公开(公告)号：US20060279718A1

公开(公告)日：2006-12-14

申请号：US11441348

申请日：2006-05-26

申请人： Arie Den Boef ,  Jacobus Burghoorn ,  Martinus Leenders ,  Uwe Mickan ,  Roeland Vanneer ,  Jan Hauschild

发明人： Arie Den Boef ,  Jacobus Burghoorn ,  Martinus Leenders ,  Uwe Mickan ,  Roeland Vanneer ,  Jan Hauschild

IPC分类号： G03B27/52

CPC分类号： G03F7/70641 ,  G03F7/70283 ,  G03F9/7026 ,  G03F9/7069

摘要： A method for performing a tilted focus test includes the steps of providing a target object, providing a projection beam of radiation using a radiation source, providing a reflective device to introduce a projected projection beam of radiation onto the target portion, introducing a first projected projection beam of radiation onto the target object using the reflective device in a first orientation, using a tilting device for tilting the reflective device to a second orientation to provide a second projection beam with a tilt relative to said first projection beam, introducing a second projected projection beam of radiation onto the target object, and determining a lateral shift of the first and second projected projection beams on the target object and determining from said lateral shift a defocus of the target object with respect to the projected projection beam.

摘要翻译： 执行倾斜聚焦测试的方法包括以下步骤：提供目标物体，使用辐射源提供辐射投影光束，提供反射装置以将投射的投射射束投射到目标部分上，引入第一投射投影 使用倾斜装置将反射装置倾斜到第二取向以提供具有相对于所述第一投影光束的倾斜的第二投影光束，引入第二投射投影 确定目标物体上的第一和第二投影投影光束的横向位移，并根据所述横向偏移确定目标物体相对于投影投影光束的散焦。

公开(公告)号：US20050046845A1

公开(公告)日：2005-03-03

申请号：US10882685

申请日：2004-07-02

申请人： Gerrit Nijmeijer ,  Anastasius Jacobus Bruinsma ,  Christiaan Hoogendam ,  Jeroen Broekhuijse ,  Sigurd Dressler ,  Edwin Eduard Nicolaas Krijnen ,  Robbert Van Leeuwen ,  Roeland Vanneer ,  Cornelis Ottens

发明人： Gerrit Nijmeijer ,  Anastasius Jacobus Bruinsma ,  Christiaan Hoogendam ,  Jeroen Broekhuijse ,  Sigurd Dressler ,  Edwin Eduard Nicolaas Krijnen ,  Robbert Van Leeuwen ,  Roeland Vanneer ,  Cornelis Ottens

IPC分类号： G03F7/207 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/68 ,  G01B11/02

CPC分类号： G03F9/7088 ,  G03F7/70808 ,  G03F7/70841 ,  G03F7/70858 ,  G03F9/7015 ,  G03F9/7096 ,  H01L21/682

摘要： A lithographic apparatus includes a measurement system including at least one optical component and at least one electrical component. The electrical component is configured to dissipate heat. The optical component is mounted on a first frame of the apparatus, and the electrical component is mounted on a second frame of the apparatus that is thermally and mechanically decoupled from the first frame. An optical coupling is provided between the first frame and the second frame.

摘要翻译： 光刻设备包括测量系统，该测量系统包括至少一个光学部件和至少一个电气部件。 电气部件被配置为散热。 光学部件安装在设备的第一框架上，并且电气部件安装在与第一框架热和机械分离的设备的第二框架上。 在第一框架和第二框架之间设置光耦合器。