公开(公告)号：US20190332015A1

公开(公告)日：2019-10-31

申请号：US16315125

申请日：2017-07-06

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： Thomas POIESZ ,  Satish ACHANTA ,  Mehmet Ali AKBAS ,  Pavlo ANTONOV ,  Jeroen BOUWKNEGT ,  Joost Wilhelmus Maria FRENKEN ,  Evelyn Wallis PACITTI ,  Nicolaas TEN KATE ,  Bruce TIRRI ,  Jan VERHOEVEN

IPC: G03F7/20 ,  H01L21/687

Abstract: There is disclosed a substrate holder, a method of manufacturing a substrate holder, a lithographic apparatus comprising the substrate holder, and a method of manufacturing devices using the lithographic apparatus. In one arrangement, there is provided a substrate holder for use in a lithographic apparatus. The substrate holder supports a substrate. The substrate holder comprises a main body. The main body has a main body surface. A plurality of burls are provided projecting from the main body surface. Each burl has a burl side surface and a distal end surface. The distal end surface of each burl engages with the substrate. The distal end surfaces of the burls substantially conform to a support plane and support the substrate. A layer of carbon based material is provided in a plurality of separated regions of carbon based material. The layer of carbon based material provides a surface with a lower coefficient of friction than a part of the main body surface outside the plurality of separated regions of carbon based material. The layer of carbon based material covers only part of the distal end surface of at least one of the burls. Alternatively, the layer of carbon based material covers the distal end surface and at least a portion of the burl side surface of at least one of the burls.

公开(公告)号：US20210053177A1

公开(公告)日：2021-02-25

申请号：US16963576

申请日：2019-01-24

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Bert Dirk SCHOLTEN ,  Satish ACHANTA ,  Aydar AKCHURIN ,  Pavlo ANTONOV ,  Coen Hubertus Matheus BALTIS ,  Jeroen BOUWKNEGT ,  Ann-Sophie m. FARLE ,  Christopher John MASON ,  Ralph Nicholas PALERMO ,  Thomas POIESZ ,  Yuri Johannes Gabriel VAN DE VIJVER ,  Jimmy Matheus Wilhelmus VAN DE WINKEL

IPC: B24B27/033 ,  B24B1/04 ,  B24B7/07 ,  B24B7/22 ,  G03F7/20 ,  H01L21/304

Abstract: A treatment tool for reconditioning the top surfaces of a plurality of projections of a substrate support in a lithographic tool. The treatment tool includes a reconditioning surface which is rough relative to smoothed top surfaces of the projections and which reconditioning surface has material harder than that of the material of the top surfaces of the projections. A reconditioning method involves causing an interaction between the reconditioning surface of the treatment tool and the top surfaces of the projections of the substrate support, so as to leave these top surfaces rougher than they were prior to the interaction.

公开(公告)号：US20210032743A1

公开(公告)日：2021-02-04

申请号：US16969088

申请日：2019-02-26

Applicant: ASML Netherlands B.V.

Inventor： Sonia CASTELLANOS ORTEGA ,  Jan VERHOEVEN ,  Joost Wilhelmus Maria FRENKEN ,  Pavlo ANTONOV ,  Nicolaas TEN KATE ,  Olivier Christian Maurice LUGIER

IPC: C23C16/04 ,  H01L21/02 ,  C23C16/26 ,  C23C16/48

Abstract: Methods and apparatus for forming a patterned layer of carbon are disclosed. In one arrangement, a selected portion of a surface of a solid structure is irradiated with extreme ultraviolet radiation in the presence of a carbon-containing precursor. The radiation interacts with the solid structure in the selected portion to cause formation of a layer of carbon in the selected portion from the carbon-containing precursor. The layer of carbon is formed in a pattern defined by the selected portion.

公开(公告)号：US20240011150A1

公开(公告)日：2024-01-11

申请号：US18475068

申请日：2023-09-26

Applicant: ASML Netherlands B.V.

Inventor： Sonia CASTELLANOS ORTEGA ,  Jan VERHOEVEN ,  Joost Wilhelmus Maria FRENKEN ,  Pavlo ANTONOV ,  Nicolaas TEN KATE ,  Olivier Christian Maurice LUGIER

IPC: C23C16/04 ,  C23C16/26 ,  C23C16/48

CPC classification number: C23C16/047 ,  C23C16/26 ,  C23C16/482 ,  C23C16/483 ,  H01L21/02527

Abstract: Methods and apparatus for forming a patterned layer of carbon are disclosed. In one arrangement, a selected portion of a surface of a solid structure is irradiated with extreme ultraviolet radiation in the presence of a carbon-containing precursor. The radiation interacts with the solid structure in the selected portion to cause formation of a layer of carbon in the selected portion from the carbon-containing precursor. The layer of carbon is formed in a pattern defined by the selected portion.