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    System and Method to Adaptively Pre-Compensate for Target Material Push-Out to Optimize Extreme Ultraviolet Light Production
    1.
    发明申请
    System and Method to Adaptively Pre-Compensate for Target Material Push-Out to Optimize Extreme Ultraviolet Light Production 审中-公开
    适应性预补偿目标材料推出以优化极紫外光生产的系统和方法

    公开(公告)号：US20160202614A1

    公开(公告)日：2016-07-14

    申请号：US14995166

    申请日：2016-01-13

    Applicant: ASML Netherlands B.V.

    Inventor： Jeroen van der Burgt ,  Matthew R. Graham ,  Charles Kinney ,  Wayne J. Dunstan

    IPC: G03F7/20 ,  H05H1/24

    CPC classification number: G03F7/70033 ,  B05B17/00 ,  H05G2/006 ,  H05G2/008 ,  H05H1/24

    Abstract: Energy output from a laser-produced plasma (LPP) extreme ultraviolet light (EUV) system varies based on how well the laser beam is focused on droplets of target material to generate plasma at a primary focal spot. Maintaining droplets at the primary focal spot during burst firing is difficult because generated plasma from preceding droplets push succeeding droplets out of the primary focal spot. Current droplet-to-droplet feedback control to re-align droplets to the primary focal spot is relatively slow. The system and method described herein adaptively pre-compensate for droplet push-out by directing droplets to a target position that is offset from the primary focal spot such that when a droplet is lased, the droplet is pushed by the laser beam into the primary focal spot to generate plasma. Over time, the EUV system learns to maintain real-time alignment of droplet position so plasma is generated consistently within the primary focal spot.

    Abstract translation: 来自激光产生的等离子体（LPP）极紫外光（EUV）系统的能量输出基于激光束聚焦在目标材料的液滴上以在主要焦点产生等离子体的程度而变化。 在爆发射击过程中，在主焦点处保持液滴是困难的，因为来自前面的液滴的所产生的等离子体将后续的液滴推出主焦点。 将液滴重新对准主要焦点的当前液滴到液滴的反馈控制相对较慢。 本文所述的系统和方法通过将液滴引导到偏离主要焦点的目标位置来自适应地预补偿液滴推出，使得当液滴被照射时，液滴被激光束推动到主要焦点 点产生等离子体。 随着时间的推移，EUV系统学会保持液滴位置的实时对准，从而在主焦点内始终产生等离子体。

    System and method to adaptively pre-compensate for target material push-out to optimize extreme ultraviolet light production
    2.
    发明授权
    System and method to adaptively pre-compensate for target material push-out to optimize extreme ultraviolet light production 有权
    系统和方法适应性地预补偿目标材料推出，以优化极紫外光生产

    公开(公告)号：US09588430B2

    公开(公告)日：2017-03-07

    申请号：US14995166

    申请日：2016-01-13

    Applicant: ASML Netherlands B.V.

    Inventor： Jeroen van der Burgt ,  Matthew R. Graham ,  Charles Kinney ,  Wayne J. Dunstan

    IPC: H05H1/24 ,  G03F7/20 ,  B05B17/00 ,  H05G2/00

    CPC classification number: G03F7/70033 ,  B05B17/00 ,  H05G2/006 ,  H05G2/008 ,  H05H1/24

    Abstract: Energy output from a laser-produced plasma (LPP) extreme ultraviolet light (EUV) system varies based on how well the laser beam is focused on droplets of target material to generate plasma at a primary focal spot. Maintaining droplets at the primary focal spot during burst firing is difficult because generated plasma from preceding droplets push succeeding droplets out of the primary focal spot. Current droplet-to-droplet feedback control to re-align droplets to the primary focal spot is relatively slow. The system and method described herein adaptively pre-compensate for droplet push-out by directing droplets to a target position that is offset from the primary focal spot such that when a droplet is lased, the droplet is pushed by the laser beam into the primary focal spot to generate plasma. Over time, the EUV system learns to maintain real-time alignment of droplet position so plasma is generated consistently within the primary focal spot.

    Abstract translation: 来自激光产生的等离子体（LPP）极紫外光（EUV）系统的能量输出基于激光束聚焦在目标材料的液滴上以在主要焦点产生等离子体的程度而变化。 在爆发射击过程中，在主焦点处保持液滴是困难的，因为来自前面的液滴的所产生的等离子体将后续的液滴推出主焦点。 将液滴重新对准主要焦点的当前液滴到液滴的反馈控制相对较慢。 本文所述的系统和方法通过将液滴引导到偏离主要焦点的目标位置来自适应地预补偿液滴推出，使得当液滴被照射时，液滴被激光束推动到主要焦点 点产生等离子体。 随着时间的推移，EUV系统学会保持液滴位置的实时对准，从而在主焦点内始终产生等离子体。

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