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公开(公告)号：US09389518B2
公开(公告)日：2016-07-12
申请号：US13686854
申请日：2012-11-27
Applicant: ASML Netherlands B.V.
Inventor： Antonius Franciscus Johannes De Groot , Raymond Wilhelmus Louis Lafarre , Yang-Shan Huang , Sander Christiaan Broers , Peter Laurentius Maria Ros
CPC classification number: G03F7/70758 , G03B27/58 , G03F7/70775
Abstract: A movable stage system is configured to support an object. The stage system comprises an object table configured to support the object and an object table support defining an object table support surface configured to support the object table. The object table support comprises at least one first actuator to drive the object table support in a first driving direction substantially parallel to the object table support surface. In a projection on a plane parallel to the object table support surface the at least one actuator is spaced with respect to the object table in a direction perpendicular to the first driving direction such that the risk on slip between the object table support and the object table supported thereon is decreased.
Abstract translation: 可移动台系统被配置为支撑物体。 舞台系统包括被配置为支撑对象的对象表和定义被配置为支持对象表的对象表支持表面的对象表支持。 物体台支撑件包括至少一个第一致动器，以在基本上平行于物体台支撑表面的第一驱动方向上驱动物体台支撑件。 在与物体台支撑表面平行的平面上的突起中，至少一个致动器在垂直于第一驱动方向的方向上相对于物体台间隔开，使得物体台支撑件和物体台之间的滑动风险 支撑在其上。
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Patent Agency Ranking
2.发明授权公开(公告)号：US10012914B2
公开(公告)日：2018-07-03
申请号：US15505885
申请日：2015-07-20
Applicant: ASML NETHERLANDS B.V.
Inventor： Johannes Antonius Gerardus Akkermans , Ruud Antonius Catharina Maria Beerens , Sander Christiaan Broers , Jeroen Johannes Theodorus Hendrikus De Best , Adrianus Marinus Wouter Heeren , George Alois Leonie Leenknegt , Bo Lenssen , Hendrikus Johannes Schellens , Peter Van Der Krieken , Theodorus Petrus Maria Cadee , Jan Van Eijk , Richard Henricus Adrianus Van Lieshout
Abstract: A sensor includes two shear-mode piezoelectric transducers, wherein each piezoelectric transducer has a bottom surface and a top surface, wherein the top surfaces of the piezoelectric transducers are rigidly connected to each other, and wherein the bottom surfaces of the piezoelectric transducers are configured to be attached to an object to be measured.
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公开(公告)号：US09910367B2
公开(公告)日：2018-03-06
申请号：US15303192
申请日：2015-04-15
Applicant: ASML Netherlands B.V.
Inventor： Sander Christiaan Broers
CPC classification number: G03F7/70775 , G03F7/70716 , G03F7/70991
Abstract: A lithographic apparatus including: a first object, a second object which is moveable relative to the first object in a moving direction, a set of cables and/or tubing arranged between the first object and the second object, a guiding drum to guide the set of cables and/or tubing, the guiding drum being rotatable about a rotation axis extending perpendicular to the moving direction, a drum positioning device to position the guiding drum such that it follows movement of the set of cables and/or tubing caused by movement of the second object relative to the first object and a guiding structure to guide movement of the guiding drum in the moving direction.
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4.发明申请LITHOGRAPHIC APPARATUS COMPRISING AN ACTUATOR, AND METHOD FOR PROTECTING SUCH ACTUATOR 有权包括执行器的平面设备和用于保护执行器的方法公开(公告)号：US20150070678A1
公开(公告)日：2015-03-12
申请号：US14395454
申请日：2013-04-12
Applicant: ASML NETHERLANDS B.V.
Inventor： Theodorus Petrus Maria Cadee , Sander Christiaan Broers , Sven Antoin Johan Hol , Yang-Shan Huang , Antonius Franciscus Johannes De Groot , Bastiaan Lambertus Wilhelmus Marinus Van De Ven
IPC: G03F7/20
CPC classification number: G03F7/70766 , G03F7/70533 , G03F7/70758 , G03F7/709
Abstract: A lithographic apparatus comprises a system. The system comprises a first part, a second part and an energy absorbing element. The second part is configured to move relatively to the first part. The system has a gap located between the first part and the second part during an operation mode of the system. The energy absorbing element is for absorbing energy between the first part and the second part when the first part and the second part crash onto each other in a failure mode of the system. The energy absorbing element is outside the gap.
Abstract translation: 光刻设备包括一个系统。 该系统包括第一部分，第二部分和能量吸收元件。 第二部分被配置为相对于第一部分移动。 该系统在系统的操作模式期间具有位于第一部分和第二部分之间的间隙。 当第一部分和第二部分在系统的故障模式下彼此碰撞时，能量吸收元件用于在第一部分和第二部分之间吸收能量。 能量吸收元件在间隙之外。
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5.发明授权公开(公告)号：US10061213B2
公开(公告)日：2018-08-28
申请号：US15505885
申请日：2015-07-20
Applicant: ASML NETHERLANDS B.V.
Inventor： Johannes Antonius Gerardus Akkermans , Ruud Antonius Catharina Maria Beerens , Sander Christiaan Broers , Jeroen Johannes Theodorus Hendrikus De Best , Adrianus Marinus Wouter Heeren , George Alois Leonie Leenknegt , Bo Lenssen , Hendrikus Johannes Schellens , Peter Van Der Krieken , Theodorus Petrus Maria Cadee , Jan Van Eijk , Richard Henricus Adrianus Van Lieshout
CPC classification number: G03F7/70775 , G01L1/16 , G01P15/0915 , G01P15/18 , G03F7/70716 , G03F7/70783 , G03F7/7085 , H01L41/1132
Abstract: A sensor includes two shear-mode piezoelectric transducers, wherein each piezoelectric transducer has a bottom surface and a top surface, wherein the top surfaces of the piezoelectric transducers are rigidly connected to each other, and wherein the bottom surfaces of the piezoelectric transducers are configured to be attached to an object to be measured.
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公开(公告)号：US09921494B2
公开(公告)日：2018-03-20
申请号：US14395454
申请日：2013-04-12
Applicant: ASML Netherlands B.V.
Inventor： Theodorus Petrus Maria Cadee , Sander Christiaan Broers , Sven Antoin Johan Hol , Yang-Shan Huang , Antonius Franciscus Johannes De Groot , Bastiaan Lambertus Wilhelmus Marinus Van De Ven
CPC classification number: G03F7/70766 , G03F7/70533 , G03F7/70758 , G03F7/709
Abstract: A lithographic apparatus comprises a system. The system comprises a first part, a second part and an energy absorbing element. The second part is configured to move relatively to the first part. The system has a gap located between the first part and the second part during an operation mode of the system. The energy absorbing element is for absorbing energy between the first part and the second part when the first part and the second part crash onto each other in a failure mode of the system. The energy absorbing element is outside the gap.
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