Patent search ap:("ASML Netherlands B.V.") AND inv:"Martin Frans Pierre SMEETS" Page 1

1.

发明申请
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD INVOLVING A HEATER 审中-公开
Title translation: 涉及加热器的平面设备和装置制造方法

公开(公告)号：US20160048085A1

公开(公告)日：2016-02-18

申请号：US14882241

申请日：2015-10-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Theodorus Petrus Maria CADEE , Johannes Henricus Wilhelmus JACOBS , Nicolaas TEN KATE , Erik Roelof LOOPSTRA , Aschwin Lodewijk Hendricus Johannes VERMEER , Jeroen Johannes Sophia Maria MERTENS , Christianus Gerardus Maria DE MOL , Marcel Johannus Elisabeth Hubertus MUITJENS , Antonius Johannus VAN DER NET , Joost Jeroen OTTENS , Johannes Anna QUAEDACKERS , Maria Elisabeth REUHMAN-HUISKEN , Marco Koert STAVENGA , Patricius Aloysius Jacobus TINNEMANS , Martinus Cornelis Maria VERHAGEN , Jacobus Johannus Leonardus Hendricus VERSPA Y , Frederik Eduard DE JONG , Koen GOORMAN , Boris MENCHTCHIKOV , Herman BOOM , Stoyan NIHTIANOV , Richard MOERMAN , Martin Frans Pierre SMEETS , Bart Leonard Peter SCHOONDERMARK , Franciscus Johannes Joseph JANSSEN , Michel RIEPEN

IPC: G03F7/20

CPC classification number: G03F7/70808 , G03F7/70341 , G03F7/70841 , G03F7/70875

Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.

Abstract translation: 描述了一种光刻设备，其具有液体供应系统，其被配置为至少部分地填充光刻设备的投影系统和具有液体的基板之间的空间，布置成基本上容纳该空间内的液体的阻挡构件和加热器。

2.

发明申请
ASSESSMENT APPARATUS AND METHODS 有权

公开(公告)号：US20250132122A1

公开(公告)日：2025-04-24

申请号：US18990157

申请日：2024-12-20

Applicant: ASML Netherlands B.V.

Inventor： Thomas Izaak Fred HAARTSEN , Niels Johannes Maria BOSCH , Jasper Hendrik GRASMAN , Martin Frans Pierre SMEETS , Erwin SLOT , Wouter Onno PRIL , Peter Paul HEMPENIUS , Te-Yu CHEN

IPC: H01J37/21 , G01B7/02 , H01J37/20

Abstract: The present disclosure relates to apparatus and methods for assessing samples using a plurality of charged particle beams. In one arrangement, at least a subset of a beam grid of a plurality of charged particle beams and respective target portions of a sample surface are scanned relative to each other to process the target portions. Signal charged particles from the sample are detected to generate detection signals. A sample surface topographical map is generated that represents a topography of the sample surface by analyzing the detection signals.