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公开(公告)号：US20100186942A1
公开(公告)日：2010-07-29
申请号：US12643932
申请日：2009-12-21
申请人： Alton H. Phillips , Douglas C. Watson , Hiromitsu Yoshimoto , Noriya Kato , Yusaku Uehara , Leonard Wai Fung Kho
发明人： Alton H. Phillips , Douglas C. Watson , Hiromitsu Yoshimoto , Noriya Kato , Yusaku Uehara , Leonard Wai Fung Kho
摘要： Methods and apparatus for cooling a reticle are disclosed. According to one aspect of the present invention, an apparatus for providing top side cooling to a reticle includes a heat exchanger arrangement and an actuator. The heat exchanger arrangement includes a first surface arranged to facilitate heat transfer between the reticle and the heat exchanger arrangement. The heat transfer provides cooling to at least some portions of the reticle. The actuator positions the first surface of the heat exchanger arrangement at a distance over the reticle.
摘要翻译： 公开了用于冷却掩模版的方法和装置。 根据本发明的一个方面，一种用于向掩模版提供顶侧冷却的装置包括热交换器装置和致动器。 热交换器装置包括布置成便于在标线片和热交换器装置之间传热的第一表面。 热传递为掩模版的至少一些部分提供冷却。 致动器将热交换器装置的第一表面定位在掩模版上方一段距离处。
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2.发明授权Exposure method and device manufacturing method including selective deformation of a mask 有权包括掩模选择性变形的曝光方法和装置制造方法公开(公告)号：US09304385B2
公开(公告)日：2016-04-05
申请号：US12560760
申请日：2009-09-16
CPC分类号： G03B27/32 , G03F1/144 , G03F1/50 , G03F7/70783 , G03F7/70875
摘要： An exposure method that uses a substrate (M) held by a holding member (28) to perform exposure processing, comprising a holding process, which holds a prescribed region (AR3) of the substrate as the holding region by means of the holding member, and a deformation process, which selectively deforms one side of the holding region of the substrate held by the holding process with respect to the other side. According to the present invention, a prescribed region of the substrate is held as a holding region by means of a holding member, and one side of the holding region of said held substrate is selectively deformed with respect to the other side, so it is possible to selectively eliminate the nonlinear deformation components attributable to holding of the substrate with respect to one side from among the two sides of the substrate using the holding region as a reference. Since it is possible to put the pattern projected via the substrate into a linearly correctable status, it is possible to reduce warping of the pattern.
摘要翻译： 一种使用由保持构件（28）保持的基板（M）进行曝光处理的曝光方法，包括通过保持构件保持基板的规定区域（AR3）作为保持区域的保持工序， 以及变形过程，其选择性地使通过保持过程保持的基板的保持区域的一侧相对于另一侧变形。 根据本发明，通过保持构件将衬底的规定区域保持为保持区域，并且所述保持衬底的保持区域的一侧相对于另一侧选择性地变形，因此可能 以使用保持区域作为基准来选择性地消除归因于基板相对于基板的两侧之间的一侧的保持的非线性变形分量。 由于可以将通过基板投射的图案置于线性可校正状态，可以减少图案的翘曲。
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公开(公告)号：US20100097588A1
公开(公告)日：2010-04-22
申请号：US12560760
申请日：2009-09-16
CPC分类号： G03B27/32 , G03F1/144 , G03F1/50 , G03F7/70783 , G03F7/70875
摘要： An exposure method that uses a substrate (M) held by a holding member (28) to perform exposure processing, comprising a holding process, which holds a prescribed region (AR3) of the substrate as the holding region by means of the holding member, and a deformation process, which selectively deforms one side of the holding region of the substrate held by the holding process with respect to the other side. According to the present invention, a prescribed region of the substrate is held as a holding region by means of a holding member, and one side of the holding region of said held substrate is selectively deformed with respect to the other side, so it is possible to selectively eliminate the nonlinear deformation components attributable to holding of the substrate with respect to one side from among the two sides of the substrate using the holding region as a reference. Since it is possible to put the pattern projected via the substrate into a linearly correctable status, it is possible to reduce warping of the pattern.
摘要翻译： 一种使用由保持构件（28）保持的基板（M）进行曝光处理的曝光方法，包括通过保持构件保持基板的规定区域（AR3）作为保持区域的保持工序， 以及变形过程，其选择性地使通过保持过程保持的基板的保持区域的一侧相对于另一侧变形。 根据本发明，通过保持构件将衬底的规定区域保持为保持区域，并且所述保持衬底的保持区域的一侧相对于另一侧选择性地变形，因此可能 以使用保持区域作为基准来选择性地消除归因于基板相对于基板的两侧之间的一侧的保持的非线性变形分量。 由于可以将通过基板投射的图案置于线性可校正状态，可以减少图案的翘曲。
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公开(公告)号：US20090033907A1
公开(公告)日：2009-02-05
申请号：US12168726
申请日：2008-07-07
申请人： Douglas C. Watson , Christopher S. Margeson , Alton H. Phillips , Hiromitsu Yoshimoto , Noriya Kato
发明人： Douglas C. Watson , Christopher S. Margeson , Alton H. Phillips , Hiromitsu Yoshimoto , Noriya Kato
IPC分类号： G03B27/62
摘要： Devices and methods are disclosed for holding a reticle or analogous object, particularly a planar object. An exemplary reticle-holding device includes a reticle chuck having a reticle-holding surface on which a reticle is placed to hold the reticle. The device includes at least one ultrasonic transducer (as an exemplary vibration-inducing device) sonically coupled to the reticle to excite, whenever the ultrasonic transducer is being energized, a vibrational mode in the reticle or reticle chuck, or both. The vibration mode is sufficient to reduce an adhesion force holding the reticle to the reticle-holding surface. Sonic coupling can be by direct contact with the transducer or across a gap.
摘要翻译： 公开了用于保持掩模版或类似物体，特别是平面物体的装置和方法。 示例性的掩模版保持装置包括具有掩模版保持表面的掩模版卡盘，在其上放置掩模版以保持掩模版。 每当超声波换能器通电时，该装置包括至少一个超声波换能器（作为示例性的振动诱导装置），其超声波耦合到光罩以激发，在标线片或光罩卡盘或两者中均振动模式。 振动模式足以减少将掩模版保持在掩模版保持表面上的粘附力。 声波耦合可以通过与换能器或间隙直接接触。
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公开(公告)号：US20120120379A1
公开(公告)日：2012-05-17
申请号：US13090183
申请日：2011-04-19
IPC分类号： G03B27/68
CPC分类号： F28F3/12 , F28D2021/0077 , G03F7/70783 , G03F7/70875
摘要： An apparatus for controlling the distortion of a reticle (28) includes a temperature adjuster (258) and a control system (226). The temperature adjuster (258) includes a plurality of adjuster elements (258E) that individually adjust the temperature of a plurality of regions (28R) of the reticle (28). The control system (226) includes a state observer (250) and a controller (260). The state observer (250) estimates an estimated physical condition (250C) of the reticle (28). The controller (260) controls the adjuster elements (258E) of the temperature adjuster (258) based at least in part on the estimated physical condition (250C).
摘要翻译： 用于控制掩模版（28）的变形的装置包括温度调节器（258）和控制系统（226）。 温度调节器（258）包括分别调节掩模版（28）的多个区域（28R）的温度的多个调节元件（258E）。 控制系统（226）包括状态观察器（250）和控制器（260）。 状态观察器（250）估计掩模版（28）的估计的物理条件（250℃）。 控制器（260）至少部分地基于估计的身体状况（250C）来控制温度调节器（258）的调节器元件（258E）。
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公开(公告)号：US08767174B2
公开(公告)日：2014-07-01
申请号：US13026129
申请日：2011-02-11
IPC分类号： G03B27/42
CPC分类号： H01L21/67109 , G03F7/70716 , G03F7/70875
摘要： An exemplary apparatus includes a controllably movable body, a holding device, and a coolant circulation device. The body comprises a wall including a planar contact surface that receives the reverse surface of the article. The wall co-extends with at least a heat-receiving area of the utility surface whenever the article is being held by the body. The wall also includes a second surface separated from but proximal to the contact surface, and is thermally conductive from the contact surface to the second surface. The holding device holds the article to the contact surface with the reverse surface contacting the contact surface. The coolant circulation device delivers flow of a coolant fluid to the second surface to urge conduction of heat from the contact surface to the second surface. The holding device and coolant-circulation device operate in concert to actively control shape of the article being held by the apparatus.
摘要翻译： 示例性装置包括可控制的移动体，保持装置和冷却剂循环装置。 该主体包括一个壁，该壁包括接纳制品的相反表面的平面接触表面。 每当物品被身体保持时，墙壁至少与实用表面的受热区域共同延伸。 该壁还包括从接触表面分离但接近接触表面的第二表面，并且从接触表面到第二表面是导热的。 保持装置将物品保持在与接触表面接触的反面的接触表面上。 冷却剂循环装置将冷却剂流体的流动传递到第二表面以促使热量从接触表面传导到第二表面。 保持装置和冷却剂循环装置协同工作以主动地控制由装置保持的物品的形状。
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公开(公告)号：US20140176931A1
公开(公告)日：2014-06-26
申请号：US14237821
申请日：2012-08-12
申请人： Alton H. Phillips , Douglas C. Watson , Travis D. Bow , Hiroyuki Kondo , Atsushi Yamada , Hideo Takino , Hideki Komatsuda
发明人： Alton H. Phillips , Douglas C. Watson , Travis D. Bow , Hiroyuki Kondo , Atsushi Yamada , Hideo Takino , Hideki Komatsuda
CPC分类号： G02B26/0816 , G03F7/70075 , G03F7/702 , G03F7/70825 , G03F7/70891 , G03F7/7095
摘要： An optical system including an optical element, a positioning mechanism configured to position the optical element into an operational position, and a temperature control mechanism configured to intermittently control the temperature of the optical element between operations. By alternatively positioning the optical element between an operational position and a position in thermal contact with the temperature control mechanism, the two mechanisms for positioning and controlling the temperature of the optical element are de-coupled from one another. As a result, the mechanism for each may be optimized In non-exclusive embodiments, the temperature control mechanism may be used to control the temperature of an individual optical element or a plurality of optical elements, such as for example, a fly's eye mirror used in an illumination unit of an EUV lithography tool.
摘要翻译： 一种光学系统，包括光学元件，配置成将光学元件定位在操作位置的定位机构，以及配置为在操作之间间歇地控制光学元件的温度的温度控制机构。 通过可选地将光学元件定位在与温度控制机构热接触的操作位置和位置之间，用于定位和控制光学元件的温度的两个机构彼此脱耦合。 结果，可以优化每个的机构在非排他性的实施例中，温度控制机构可用于控制单个光学元件或多个光学元件的温度，例如使用的飞眼镜 在EUV光刻工具的照明单元中。
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公开(公告)号：US20110211178A1
公开(公告)日：2011-09-01
申请号：US13026129
申请日：2011-02-11
IPC分类号： G03B27/52
CPC分类号： H01L21/67109 , G03F7/70716 , G03F7/70875
摘要： An exemplary apparatus includes a controllably movable body, a holding device, and a coolant circulation device. The body comprises a wall including a planar contact surface that receives the reverse surface of the article. The wall co-extends with at least a heat-receiving area of the utility surface whenever the article is being held by the body. The wall also includes a second surface separated from but proximal to the contact surface, and is thermally conductive from the contact surface to the second surface. The holding device holds the article to the contact surface with the reverse surface contacting the contact surface. The coolant circulation device delivers flow of a coolant fluid to the second surface to urge conduction of heat from the contact surface to the second surface. The holding device and coolant-circulation device operate in concert to actively control shape of the article being held by the apparatus.
摘要翻译： 示例性装置包括可控制的移动体，保持装置和冷却剂循环装置。 该主体包括一个壁，该壁包括接纳制品的相反表面的平面接触表面。 每当物品被身体保持时，墙壁至少与实用表面的受热区域共同延伸。 该壁还包括从接触表面分离但接近接触表面的第二表面，并且从接触表面到第二表面是导热的。 保持装置将物品保持在与接触表面接触的反面的接触表面上。 冷却剂循环装置将冷却剂流体的流动传递到第二表面以促使热量从接触表面传导到第二表面。 保持装置和冷却剂循环装置协同工作以主动地控制由装置保持的物品的形状。
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9.发明申请公开(公告)号：US20080128303A1
公开(公告)日：2008-06-05
申请号：US11634786
申请日：2006-12-05
CPC分类号： G03F7/70741 , G03F1/66
摘要： A device container assembly (30) for storing a reticle (26) includes a first container (246) and a device retainer assembly (248). The first container (246) encircles and encloses the reticle (26). The device retainer assembly (248) selectively couples the reticle to the first container (246). The device retainer assembly (248) can include an adjustable first device retainer (256) having a retainer section (280A) that is movable relative to the first container (246) between an engaged position (281A) in which the retainer section (280A) engages the reticle (26) and a disengaged position (281B) in which the retainer section (280A) does not engage the reticle (26). With this design, the device container assembly (30) can retain the reticle (26) in a secure fashion and the integrity of the reticle (26) is maintained by the device container assembly (30).
摘要翻译： 一种用于存储掩模版（26）的装置容器组件（30）包括第一容器（246）和装置保持器组件（248）。 第一容器（246）围绕并包围掩模版（26）。 装置保持器组件（248）选择性地将掩模版连接到第一容器（246）。 装置保持器组件（248）可以包括可调节的第一装置保持器（256），其具有保持器部分（280A），该保持器部分可相对于第一容器（246）移动在接合位置（281A）之间， 280A）接合所述掩模版（26）和所述保持器部分（280A）不接合所述掩模版（26）的分离位置（281B）。 通过这种设计，装置容器组件30可以以安全的方式保持掩模版26，并且掩模版26的完整性由装置容器组件30保持。
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10.发明授权Modular exposure apparatus with removable optical device and improved isolation of the optical device 失效具有可拆卸光学装置的模块化曝光装置和改进的光学装置的隔离公开(公告)号：US06774981B1
公开(公告)日：2004-08-10
申请号：US09658615
申请日：2000-09-08
IPC分类号： G03B2742
CPC分类号： G03F7/70691 , G03B27/42 , G03F7/708
摘要： An exposure apparatus (10) that includes a support frame (12), a base frame (14), a first stage assembly (16), a second stage assembly (18), an optical frame (20), an optical device (22), and a measurement system (24) is provided herein. The exposure apparatus (10) is typically mounted to a mounting base (30). As provided herein, the optical frame (20), the optical device (22), and a portion of the measurement system (24) can be assembled as an optical assembly (36) that is isolated from the base frame (14) with an optical isolation system (42). Further, the base frame (14), at least a portion of the first stage assembly (16) and the second stage assembly (18) can be assembled as a base assembly (38) that is isolated from the support frame (12) with a base isolation system (40). With this design, the base assembly (38) is isolated from the support frame (12) with the base isolation system (40) and the optical assembly (36) is isolated from the base assembly (38) with the optical isolation system (42). As a result thereof, the assemblies (36), (38) are effectively attached in series to the mounting base (30) with the isolation systems (40), (42) and the optical device (22) is isolated from the mounting base (30) with two levels of isolation. The two levels of isolation systems (40), (42) better isolate the optical device (22) from vibration and disturbances. Further, with the design provided herein, the optical device (22) and the other components of the optical assembly (36) can be accessed relatively easily for service and adjustment.
摘要翻译： 一种曝光装置（10），包括支撑框架（12），基架（14），第一级组件（16），第二级组件（18），光学框架（20），光学装置 ），并且本文提供了测量系统（24）。 曝光装置（10）通常安装在安装基座（30）上。 如本文所提供的，光学框架（20），光学装置（22）和测量系统（24）的一部分可以组装成与基座框架（14）隔离的光学组件（36） 光隔离系统（42）。 此外，底架（14），第一级组件（16）和第二级组件（18）的至少一部分可以组装成与支撑框架（12）隔离的基座组件（38），基座组件（38）与 基座隔离系统（40）。 通过这种设计，基座组件38与基座隔离系统40与支撑框架12隔离，并且光学组件36与光学隔离系统42的基座组件38隔离。 ）。 因此，组件（36），（38）通过隔离系统（40），（42）和光学装置（22）与安装基座隔离而有效地与安装基座（30）连接。 （30）具有两级隔离。 隔离系统（40），（42）的两个级别更好地隔离光学装置（22）与振动和干扰。 此外，通过本文提供的设计，可以相对容易地访问光学装置（22）和光学组件（36）的其它部件以进行维修和调整。
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