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公开(公告)号：US20220295625A1
公开(公告)日：2022-09-15
申请号：US17637654
申请日：2020-09-04
Applicant: ASML Netherlands B.V.
Inventor： Georgiy Olegovich Vaschenko , Bob Rollinger , Joshua Mark Lukens , Alexander Igorevich Ershov , Yoshiho Amada
IPC: H05G2/00
Abstract: An apparatus includes: a tube; a body including: a first body wall and a second body wall; and a support structure including: a first support portion and a second support portion. The first body wall extends in a first direction, the second body wall extends in a second direction that is different than the first direction, a first portion of the tube passes through an opening in the second body wall the first support portion is configured to attach to the first body wall, and a second portion of the tube is configured to pass through the second support portion when the first support portion is attached to the first body wall. An interior of the tube and an interior of the body are configured to receive molten target material, and the target material emits extreme ultraviolet (EUV) light when in a plasma state.
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公开(公告)号：US20150250045A1
公开(公告)日：2015-09-03
申请号：US14194027
申请日：2014-02-28
Applicant: ASML Netherlands B.V.
Inventor： Yezheng Tao , Daniel J.W. Brown , Alexander Schafgans , Michael David Caudill , Daniel J. Golich , Richard L. Sandstrom , Yoshiho Amada
CPC classification number: H05G2/008 , H01S3/1003 , H01S3/1301 , H01S3/1305 , H05G2/003
Abstract: A system for an extreme ultraviolet (EUV) light source includes an optical amplifier including a gain medium positioned on a beam path, the optical amplifier configured to receive a light beam at an input and to emit an output light beam for an EUV light source at an output; a feedback system that measures a property of the output light beam and produces a feedback signal based on the measured property; and an adaptive optic positioned in the beam path and configured to receive the feedback signal and to adjust a property of the output light beam in response to the feedback signal.
Abstract translation: 一种用于极紫外（EUV）光源的系统包括光放大器，其包括位于光束路径上的增益介质，所述光放大器被配置为在输入处接收光束并且向EUV光源发射输出光束 输出 反馈系统，其测量输出光束的性质并基于测量的属性产生反馈信号; 以及位于所述光束路径中并被配置为接收所述反馈信号并响应于所述反馈信号调整所述输出光束的特性的自适应光学器件。
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公开(公告)号：US09380691B2
公开(公告)日：2016-06-28
申请号：US14194027
申请日：2014-02-28
Applicant: ASML Netherlands B.V.
Inventor： Yezheng Tao , Daniel J. W. Brown , Alexander Schafgans , Michael David Caudill , Daniel J. Golich , Richard L. Sandstrom , Yoshiho Amada
CPC classification number: H05G2/008 , H01S3/1003 , H01S3/1301 , H01S3/1305 , H05G2/003
Abstract: A system for an extreme ultraviolet (EUV) light source includes an optical amplifier including a gain medium positioned on a beam path, the optical amplifier configured to receive a light beam at an input and to emit an output light beam for an EUV light source at an output; a feedback system that measures a property of the output light beam and produces a feedback signal based on the measured property; and an adaptive optic positioned in the beam path and configured to receive the feedback signal and to adjust a property of the output light beam in response to the feedback signal.
Abstract translation: 一种用于极紫外（EUV）光源的系统包括光放大器，其包括位于光束路径上的增益介质，所述光放大器被配置为在输入处接收光束并且向EUV光源发射输出光束 输出 反馈系统，其测量输出光束的性质并基于测量的属性产生反馈信号; 以及位于所述光束路径中并被配置为接收所述反馈信号并响应于所述反馈信号调整所述输出光束的特性的自适应光学器件。
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