENS , Richard Henricus Adrianus VAN LIESHOUT , Theodorus Petrus Maria CADEE , Sjoerd Nicolaas Lambertus DONDERS , Alexander Matthijs STRUYCKEN , Marcus Petrus SCHEEPERS
CPC classification number: G03F7/70033 , G02B5/0891 , G02B19/0095 , G03F7/70166 , G03F7/702 , G03F7/70916 , G03F7/70983 , G21K1/067 , H05G2/003 , H05G2/008
Abstract: A radiation collector comprising a first collector segment comprising a plurality of grazing incidence reflector shells configured to direct radiation to converge in a first location at a distance from the radiation collector, a second collector segment comprising a plurality of grazing incidence reflector shells configured to direct radiation to converge in a second location at said distance from the radiation collector, wherein the first location and the second location are separated from one another.
Abstract translation: 一种辐射收集器，包括第一收集器段，该第一收集器段包括多个掠入射反射器壳体，所述多个入射反射器壳体被配置为引导辐射在离辐射收集器一定距离处的第一位置会聚;第二收集器部分，其包括多个入射入射反射器壳体， 以在距离辐射收集器的所述距离处会聚在第二位置，其中第一位置和第二位置彼此分离。
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公开(公告)号：US20160301180A1
公开(公告)日：2016-10-13
申请号：US15035674
申请日：2014-11-27
Applicant: ASML NETHERLANDS B.V.
Inventor： Andrey Alexandrovich NIKIPELOV , Vadim Yevgenyevich BANINE , Pieter Willem Herman DE JAGER , Gosse Charles DE VRIES , Olav Waldemar Vladimir FRIJNS , Leonardus Adrianus Gerardus GRIMMINCK , Andelko KATALENIC , Johannes Antonius Gerardus AKKERMANS , Erik LOOPSTRA , Wouter Joep ENGELEN , Petrus Rutgerus BARTRAIJ , Teis Johan COENEN , Wilhelmus Patrick Elisabeth Maria OP 'T ROOT
CPC classification number: H01S3/0903 , H01J1/34 , H05H7/08 , H05H2007/084
Abstract: An injector arrangement for providing an electron beam. The injector arrangement comprises a first injector for providing electron bunches, and a second injector for providing electrons bunches. The injector arrangement is operable in a first mode in which the electron beam comprises electron bunches provided by the first injector only and a second mode in which the electron beam comprises electron bunches provided by the second injector only.
Abstract translation: 一种用于提供电子束的喷射装置。 喷射器装置包括用于提供电子束的第一喷射器和用于提供电子束的第二喷射器。 喷射器装置可以在第一模式中操作，其中电子束包括仅由第一注射器提供的电子束和第二模式，其中电子束包括仅由第二注射器提供的电子束。
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公开(公告)号：US20190066859A1
公开(公告)日：2019-02-28
申请号：US15770688
申请日：2016-11-03
Applicant: ASML Netherlands B.V.
Inventor： Pieter Willem Herman DE JAGER , Sipke Jacob BIJLSMA , Olav Waldemar Vladimir FRIJNS , Andrey Alexandrovich NIKIPELOV , Nicolaas TEN KATE , Antonius Theodorus Anna Maria DERKSEN , Jacobus Johannus Leonardus Hendricus VERSPAY , Robert Gabriël Maria LANSBERGEN , Aukje KASTELIJN
Abstract: A radioisotope production apparatus (RI) comprising an electron source arranged to provide an electron beam (E). The electron source comprises an electron injector (10) and an electron accelerator (20). The radioisotope production apparatus (RI) further comprises a target support structure configured to hold a target (30) and a beam splitter (40) arranged to direct the a first portion of the electron beam along a first path towards a first side of the target (30) and to direct a second portion of the electron beam along a second path towards a second side of the target (30).
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公开(公告)号：US20230063156A1
公开(公告)日：2023-03-02
申请号：US17794897
申请日：2020-12-24
Applicant: ASML Holding N.V. , ASML Netherlands B.V.
Inventor： Ronald Peter ALBRIGHT , Kursat BAL , Vadim Yevgenyevich BANINE , Richard Joseph BRULS , Sjoerd Frans DE VRIES , Olav Waldemar Vladimir FRIJNS , Yang-Shan HUANG , Zhuangxiong HUANG , Johannes Henricus Wilhelmus JACOBS , Johannes Hubertus Josephina MOORS , Georgi Nanchev NENCHEV , Andrey NIKIPELOV , Thomas Maarten RAASVELD , Manish RANJAN , Edwin TE SLIGTE , Karl Robert UMSTADTER , Eray UZGÖREN , Marcus Adrianus VAN DE KERKHOF , Parham YAGHOOBI
IPC: G03F7/20
Abstract: An apparatus comprising: a radiation receiving apparatus provided with an opening operable to receive radiation from a radiation source through the opening; wherein the radiation receiving apparatus comprises a deflection apparatus arranged to change a trajectory of a particle through the opening arriving at the radiation receiving apparatus.
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Patent Agency Ranking
公开(公告)号：US20210375498A1
公开(公告)日：2021-12-02
申请号：US17395709
申请日：2021-08-06
Applicant: ASML Netherlands B.V.
Inventor： Pieter Willem Herman DE JAGER , Sipke Jacob BIJLSMA , Olav Waldemar Vladimir FRIJNS , Andrey Alexandrovich NIKIPELOV , Nicolaas TEN KATE , Antonius Theodorus Anna Maria DERKSEN , Jacobus Johannus Leonardus Hendricus VERSPAY , Robert Gabriël Maria LANSBERGEN , Aukje Arianne Annette KASTELIJN
Abstract: A radioisotope production apparatus comprising an electron source arranged to provide an electron beam. The electron source comprises an electron injector and an electron accelerator. The radioisotope production apparatus further comprises a target support structure configured to hold a target and a beam splitter arranged to direct the a first portion of the electron beam along a first path towards a first side of the target and to direct a second portion of the electron beam along a second path towards a second side of the target.
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公开(公告)号：US20180081278A1
公开(公告)日：2018-03-22
申请号：US15789702
申请日：2017-10-20
Applicant: ASML NETHERLANDS B.V.
Inventor： Andrey Alexandrovich NIKIPELOV , Olav Waldemar Vladimir FRIJNS , Gosse Charles DE VRIES , Erik Roelof LOOPSTRA , Vadim Yevgenyevich BANINE , Pieter Willem Herman DE JAGER , Rilpho Ludovicus DONKER , Han-Kwang NIENHUYS , Borgert KRUIZINGA , Wouter Joep ENGELEN , Otger Jan LUITEN , Johannes Antonius Gerardus AKKERMANS , Leonardus Adrianus Gerardus GRIMMINCK , Vladimir LITVINENKO
CPC classification number: G03F7/70033 , G01J1/0407 , G01J1/0418 , G01J1/26 , G01J1/429 , G02B1/06 , G02B5/205 , G02B26/023 , G03F7/70008 , G03F7/7055 , G03F7/70558 , G03F7/7085 , G21K1/10 , H01S3/005 , H01S3/0085 , H01S3/0903 , H05H7/04
Abstract: A method of patterning lithographic substrates, the method comprising using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates, wherein the method further comprises reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly.
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公开(公告)号：US20180031982A1
公开(公告)日：2018-02-01
申请号：US15549132
申请日：2016-02-16
Applicant: ASML NETHERLANDS B.V.
Inventor： Han-Kwang NIENHUYS , Erik Willem BOGAART , Rilpho Ludovicus Donker , Borgert KRUIZINGA , Erik Roelof LOOPSTRA , Hako BOTMA , Gosse Charles DE VRIES , Olav Waldemar Vladimir FRIJNS , Johannes Jacobus Matheus BASELMANS
Abstract: A radiation alteration device includes a continuously undulating reflective surface, wherein the shape of the continuously undulating reflective surface follows a substantially periodic pattern.
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公开(公告)号：US20160225477A1
公开(公告)日：2016-08-04
申请号：US14917623
申请日：2014-09-24
Applicant: ASML NETHERLANDS B.V.
Inventor： Vadim Yevgenyevich BANINE , Peturs Rutgerus BARTRAIJ , Ramon Pascal VAN GORKOM , Lucas Johannes Peter AMENT , Pieter Willem Herman DE JAGER , Gosse Charles DE VRIES , Rilpho Ludovicus DONKER , Wouter Joep ENGELEN , Olav Waldemar Vladimir FRIJNS , Leonardus Adrianus Gerardus GRIMMINCK , Andelko KATALENIC , Erik Roelof LOOPSTRA , Han-Kwang NIENHUYS , Andrey Alexandrovich NIKIPELOV , Michael Jozef Mathijs RENKENS , Franciscus Johannes Joseph JANSSEN , Borgert KRUIZINGA
Abstract: A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one or more tools.
Abstract translation: 用于光刻系统的传送系统。 光束传送系统包括被配置为从辐射源接收辐射束并且沿着一个或多个方向反射辐射部分的光学元件，以形成用于提供给一个或多个工具的一个或多个分支辐射束。
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公开(公告)号：US20160147161A1
公开(公告)日：2016-05-26
申请号：US14900110
申请日：2014-06-17
Applicant: ASML NETHERLANDS B.V.
Inventor： Andrey Alexandrovich NIKIPELOV , Olav Waldemar Vladimir FRIJNS , Gosse Charles DE VRIES , Erik Roelof LOOPSTRA , Vadim Yevgenyevich BANINE , Pieter Willem Herman DE JAGER , Rilpho Ludovicus DONKER , Han-Kwang NIENHUYS , Borgert KRUIZINGA , Wouter Joep ENGELEN , Otger Jan LUITEN , Johannes Antonius Gerardus AKKERMANS , Leonardus Adrianus Gerardus GRIMMINCK , Vladimir LITVINENKO
IPC: G03F7/20
CPC classification number: G03F7/70033 , G01J1/0407 , G01J1/0418 , G01J1/26 , G01J1/429 , G02B1/06 , G02B5/205 , G02B26/023 , G03F7/70008 , G03F7/7055 , G03F7/70558 , G03F7/7085 , G21K1/10 , H01S3/005 , H01S3/0085 , H01S3/0903 , H05H7/04
Abstract: A method of patterning lithographic substrates that includes using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates. The method further includes reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly, and applying variable attenuation to EUV radiation that has been output by the free electron laser in order to further control the power of EUV radiation delivered to the lithographic apparatus.
Abstract translation: 图案化平版印刷基板的方法，其包括使用自由电子激光器产生EUV辐射并将EUV辐射传送到将EUV辐射投影到平版印刷基板上的光刻设备。 该方法还包括通过使用基于反馈的控制回路来相对地调节自由电子激光器的调节和调整自由电子激光器的操作来减少递送到光刻基片的EUV辐射的功率波动，以及将可变衰减应用于具有 由自由电子激光器输出，以便进一步控制传送到光刻设备的EUV辐射的功率。
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