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公开(公告)号：US20100141909A1
公开(公告)日：2010-06-10
申请号：US12519077
申请日：2007-11-27
申请人： Arnoud Cornelis Wassink , Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Konstantin Nikolaevitch Koshelev , Theodorus Petrus Maria Cadee , Vladimir Mihailòvitch Krivtsun , Derk Jan Wilfred Klunder , Maarten Marinus Johannes Wilhelmus Van Herpen , Paul Peter Anna Antonius Brom , Wouter Anthon Soer , Denis Alexandrovich Glushkov
发明人： Arnoud Cornelis Wassink , Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Konstantin Nikolaevitch Koshelev , Theodorus Petrus Maria Cadee , Vladimir Mihailòvitch Krivtsun , Derk Jan Wilfred Klunder , Maarten Marinus Johannes Wilhelmus Van Herpen , Paul Peter Anna Antonius Brom , Wouter Anthon Soer , Denis Alexandrovich Glushkov
CPC分类号： G03F7/70933 , G03F7/70858 , G03F7/70883 , G03F7/70916 , G03F7/70925 , G03F7/70983 , H05G2/003 , H05G2/005
摘要： A radiation system for generating a beam of radiation that defines an optical axis is provided. The radiation system includes a plasma produced discharge source for generating EUV radiation. The discharge source includes a pair of electrodes constructed and arranged to be provided with a voltage difference, and a system for producing a plasma between the pair of electrodes so as to provide a discharge in the plasma between the electrodes. The radiation system also includes a debris catching shield for catching debris from the electrodes. The debris catching shield is constructed and arranged to shield the electrodes from a line of sight provided in a predetermined spherical angle relative the optical axis, and to provide an aperture to a central area between the electrodes in the line of sight.
摘要翻译： 提供了一种用于产生限定光轴的辐射束的辐射系统。 辐射系统包括用于产生EUV辐射的等离子体产生的放电源。 放电源包括一对构造和布置成具有电压差的电极，以及用于在一对电极之间产生等离子体的系统，以便在电极之间的等离子体中提供放电。 辐射系统还包括用于从电极捕获碎屑的碎片捕获屏蔽。 碎片捕捉屏蔽被构造和布置成屏蔽电极与相对于光轴以预定球面角度提供的视线，并为视线中的电极之间的中心区域提供孔。
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公开(公告)号：US07696492B2
公开(公告)日：2010-04-13
申请号：US11637936
申请日：2006-12-13
申请人： Arnoud Cornelis Wassink , Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Konstantin Nikolaevitch Koshelev , Theodorus Petrus Maria Cadee , Vladimir Mihailovitch Krivtsun , Derk Jan Wilfred Klunder , Maarten Marinus Johannes Wilhelmus Van Herpen , Paul Peter Anna Antonius Brom , Wouter Anthon Soer
发明人： Arnoud Cornelis Wassink , Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Konstantin Nikolaevitch Koshelev , Theodorus Petrus Maria Cadee , Vladimir Mihailovitch Krivtsun , Derk Jan Wilfred Klunder , Maarten Marinus Johannes Wilhelmus Van Herpen , Paul Peter Anna Antonius Brom , Wouter Anthon Soer
CPC分类号： G03F7/70933 , G03F7/70858 , G03F7/70883 , G03F7/70916 , G03F7/70925 , G03F7/70983 , H05G2/003 , H05G2/005
摘要： A radiation system for generating a beam of radiation that defines an optical axis is provided. The radiation system includes a plasma produced discharge source for generating EUV radiation. The discharge source includes a pair of electrodes constructed and arranged to be provided with a voltage difference, and a system for producing a plasma between the pair of electrodes so as to provide a discharge in the plasma between the electrodes. The radiation system also includes a debris catching shield for catching debris from the electrodes. The debris catching shield is constructed and arranged to shield the electrodes from a line of sight provided in a predetermined spherical angle relative the optical axis, and to provide an aperture to a central area between the electrodes in the line of sight.
摘要翻译： 提供了一种用于产生限定光轴的辐射束的辐射系统。 辐射系统包括用于产生EUV辐射的等离子体产生的放电源。 放电源包括一对构造和布置成具有电压差的电极，以及用于在一对电极之间产生等离子体的系统，以便在电极之间的等离子体中提供放电。 辐射系统还包括用于从电极捕获碎屑的碎片捕获屏蔽。 碎片捕捉屏蔽被构造和布置成屏蔽电极与相对于光轴以预定球面角度提供的视线，并为视线中的电极之间的中心区域提供孔。
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公开(公告)号：US20080142736A1
公开(公告)日：2008-06-19
申请号：US11637936
申请日：2006-12-13
申请人： Arnoud Cornelis Wassink , Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Konstantin Nikolaevitch Koshelev , Theodorus Petrus Maria Cadee , Vladimir Mihailovitch Krivtsun , Derk Jan Wilfred Klunder , Maarten Marinus Johannes Wilhelmus Van Herpen , Paul Peter Anna Antonius Brom , Wouter Anthon Soer
发明人： Arnoud Cornelis Wassink , Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Konstantin Nikolaevitch Koshelev , Theodorus Petrus Maria Cadee , Vladimir Mihailovitch Krivtsun , Derk Jan Wilfred Klunder , Maarten Marinus Johannes Wilhelmus Van Herpen , Paul Peter Anna Antonius Brom , Wouter Anthon Soer
CPC分类号： G03F7/70933 , G03F7/70858 , G03F7/70883 , G03F7/70916 , G03F7/70925 , G03F7/70983 , H05G2/003 , H05G2/005
摘要： A radiation system for generating a beam of radiation that defines an optical axis is provided. The radiation system includes a plasma produced discharge source for generating EUV radiation. The discharge source includes a pair of electrodes constructed and arranged to be provided with a voltage difference, and a system for producing a plasma between the pair of electrodes so as to provide a discharge in the plasma between the electrodes. The radiation system also includes a debris catching shield for catching debris from the electrodes. The debris catching shield is constructed and arranged to shield the electrodes from a line of sight provided in a predetermined spherical angle relative the optical axis, and to provide an aperture to a central area between the electrodes in the line of sight.
摘要翻译： 提供了一种用于产生限定光轴的辐射束的辐射系统。 辐射系统包括用于产生EUV辐射的等离子体产生的放电源。 放电源包括一对构造和布置成具有电压差的电极，以及用于在一对电极之间产生等离子体的系统，以便在电极之间的等离子体中提供放电。 辐射系统还包括用于从电极捕获碎屑的碎片捕获屏蔽。 碎片捕捉屏蔽被构造和布置成屏蔽电极与相对于光轴以预定球面角度提供的视线，并为视线中的电极之间的中心区域提供孔。
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公开(公告)号：US07696493B2
公开(公告)日：2010-04-13
申请号：US11637937
申请日：2006-12-13
申请人： Maarten Marinus Johannes Wilhelmus Van Herpen , Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Konstantin Nikolaevitch Koshelev , Derk Jan Wilfred Klunder
发明人： Maarten Marinus Johannes Wilhelmus Van Herpen , Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Konstantin Nikolaevitch Koshelev , Derk Jan Wilfred Klunder
IPC分类号： G03F7/20
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , H05G2/005
摘要： The invention relates to a radiation system for generating electromagnetic radiation. The radiation system includes a pair of electrodes constructed and arranged to generate plasma of a first substance and a pinch in the plasma. The radiation system also includes a plasma recombination surface that is arranged proximate to the pinch, and is configured to neutralize a plurality of plasma particles.
摘要翻译： 本发明涉及一种用于产生电磁辐射的辐射系统。 辐射系统包括一对电极，其构造和布置成产生等离子体中的第一物质的等离子体和夹持物。 辐射系统还包括等离子体复合表面，该等离子体复合表面被布置成接近于夹紧，并且被配置为中和多个等离子体颗粒。
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公开(公告)号：US20080142741A1
公开(公告)日：2008-06-19
申请号：US11637937
申请日：2006-12-13
申请人： Maarten Marinus Johannes Wilhelmus Van Herpen , Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Konstantin Nikolaevitch Koshelev , Derk Jan Wilfred Klunder
发明人： Maarten Marinus Johannes Wilhelmus Van Herpen , Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Konstantin Nikolaevitch Koshelev , Derk Jan Wilfred Klunder
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , H05G2/005
摘要： The invention relates to a radiation system for generating electromagnetic radiation. The radiation system includes a pair of electrodes constructed and arranged to generate plasma of a first substance and a pinch in the plasma. The radiation system also includes a plasma recombination surface that is arranged proximate to the pinch, and is configured to neutralize a plurality of plasma particles.
摘要翻译： 本发明涉及一种用于产生电磁辐射的辐射系统。 辐射系统包括一对电极，其构造和布置成产生等离子体中的第一物质的等离子体和夹持物。 辐射系统还包括等离子体复合表面，该等离子体复合表面被布置成接近于夹紧，并且被配置为中和多个等离子体颗粒。
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6.发明申请Device arranged to measure a quantity relating to radiation and lithographic apparatus 失效用于测量与辐射和光刻设备有关的数量的设备公开(公告)号：US20080273188A1
公开(公告)日：2008-11-06
申请号：US11797358
申请日：2007-05-02
申请人： Wouter Anthon Soer , Maarten Marinus Johannes Wilhelmus Van Herpen , Niels Machiel Driessen , Vadim Yevgenyevich Banine , Johannes Christiaan Leonardus Franken , Olav Waldemar Vladimir Frijns , Derk Jan Wilfred Klunder
发明人： Wouter Anthon Soer , Maarten Marinus Johannes Wilhelmus Van Herpen , Niels Machiel Driessen , Vadim Yevgenyevich Banine , Johannes Christiaan Leonardus Franken , Olav Waldemar Vladimir Frijns , Derk Jan Wilfred Klunder
IPC分类号： G03B27/74
CPC分类号： G03F7/70916 , G03F7/70558 , G03F7/7085
摘要： A device is arranged to measure a quantity relating to radiation. The device includes a sensor configured to measure the quantity, a screen arranged to protect the sensor from incoming particles emitted from a source configured to emit extreme ultraviolet radiation, and a mirror configured to redirect extreme ultraviolet radiation emitted by the source, past the screen, to the sensor.
摘要翻译： 一个装置被安排来测量与辐射有关的数量。 该装置包括被配置为测量该数量的传感器，布置成保护传感器免受从被配置为发射极紫外辐射的源射出的入射颗粒的屏幕，以及被配置为重定向由该源发射的超过紫外线的过滤器， 到传感器。
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公开(公告)号：US20080074655A1
公开(公告)日：2008-03-27
申请号：US11527731
申请日：2006-09-27
申请人： Maarten Marinus Johannes Wilhelmus Van Herpen , Vadim Yevgenyevich Banine , Derk Jan Wilfred Klunder , Wouter Anthon Soer , Johannes Christiaan Leonardus Franken , Olav Waldemar Vladimir Frijns , Niels Machiel Driessen
发明人： Maarten Marinus Johannes Wilhelmus Van Herpen , Vadim Yevgenyevich Banine , Derk Jan Wilfred Klunder , Wouter Anthon Soer , Johannes Christiaan Leonardus Franken , Olav Waldemar Vladimir Frijns , Niels Machiel Driessen
IPC分类号： G01N21/00
CPC分类号： G03F7/70916 , G01N21/15 , G03F7/70558
摘要： An optical sensor apparatus for use in an extreme ultraviolet lithographic system is disclosed. The apparatus includes an optical sensor comprising a sensor surface and a removal mechanism configured to remove debris from the sensor surface. Accordingly, dose and/or contamination measurements may be carried out conveniently for the lithographic system.
摘要翻译： 公开了一种用于极紫外光刻系统的光学传感器装置。 该装置包括光学传感器，其包括传感器表面和被配置为从传感器表面去除碎屑的移除机构。 因此，可以方便地为光刻系统进行剂量和/或污染测量。
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公开(公告)号：US07863591B2
公开(公告)日：2011-01-04
申请号：US12465118
申请日：2009-05-13
申请人： Maarten Marinus Johannes Wilhelmus Van Herpen , Vadim Yevgenyevich Banine , Derk Jan Wilfred Klunder , Wouter Anthon Soer , Johannes Christiaan Leonardus Franken , Olav Waldemar Vladimir Frijns , Niels Machiel Driessen
发明人： Maarten Marinus Johannes Wilhelmus Van Herpen , Vadim Yevgenyevich Banine , Derk Jan Wilfred Klunder , Wouter Anthon Soer , Johannes Christiaan Leonardus Franken , Olav Waldemar Vladimir Frijns , Niels Machiel Driessen
IPC分类号： G21K5/00
CPC分类号： G03F7/70916 , G01N21/15 , G03F7/70558
摘要： An optical sensor apparatus for use in an extreme ultraviolet lithographic system is disclosed. The apparatus includes an optical sensor comprising a sensor surface and a removal mechanism configured to remove debris from the sensor surface. Accordingly, dose and/or contamination measurements may be carried out conveniently for the lithographic system.
摘要翻译： 公开了一种用于极紫外光刻系统的光学传感器装置。 该装置包括光学传感器，其包括传感器表面和被配置为从传感器表面去除碎屑的移除机构。 因此，可以方便地为光刻系统进行剂量和/或污染测量。
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公开(公告)号：US07541603B2
公开(公告)日：2009-06-02
申请号：US11527731
申请日：2006-09-27
申请人： Maarten Marinus Johannes Wilhelmus Van Herpen , Vadim Yevgenyevich Banine , Derk Jan Wilfred Klunder , Wouter Anthon Soer , Johannes Christiaan Leonardus Franken , Olav Waldemar Vladimir Frijns , Niels Machiel Driessen
发明人： Maarten Marinus Johannes Wilhelmus Van Herpen , Vadim Yevgenyevich Banine , Derk Jan Wilfred Klunder , Wouter Anthon Soer , Johannes Christiaan Leonardus Franken , Olav Waldemar Vladimir Frijns , Niels Machiel Driessen
IPC分类号： G21K5/00
CPC分类号： G03F7/70916 , G01N21/15 , G03F7/70558
摘要： An optical sensor apparatus for use in an extreme ultraviolet lithographic system is disclosed. The apparatus includes an optical sensor comprising a sensor surface and a removal mechanism configured to remove debris from the sensor surface. Accordingly, dose and/or contamination measurements may be carried out conveniently for the lithographic system.
摘要翻译： 公开了一种用于极紫外光刻系统的光学传感器装置。 该装置包括光学传感器，其包括传感器表面和被配置为从传感器表面去除碎屑的移除机构。 因此，可以方便地为光刻系统进行剂量和/或污染测量。
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10.发明授权公开(公告)号：US07504643B2
公开(公告)日：2009-03-17
申请号：US11444535
申请日：2006-06-01
申请人： Johannes Maria Freriks , Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Derk Jan Wilfred Klunder , Maarten Marinus Johannes Wilhelmus Van Herpen
发明人： Johannes Maria Freriks , Vadim Yevgenyevich Banine , Vladimir Vitalevitch Ivanov , Derk Jan Wilfred Klunder , Maarten Marinus Johannes Wilhelmus Van Herpen
CPC分类号： B82Y10/00 , G03F7/70166 , G03F7/70925
摘要： A cleaning arrangement for a lithographic apparatus module may be provided in a collector. The cleaning arrangement includes a hydrogen radical source configured to provide a hydrogen radical containing gas to at least part of the module and a pump configured to pump gas through the module such that a flow speed of the hydrogen radical containing gas provided through at least part of the module is at least 1 m/s. The cleaning arrangement may also include a gas shutter configured to modulate a flow of the hydrogen radical containing gas to at least part of the module, a buffer volume of at least 1 m3 in communication with the module, and a pump configured to provide a gas pressure in the buffer volume between 0.001 mbar (0.1 Pa) and 1 mbar (100 Pa). The cleaning arrangement may further include a gas return system.
摘要翻译： 用于光刻设备模块的清洁装置可以设置在收集器中。 清洁装置包括被配置为向至少部分模块提供含氢自由基气体的氢根源，以及构造成将气体泵送通过模块的泵，使得通过至少部分的至少一部分提供含氢自由基气体的流速 该模块至少为1米/秒。 清洁装置还可以包括配置成将含氢自由基气体的流动调制到模块的至少一部分的气闸，与模块连通的至少1m 3的缓冲体积以及配置成提供气体的泵 缓冲体积在0.001毫巴（0.1帕）至1毫巴（100帕）之间的压力。 清洁装置还可以包括气体返回系统。
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