Temperature-controlled holding devices for planar articles
    1.
    发明授权
    Temperature-controlled holding devices for planar articles 有权
    用于平面物品的温度控制保持装置

    公开(公告)号:US08767174B2

    公开(公告)日:2014-07-01

    申请号:US13026129

    申请日:2011-02-11

    IPC分类号: G03B27/42

    摘要: An exemplary apparatus includes a controllably movable body, a holding device, and a coolant circulation device. The body comprises a wall including a planar contact surface that receives the reverse surface of the article. The wall co-extends with at least a heat-receiving area of the utility surface whenever the article is being held by the body. The wall also includes a second surface separated from but proximal to the contact surface, and is thermally conductive from the contact surface to the second surface. The holding device holds the article to the contact surface with the reverse surface contacting the contact surface. The coolant circulation device delivers flow of a coolant fluid to the second surface to urge conduction of heat from the contact surface to the second surface. The holding device and coolant-circulation device operate in concert to actively control shape of the article being held by the apparatus.

    摘要翻译: 示例性装置包括可控制的移动体,保持装置和冷却剂循环装置。 该主体包括一个壁,该壁包括接纳制品的相反表面的平面接触表面。 每当物品被身体保持时,墙壁至少与实用表面的受热区域共同延伸。 该壁还包括从接触表面分离但接近接触表面的第二表面,并且从接触表面到第二表面是导热的。 保持装置将物品保持在与接触表面接触的反面的接触表面上。 冷却剂循环装置将冷却剂流体的流动传递到第二表面以促使热量从接触表面传导到第二表面。 保持装置和冷却剂循环装置协同工作以主动地控制由装置保持的物品的形状。

    TEMPERATURE-CONTROLLED HOLDING DEVICES FOR PLANAR ARTICLES
    2.
    发明申请
    TEMPERATURE-CONTROLLED HOLDING DEVICES FOR PLANAR ARTICLES 有权
    用于平面文章的温度控制保持装置

    公开(公告)号:US20110211178A1

    公开(公告)日:2011-09-01

    申请号:US13026129

    申请日:2011-02-11

    IPC分类号: G03B27/52

    摘要: An exemplary apparatus includes a controllably movable body, a holding device, and a coolant circulation device. The body comprises a wall including a planar contact surface that receives the reverse surface of the article. The wall co-extends with at least a heat-receiving area of the utility surface whenever the article is being held by the body. The wall also includes a second surface separated from but proximal to the contact surface, and is thermally conductive from the contact surface to the second surface. The holding device holds the article to the contact surface with the reverse surface contacting the contact surface. The coolant circulation device delivers flow of a coolant fluid to the second surface to urge conduction of heat from the contact surface to the second surface. The holding device and coolant-circulation device operate in concert to actively control shape of the article being held by the apparatus.

    摘要翻译: 示例性装置包括可控制的移动体,保持装置和冷却剂循环装置。 该主体包括一个壁,该壁包括接纳制品的相反表面的平面接触表面。 每当物品被身体保持时,墙壁至少与实用表面的受热区域共同延伸。 该壁还包括从接触表面分离但接近接触表面的第二表面,并且从接触表面到第二表面是导热的。 保持装置将物品保持在与接触表面接触的反面的接触表面上。 冷却剂循环装置将冷却剂流体的流动传递到第二表面以促使热量从接触表面传导到第二表面。 保持装置和冷却剂循环装置协同工作以主动地控制由装置保持的物品的形状。

    EUV reticle handling system and method
    3.
    发明授权
    EUV reticle handling system and method 有权
    EUV掩模版处理系统和方法

    公开(公告)号:US07804583B2

    公开(公告)日:2010-09-28

    申请号:US12242050

    申请日:2008-09-30

    IPC分类号: G03B27/62 G03B27/52

    CPC分类号: G03F7/70741

    摘要: An enclosure for protecting at least a pattern side and an opposing side of a reticle is disclosed. The enclosure includes a first and second part that form an enclosure around a reticle to be protected during handling, inspection, storage, and transport. A method for transporting the reticle to an exposure position from a position outside an exposure chamber is disclosed, including a method for use of a load-lock chamber.

    摘要翻译: 公开了用于保护掩模版的至少一个图案侧和相对侧的外壳。 外壳包括第一和第二部分,其在处理,检查,存储和运输期间形成围绕保护的掩模版的外壳。 公开了一种用于将掩模版从暴露室外的位置传送到曝光位置的方法,包括使用负载锁定室的方法。

    EUV Reticle Handling System and Method
    4.
    发明申请
    EUV Reticle Handling System and Method 有权
    EUV光栅处理系统和方法

    公开(公告)号:US20090027639A1

    公开(公告)日:2009-01-29

    申请号:US12242050

    申请日:2008-09-30

    IPC分类号: G03B27/52

    CPC分类号: G03F7/70741

    摘要: An enclosure for protecting at least a pattern side and an opposing side of a reticle is disclosed. The enclosure includes a first and second part that form an enclosure around a reticle to be protected during handling, inspection, storage, and transport. The enclosure in conjunction with a heater and heat sink provides thermophoretic protection of an enclosed reticle.

    摘要翻译: 公开了用于保护掩模版的至少一个图案侧和相对侧的外壳。 外壳包括第一和第二部分,其在处理,检查,存储和运输期间形成围绕保护的掩模版的外壳。 外壳与加热器和散热器一起提供封闭的掩模版的热泳保护。

    EUV reticle handling system and method
    5.
    发明授权
    EUV reticle handling system and method 失效
    EUV掩模版处理系统和方法

    公开(公告)号:US07477358B2

    公开(公告)日:2009-01-13

    申请号:US11238237

    申请日:2005-09-28

    IPC分类号: G03B27/62 B65D85/38

    CPC分类号: G03F7/70741

    摘要: An enclosure for protecting at least a pattern side and an opposing side of a reticle is disclosed. The enclosure includes a first and second part that form an enclosure around a reticle to be protected during handling, inspection, storage, and transport. The enclosure in conjunction with a heater and heat sink provides thermophoretic protection of an enclosed reticle.

    摘要翻译: 公开了用于保护掩模版的至少一个图案侧和相对侧的外壳。 外壳包括第一和第二部分,其在处理,检查,存储和运输期间形成围绕保护的掩模版的外壳。 外壳与加热器和散热器一起提供封闭的掩模版的热泳保护。

    INTERMITTENT TEMPERATURE CONTROL OF MOVABLE OPTICAL ELEMENTS
    6.
    发明申请
    INTERMITTENT TEMPERATURE CONTROL OF MOVABLE OPTICAL ELEMENTS 审中-公开
    可移动光学元件的间歇温度控制

    公开(公告)号:US20140176931A1

    公开(公告)日:2014-06-26

    申请号:US14237821

    申请日:2012-08-12

    IPC分类号: G02B26/08 G03F7/20

    摘要: An optical system including an optical element, a positioning mechanism configured to position the optical element into an operational position, and a temperature control mechanism configured to intermittently control the temperature of the optical element between operations. By alternatively positioning the optical element between an operational position and a position in thermal contact with the temperature control mechanism, the two mechanisms for positioning and controlling the temperature of the optical element are de-coupled from one another. As a result, the mechanism for each may be optimized In non-exclusive embodiments, the temperature control mechanism may be used to control the temperature of an individual optical element or a plurality of optical elements, such as for example, a fly's eye mirror used in an illumination unit of an EUV lithography tool.

    摘要翻译: 一种光学系统,包括光学元件,配置成将光学元件定位在操作位置的定位机构,以及配置为在操作之间间歇地控制光学元件的温度的温度控制机构。 通过可选地将光学元件定位在与温度控制机构热接触的操作位置和位置之间,用于定位和控制光学元件的温度的两个机构彼此脱耦合。 结果,可以优化每个的机构在非排他性的实施例中,温度控制机构可用于控制单个光学元件或多个光学元件的温度,例如使用的飞眼镜 在EUV光刻工具的照明单元中。

    Device container assembly with adjustable retainers for a reticle
    8.
    发明申请
    Device container assembly with adjustable retainers for a reticle 审中-公开
    用于掩模版的带可调节保持器的装置容器组件

    公开(公告)号:US20080128303A1

    公开(公告)日:2008-06-05

    申请号:US11634786

    申请日:2006-12-05

    IPC分类号: G03F9/00 B65D85/38

    CPC分类号: G03F7/70741 G03F1/66

    摘要: A device container assembly (30) for storing a reticle (26) includes a first container (246) and a device retainer assembly (248). The first container (246) encircles and encloses the reticle (26). The device retainer assembly (248) selectively couples the reticle to the first container (246). The device retainer assembly (248) can include an adjustable first device retainer (256) having a retainer section (280A) that is movable relative to the first container (246) between an engaged position (281A) in which the retainer section (280A) engages the reticle (26) and a disengaged position (281B) in which the retainer section (280A) does not engage the reticle (26). With this design, the device container assembly (30) can retain the reticle (26) in a secure fashion and the integrity of the reticle (26) is maintained by the device container assembly (30).

    摘要翻译: 一种用于存储掩模版(26)的装置容器组件(30)包括第一容器(246)和装置保持器组件(248)。 第一容器(246)围绕并包围掩模版(26)。 装置保持器组件(248)选择性地将掩模版连接到第一容器(246)。 装置保持器组件(248)可以包括可调节的第一装置保持器(256),其具有保持器部分(280A),该保持器部分可相对于第一容器(246)移动在接合位置(281A)之间, 280A)接合所述掩模版(26)和所述保持器部分(280A)不接合所述掩模版(26)的分离位置(281B)。 通过这种设计,装置容器组件30可以以安全的方式保持掩模版26,并且掩模版26的完整性由装置容器组件30保持。

    Modular exposure apparatus with removable optical device and improved isolation of the optical device
    9.
    发明授权
    Modular exposure apparatus with removable optical device and improved isolation of the optical device 失效
    具有可拆卸光学装置的模块化曝光装置和改进的光学装置的隔离

    公开(公告)号:US06774981B1

    公开(公告)日:2004-08-10

    申请号:US09658615

    申请日:2000-09-08

    IPC分类号: G03B2742

    摘要: An exposure apparatus (10) that includes a support frame (12), a base frame (14), a first stage assembly (16), a second stage assembly (18), an optical frame (20), an optical device (22), and a measurement system (24) is provided herein. The exposure apparatus (10) is typically mounted to a mounting base (30). As provided herein, the optical frame (20), the optical device (22), and a portion of the measurement system (24) can be assembled as an optical assembly (36) that is isolated from the base frame (14) with an optical isolation system (42). Further, the base frame (14), at least a portion of the first stage assembly (16) and the second stage assembly (18) can be assembled as a base assembly (38) that is isolated from the support frame (12) with a base isolation system (40). With this design, the base assembly (38) is isolated from the support frame (12) with the base isolation system (40) and the optical assembly (36) is isolated from the base assembly (38) with the optical isolation system (42). As a result thereof, the assemblies (36), (38) are effectively attached in series to the mounting base (30) with the isolation systems (40), (42) and the optical device (22) is isolated from the mounting base (30) with two levels of isolation. The two levels of isolation systems (40), (42) better isolate the optical device (22) from vibration and disturbances. Further, with the design provided herein, the optical device (22) and the other components of the optical assembly (36) can be accessed relatively easily for service and adjustment.

    摘要翻译: 一种曝光装置(10),包括支撑框架(12),基架(14),第一级组件(16),第二级组件(18),光学框架(20),光学装置 ),并且本文提供了测量系统(24)。 曝光装置(10)通常安装在安装基座(30)上。 如本文所提供的,光学框架(20),光学装置(22)和测量系统(24)的一部分可以组装成与基座框架(14)隔离的光学组件(36) 光隔离系统(42)。 此外,底架(14),第一级组件(16)和第二级组件(18)的至少一部分可以组装成与支撑框架(12)隔离的基座组件(38),基座组件(38)与 基座隔离系统(40)。 通过这种设计,基座组件38与基座隔离系统40与支撑框架12隔离,并且光学组件36与光学隔离系统42的基座组件38隔离。 )。 因此,组件(36),(38)通过隔离系统(40),(42)和光学装置(22)与安装基座隔离而有效地与安装基座(30)连接。 (30)具有两级隔离。 隔离系统(40),(42)的两个级别更好地隔离光学装置(22)与振动和干扰。 此外,通过本文提供的设计,可以相对容易地访问光学装置(22)和光学组件(36)的其它部件以进行维修和调整。

    Method and apparatus for utilizing in-situ measurements techniques in conjunction with thermoelectric chips (TECs)
    10.
    发明授权
    Method and apparatus for utilizing in-situ measurements techniques in conjunction with thermoelectric chips (TECs) 有权
    利用原位测量技术结合热电芯片(TEC)的方法和装置

    公开(公告)号:US08794011B2

    公开(公告)日:2014-08-05

    申请号:US13270522

    申请日:2011-10-11

    IPC分类号: F25B21/02

    摘要: According to one aspect of the present invention, an apparatus includes a surface and a first array. The surface emits radiation, and the first array is arranged over the surface and arranged to provide cooling to the surface, the first array including a plurality of TECs. At least a first sensing arrangement is substantially integrated with the first array, wherein the first sensing arrangement is arranged to make a non-contact measurement associated with the surface. The apparatus also includes a controller arranged to obtain the non-contact measurement and to use the non-contact measurement to control the cooling provided by the first array.

    摘要翻译: 根据本发明的一个方面,一种装置包括表面和第一阵列。 表面发射辐射,并且第一阵列布置在表面上并且布置成向表面提供冷却,第一阵列包括多个TEC。 至少第一感测装置基本上与第一阵列一体化,其中第一感测装置布置成进行与表面相关联的非接触测量。 该装置还包括控制器,其布置成获得非接触式测量并使用非接触测量来控制第一阵列所提供的冷却。