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公开(公告)号：US20060268250A1
公开(公告)日：2006-11-30
申请号：US11499780
申请日：2006-08-07
申请人： Antonius Maria Derksen , Sjoerd Donders , Christiaan Hoogendam , Joeri Lof , Erik Loopstra , Johannes Mulkens , Hans Jansen , Jacobus Johannus Hendricus Verspay , Alexander Straaijer , Bob Streefkerk
发明人： Antonius Maria Derksen , Sjoerd Donders , Christiaan Hoogendam , Joeri Lof , Erik Loopstra , Johannes Mulkens , Hans Jansen , Jacobus Johannus Hendricus Verspay , Alexander Straaijer , Bob Streefkerk
IPC分类号： G03B27/42
CPC分类号： G03F7/70866 , G03F7/70341 , G03F7/707 , G03F7/70716 , G03F7/70833 , G03F7/7085 , G03F7/70916 , G03F9/7088
摘要： A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
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公开(公告)号：US20060176458A1
公开(公告)日：2006-08-10
申请号：US11375039
申请日：2006-03-15
申请人： Antonius Maria Derksen , Sjoerd Donders , Christiaan Hoogendam , Joeri Lof , Erik Loopstra , Jeroen Maria Mertens , Johannes Mulkens , Timotheus Sengers , Alexander Straaijer , Bob Streefkerk
发明人： Antonius Maria Derksen , Sjoerd Donders , Christiaan Hoogendam , Joeri Lof , Erik Loopstra , Jeroen Maria Mertens , Johannes Mulkens , Timotheus Sengers , Alexander Straaijer , Bob Streefkerk
IPC分类号： G03B27/42
CPC分类号： G03F7/707 , G03F7/70341 , G03F7/70833 , G03F7/7085 , G03F7/70916 , G03F9/7088
摘要： In a lithographic projection apparatus, a liquid supply system provides liquid in a space between the final element of the projection system and the substrate of the lithographic projection apparatus. A shutter member is provided to contain liquid in the liquid supply system during, for example, substrate exchange.
摘要翻译： 在光刻投影设备中，液体供应系统在投影系统的最终元件和光刻投影设备的基板之间的空间中提供液体。 提供挡板构件以在例如基板交换期间容纳液体供应系统中的液体。
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公开(公告)号：US20050046813A1
公开(公告)日：2005-03-03
申请号：US10890400
申请日：2004-07-14
IPC分类号： H01L21/027 , G03F7/20 , G03B27/52
CPC分类号： G03F7/70875 , G03F7/70258 , G03F7/70341 , G03F7/70716 , G03F7/70891
摘要： An immersion lithography apparatus comprises a temperature controller configured to adjust a temperature of a projection system, a substrate and a liquid towards a common target temperature. Controlling the temperature of these elements and reducing temperature gradients may improve imaging consistency and general lithographic performance. Measures to control the temperature may include controlling the immersion liquid flow rate and liquid temperature, for example, via a feedback circuit.
摘要翻译： 浸没式光刻设备包括温度控制器，该温度控制器被配置为朝向共同的目标温度调节投影系统，基板和液体的温度。 控制这些元件的温度并降低温度梯度可以提高成像的一致性和一般的光刻性能。 控制温度的措施可以包括例如经由反馈电路来控制浸没液体流速和液体温度。
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公开(公告)号：US20050168713A1
公开(公告)日：2005-08-04
申请号：US11053328
申请日：2005-02-09
IPC分类号： H01L21/00 , G03F7/20 , H01L21/02 , H01L21/027 , G03B27/52
CPC分类号： G03F7/70341 , G03F7/20 , G03F7/70358 , G03F7/709 , H01L21/027
摘要： A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system that focuses the electromagnetic radiation on the substrate. A liquid supply system provides liquid flow between the projection optical system and the substrate. An optional plurality of micronozzles are arranged around the periphery of one side of the projection optical system so as to provide a substantially uniform velocity distribution of the liquid flow in an area where the substrate is being exposed.
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公开(公告)号：US20070258076A1
公开(公告)日：2007-11-08
申请号：US11429451
申请日：2006-05-08
IPC分类号： G03B27/54
CPC分类号： G03F7/707 , G03F7/70216
摘要： A masking apparatus for preventing irradiation of an outer region of a substrate during lithography is disclosed. The masking apparatus includes a mask that includes a plurality of discrete segments arranged to form a continuous ring shaped mask positioned between an outer region of a substrate and an illumination system.
摘要翻译： 公开了一种用于在光刻期间防止基板的外部区域的照射的掩模装置。 掩模装置包括掩模，该掩模包括多个分立的部分，其布置成形成位于基板的外部区域和照明系统之间的连续的环形掩模。
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