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1.发明授权公开(公告)号：US09755396B1
公开(公告)日：2017-09-05
申请号：US15363570
申请日：2016-11-29
Applicant: ASML Netherlands B.V.
Inventor： Paul Frihauf , Andrew Liu , Spencer Rich , Matthew R. Graham , Steven Chang , Wayne J. Dunstan , Daniel Jason Riggs
CPC classification number: H01S3/102 , H01S3/005 , H01S3/10038 , H01S3/1068 , H01S3/107 , H01S3/2232 , H05G2/003 , H05G2/008
Abstract: A method and apparatus for control of a dose of extreme ultraviolet (EUV) radiation generated by a laser produced plasma (LPP) EUV light source that combines pulse control mode and pulse modulation. The EUV energy created by each pulse is measured and total EUV energy created by the fired pulses determined, a desired energy for the next pulse is determined based upon whether the total EUV energy is greater or less than a desired average EUV energy times the number of pulses. If the desired pulse energy for the next droplet is within the range of one or more pulse modulation actuators, the pulse is modulated; otherwise, the pulse is fired to miss the droplet. This provides greater control of the accumulated dose as well as uniformity of the EUV energy over time, greater ability to compensate for pulses that generate EUV energy that is higher or lower than nominal expected values, and ability to provide an average EUV energy per pulse that is less than the nominal minimum EUV energy per pulse of the system.
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2.发明授权System and method to adaptively pre-compensate for target material push-out to optimize extreme ultraviolet light production 有权系统和方法适应性地预补偿目标材料推出，以优化极紫外光生产公开(公告)号：US09588430B2
公开(公告)日：2017-03-07
申请号：US14995166
申请日：2016-01-13
Applicant: ASML Netherlands B.V.
Inventor： Jeroen van der Burgt , Matthew R. Graham , Charles Kinney , Wayne J. Dunstan
CPC classification number: G03F7/70033 , B05B17/00 , H05G2/006 , H05G2/008 , H05H1/24
Abstract: Energy output from a laser-produced plasma (LPP) extreme ultraviolet light (EUV) system varies based on how well the laser beam is focused on droplets of target material to generate plasma at a primary focal spot. Maintaining droplets at the primary focal spot during burst firing is difficult because generated plasma from preceding droplets push succeeding droplets out of the primary focal spot. Current droplet-to-droplet feedback control to re-align droplets to the primary focal spot is relatively slow. The system and method described herein adaptively pre-compensate for droplet push-out by directing droplets to a target position that is offset from the primary focal spot such that when a droplet is lased, the droplet is pushed by the laser beam into the primary focal spot to generate plasma. Over time, the EUV system learns to maintain real-time alignment of droplet position so plasma is generated consistently within the primary focal spot.
Abstract translation: 来自激光产生的等离子体（LPP）极紫外光（EUV）系统的能量输出基于激光束聚焦在目标材料的液滴上以在主要焦点产生等离子体的程度而变化。 在爆发射击过程中，在主焦点处保持液滴是困难的，因为来自前面的液滴的所产生的等离子体将后续的液滴推出主焦点。 将液滴重新对准主要焦点的当前液滴到液滴的反馈控制相对较慢。 本文所述的系统和方法通过将液滴引导到偏离主要焦点的目标位置来自适应地预补偿液滴推出，使得当液滴被照射时，液滴被激光束推动到主要焦点 点产生等离子体。 随着时间的推移，EUV系统学会保持液滴位置的实时对准，从而在主焦点内始终产生等离子体。
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公开(公告)号：US09832853B2
公开(公告)日：2017-11-28
申请号：US14175730
申请日：2014-02-07
Applicant: ASML Netherlands B.V.
Inventor： Matthew R. Graham , William N. Partlo , Steven Chang , Robert A. Bergstedt
CPC classification number: H05G2/008 , G01B11/0608 , G01B11/26 , H05G2/003 , H05G2/005
Abstract: An extreme ultraviolet light system includes a steering system that steers and focuses an amplified light beam traveling along a propagation direction to a focal plane near a target location within an extreme ultraviolet light chamber, a detection system including at least one detector positioned to detect an image of a laser beam reflected from at least a portion of a target material within the chamber, a wavefront modification system in the path of the reflected laser beam and between the target location and the detection system, and a controller. The wavefront modification system is configured to modify the wavefront of the reflected laser beam as a function of a target focal plane position along the propagation direction. The controller includes logic for adjusting a location of the focal plane of the amplified light beam relative to the target material based on the detected image of the reflected laser beam.
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4.发明申请System and Method to Adaptively Pre-Compensate for Target Material Push-Out to Optimize Extreme Ultraviolet Light Production 审中-公开适应性预补偿目标材料推出以优化极紫外光生产的系统和方法公开(公告)号：US20160202614A1
公开(公告)日：2016-07-14
申请号：US14995166
申请日：2016-01-13
Applicant: ASML Netherlands B.V.
Inventor： Jeroen van der Burgt , Matthew R. Graham , Charles Kinney , Wayne J. Dunstan
CPC classification number: G03F7/70033 , B05B17/00 , H05G2/006 , H05G2/008 , H05H1/24
Abstract: Energy output from a laser-produced plasma (LPP) extreme ultraviolet light (EUV) system varies based on how well the laser beam is focused on droplets of target material to generate plasma at a primary focal spot. Maintaining droplets at the primary focal spot during burst firing is difficult because generated plasma from preceding droplets push succeeding droplets out of the primary focal spot. Current droplet-to-droplet feedback control to re-align droplets to the primary focal spot is relatively slow. The system and method described herein adaptively pre-compensate for droplet push-out by directing droplets to a target position that is offset from the primary focal spot such that when a droplet is lased, the droplet is pushed by the laser beam into the primary focal spot to generate plasma. Over time, the EUV system learns to maintain real-time alignment of droplet position so plasma is generated consistently within the primary focal spot.
Abstract translation: 来自激光产生的等离子体（LPP）极紫外光（EUV）系统的能量输出基于激光束聚焦在目标材料的液滴上以在主要焦点产生等离子体的程度而变化。 在爆发射击过程中，在主焦点处保持液滴是困难的，因为来自前面的液滴的所产生的等离子体将后续的液滴推出主焦点。 将液滴重新对准主要焦点的当前液滴到液滴的反馈控制相对较慢。 本文所述的系统和方法通过将液滴引导到偏离主要焦点的目标位置来自适应地预补偿液滴推出，使得当液滴被照射时，液滴被激光束推动到主要焦点 点产生等离子体。 随着时间的推移，EUV系统学会保持液滴位置的实时对准，从而在主焦点内始终产生等离子体。
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