公开(公告)号：US20150348931A1

公开(公告)日：2015-12-03

申请号：US14700060

申请日：2015-04-29

Applicant: Advanced Semiconductor Engineering, Inc.

Inventor： Chih-Cheng LEE ,  Yuan Chang SU ,  Cheng-Lin HO ,  Chung-Ming WU ,  You-Lung YEN

IPC: H01L23/00 ,  H01L21/768 ,  H01L23/31 ,  H01L21/56 ,  H01L23/498 ,  H01L21/48 ,  H01L21/683

CPC classification number: H01L23/49838 ,  H01L21/4853 ,  H01L21/4857 ,  H01L21/486 ,  H01L21/565 ,  H01L21/6835 ,  H01L21/76801 ,  H01L21/76877 ,  H01L23/3107 ,  H01L23/3114 ,  H01L23/3121 ,  H01L23/3128 ,  H01L23/3142 ,  H01L23/49811 ,  H01L23/49822 ,  H01L23/49827 ,  H01L24/11 ,  H01L24/16 ,  H01L24/17 ,  H01L24/81 ,  H01L2221/68345 ,  H01L2221/68359 ,  H01L2221/68372 ,  H01L2221/68381 ,  H01L2224/11334 ,  H01L2224/13023 ,  H01L2224/131 ,  H01L2224/13147 ,  H01L2224/16113 ,  H01L2224/16235 ,  H01L2224/16237 ,  H01L2224/81801 ,  H01L2924/014 ,  H01L2924/00014

Abstract: The present disclosure relates to a semiconductor substrate, a semiconductor package structure, and methods for making the same. A method includes providing a substrate and a carrier layer. The substrate includes a first patterned metal layer, a second patterned metal layer spaced from the first patterned metal layer, and a dielectric layer disposed between the first patterned metal layer and the second patterned metal layer. The dielectric layer covers the second patterned metal layer. The dielectric layer defines first openings exposing the second patterned metal layer, and further defines a via opening extending from the first patterned metal layer to the second patterned metal layer. A conductive material is disposed in the via and electrically connects the first patterned metal layer to the second patterned metal layer. The carrier layer defines second openings exposing the second patterned metal layer.

Abstract translation: 本公开涉及半导体衬底，半导体封装结构及其制造方法。 一种方法包括提供衬底和载体层。 衬底包括第一图案化金属层，与第一图案化金属层间隔开的第二图案化金属层，以及设置在第一图案化金属层和第二图案化金属层之间的介电层。 电介质层覆盖第二图案化金属层。 电介质层限定暴露第二图案化金属层的第一开口，并且还限定从第一图案化金属层延伸到第二图案化金属层的通孔。 导电材料设置在通孔中并将第一图案化金属层电连接到第二图案化金属层。 载体层限定暴露第二图案化金属层的第二开口。