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公开(公告)号：US20220342228A1
公开(公告)日：2022-10-27
申请号：US17764057
申请日：2020-09-27
Applicant: ASML Netherlands B.V. , ASML Holding N.V.
Inventor： Irwan Dani SETIJA , Arie Jeffrey DEN BOEF , Mohamed SWILLAM , Arjan Johannes Anton BEUKMAN
Abstract: A system includes a radiation source and a phased array. The phased array includes optical elements, waveguides and phase modulators. The phased array generates a beam of radiation. The optical elements radiate radiation waves. The waveguides guide radiation from the radiation source to the optical elements. The phase modulators adjust phases of the radiation waves such that the radiation waves accumulate to form the beam. An amount of incoherence of the beam is based on randomization of the phases.
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2.发明公开公开(公告)号：US20230213871A1
公开(公告)日：2023-07-06
申请号：US18000087
申请日：2021-05-14
Applicant: ASML Netherlands B.V. , ASML Holding N.V.
Inventor： Sebastianus Adrianus GOORDEN , Filippo ALPEGGIANI , Simon Reinald HUISMAN , Johannes Jacobus Matheus BASELMANS , Haico Victor KOK , Mohamed SWILLAM , Arjan Johannes Anton BEUKMAN
CPC classification number: G03F7/70625 , G01B11/272 , G03F9/7049
Abstract: A metrology system includes a radiation source, first, second, and third optical systems, and a processor. The first optical system splits the radiation into first and second beams of radiation and impart one or more phase differences between the first and second beams. The second optical system directs the first and second beams toward a target structure to produce first and second scattered beams of radiation. The third optical system interferes the first and second scattered beams at an imaging detector. The imaging detector generates a detection signal based on the interfered first and second scattered beams. The metrology system modulates one or more phase differences of the first and second scattered beams based on the imparted one or more phase differences. The processor analyzes the detection signal to determine a property of the target structure based on at least the modulated one or more phase differences.
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公开(公告)号：US20230058714A1
公开(公告)日：2023-02-23
申请号：US17790344
申请日：2020-12-08
Applicant: ASML Netherlands B.V. , ASML Holding N.V.
Inventor： Marinus Petrus REIJNDERS , Mohamed SWILLAM
IPC: G03F7/20
Abstract: A system includes an illumination system, an optical element, and a detector. The optical system is implemented on a substrate. The illumination system includes first and second sources and first and second generators. The illumination system generates a beam of radiation. The first and second sources generate respective first and second different wavelength bands. The first and second resonators are optically coupled to respective ones of the first and second sources and narrow respective ones of the first and second wavelength bands. The optical element directs the beam toward a target structure. The detector receives radiation from the target structure and to generate a measurement signal based on the received radiation.
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公开(公告)号：US20240361703A1
公开(公告)日：2024-10-31
申请号：US18769032
申请日：2024-07-10
Applicant: ASML Holding N.V. , ASML Netherlands B.V.
Inventor： Mohamed SWILLAM , Stephen ROUX , Tamer Mohamed Tawfik Ahmed Mohamed ELAZHARY , Arie Jeffrey DEN BOEF
CPC classification number: G03F7/70633 , G02B6/1225 , G02B26/0833
Abstract: A sensor apparatus includes a sensor chip, an illumination system, a first optical system, a second optical system, and a detector system. The illumination system is coupled to the sensor chip and transmits an illumination beam along an illumination path. The first optical system is coupled to the sensor chip and includes a first integrated optic to configure and transmit the illumination beam toward a diffraction target on a substrate, disposed adjacent to the sensor chip, and generate a signal beam including diffraction order sub-beams generated from the diffraction target. The second optical system is coupled to the sensor chip and includes a second integrated optic to collect and transmit the signal beam from a first side to a second side of the sensor chip. The detector system is configured to measure a characteristic of the diffraction target based on the signal beam transmitted by the second optical system.
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Patent Agency Ranking
公开(公告)号：US20230266255A1
公开(公告)日：2023-08-24
申请号：US18012801
申请日：2021-06-09
Applicant: ASML Netherlands B.V. , ASML Holding N.V.
Inventor： Ilse VAN WEPEREN , Arjan Johannes Anton BEUKMAN , Mohamed SWILLAM , Justin Lloyd KREUZER , Stephen ROUX
IPC: G01N21/956
CPC classification number: G01N21/956 , G01N2021/95676
Abstract: Systems, apparatuses, and methods are provided for detecting a particle on a substrate surface. An example method can include receiving, by a grating structure, coherent radiation from a radiation source. The method can further include generating, by the grating structure, a focused coherent radiation beam based on the coherent radiation. The method can further include transmitting, by the grating structure, the focused coherent radiation beam toward a region of a surface of a substrate. The method can further include receiving, by the grating structure, photons scattered from the region in response to illuminating the region with the focused coherent radiation beam. The method can further include measuring, by a photodetector, the photons received by the grating structure. The method can further include generating, by the photodetector and based on the measured photons, an electronic signal for detecting a particle located in the region of the surface of the substrate.
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公开(公告)号：US20230213868A1
公开(公告)日：2023-07-06
申请号：US18012308
申请日：2021-06-04
Applicant: ASML Holding N.V. , ASML Netherlands B.V.
Inventor： Mohamed SWILLAM , Marinus Petrus REIJNDERS
IPC: G03F7/20
CPC classification number: G03F7/70258 , G03F7/7085 , G03F7/70275
Abstract: A system includes an illumination system, an optical element, a switching element and a detector. The illumination system includes a broadband light source that generates a beam of radiation. The dispersive optical element receives the beam of radiation and generates a plurality of light beams having a narrower bandwidth than the broadband light source. The optical switch receives the plurality of light 5 beams and transmits each one of the plurality of light beams to a respective one of a plurality of alignment sensor of a sensor array. The detector receives radiation returning from the sensor array and to generate a measurement signal based on the received radiation.
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公开(公告)号：US20230008139A1
公开(公告)日：2023-01-12
申请号：US17782622
申请日：2020-11-18
Applicant: ASML Holding N.V. , ASML Netherlands B.V.
Inventor： Mohamed SWILLAM , Simon Reinald HUISMAN , Justin Lloyd KREUZER
Abstract: A detection system (200) includes an illumination system (210), a first optical system (232), a phase modulator (220), a lock-in detector (255), and a function generator (230). The illumination system is configured to transmit an illumination beam (218) along an illumination path. The first optical system is configured to transmit the illumination beam toward a diffraction target (204) on a substrate (202). The first optical system is further configured to transmit a signal beam including diffraction order sub-beams (222, 224, 226) that are diffracted by the diffraction target. The phase modulator is configured to modulate the illumination beam or the signal beam based on a reference signal. The lock-in detector is configured to collect the signal beam and to measure a characteristic of the diffraction target based on the signal beam and the reference signal. The function generator is configured to generate the reference signal for the phase modulator and the lock-in detector.
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公开(公告)号：US20250130512A1
公开(公告)日：2025-04-24
申请号：US18682678
申请日：2022-07-21
Applicant: ASML Netherlands B.V.
Inventor： Mohamed SWILLAM , Stephen ROUX , Justin Lloyd KREUZER , Roxana REZVANI NARAGHI
Abstract: Systems, apparatuses, and methods are provided for measuring intensity using off-axis illumination. An example method can include illuminating a region of a surface of a substrate with a first radiation beam at a first incident angle and, in response, measuring a first set of photons diffracted from the region. The example method can further include illuminating the region with a second radiation beam at a second incident angle and, in response, measuring a second set of photons diffracted from the region. The example method can further include generating measurement data for the region based on the measured first set of photons and the measured second set of photons.
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公开(公告)号：US20220283516A1
公开(公告)日：2022-09-08
申请号：US17637942
申请日：2020-08-05
Applicant: ASML Holding N.V. , ASML Netherlands B.V.
Abstract: A sensor apparatus includes a sensor chip, an illumination system, a first optical system, a second optical system, and a detector system. The illumination system is coupled to the sensor chip and transmits an illumination beam along an illumination path. The first optical system is coupled to the sensor chip and includes a first integrated optic to configure and transmit the illumination beam toward a diffraction target on a substrate, disposed adjacent to the sensor chip, and generate a signal beam including diffraction order sub-beams generated from the diffraction target. The second optical system is coupled to the sensor chip and includes a second integrated optic to collect and transmit the signal beam from a first side to a second side of the sensor chip. The detector system is configured to measure a characteristic of the diffraction target based on the signal beam transmitted by the second optical system.
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