公开(公告)号：US11377748B2

公开(公告)日：2022-07-05

申请号：US16762717

申请日：2018-11-19

Applicant: BASF SE

Inventor： Nadine Engelhardt ,  Dieter Mayer ,  Marco Arnold ,  Alexander Fluegel ,  Charlotte Emnet ,  Lucas Benjamin Henderson

IPC: C25D3/18 ,  C25D7/12 ,  C25D5/02

Abstract: A cobalt electrodeposition composition comprising cobalt ions, and particular leveling agents comprising X1—CO—O—R11, X1—SO2—O—R11, X1—PO(OR11)2, X1—SO—O—R11 functional groups, wherein X1 is a divalent group selected from (i) a chemical bond (ii) aryl, (iii) C1 to C12 alkandiyl, which may be interrupted by O atoms, (iv) an arylalkyl group —X11—X12—, (v) an alkylaryl group —X12—X11—, and (vi) —(O—C2H3R12)mO—, R11 is selected from H and C1 to C4 alkyl. R12 is selected from H and C1 to C4 alkyl, X12 is a divalent aryl group, X11 is a divalent C1 to C15 alkandiyl group.

公开(公告)号：US20220177808A1

公开(公告)日：2022-06-09

申请号：US17436992

申请日：2020-03-02

Applicant: BASF SE

Inventor： Susanne Carina Engert ,  Matthias Kellermeier ,  Katrin-Stephanie Tuecking ,  Hans-Christian Raths ,  Guenter Oetter ,  Nadine Engelhardt ,  Alejandra Garcia Marcos ,  Lydia Braun

IPC: C11D1/65 ,  C11D11/00 ,  C11D3/386

Abstract: Described herein is a cationic surfactant. Also described herein is a method of using the cationic surfactant, the method including using the cationic surfactant in laundry detergent compositions (for example in combination with an anionic surfactant, nonionic surfactant and/or enzyme).

公开(公告)号：US20230203695A1

公开(公告)日：2023-06-29

申请号：US17565059

申请日：2021-12-29

Applicant: BASF SE

Inventor： Charlotte Emnet ,  Lucas Benjamin Henderson ,  Alexander Fluegel ,  Sathana Kitayaporn ,  Nadine Engelhardt

IPC: C25D3/38 ,  C25D7/12 ,  C25D5/02 ,  H01L21/768

CPC classification number: C25D3/38 ,  C25D7/123 ,  C25D5/02 ,  H01L21/76873 ,  H01L21/76879 ,  H01L23/53228

Abstract: Described herein is a composition for depositing copper on a semiconductor substrate, the composition including
(a) copper ions;

(b) an additive of formula S1





(c) a complexing agent; and

(d) optionally a buffer or base capable of adjusting the pH to a pH of from 7 to 13;

where the variables are as defined herein; and

where the pH of the composition is from 7 to 13 and where the composition is free of any cyanide.

公开(公告)号：US11459665B2

公开(公告)日：2022-10-04

申请号：US16954333

申请日：2018-12-10

Applicant: BASF SE

Inventor： Alexander Fluegel ,  Marco Arnold ,  Marcel Patrik Kienle ,  Nadine Engelhardt

IPC: C25D3/60 ,  C25D3/32 ,  C25D5/02 ,  C25D7/12

Abstract: Described herein is an aqueous composition including tin ions and at least one compound of formula I where X1, X2 are independently selected from a linear or branched C1-C12 alkanediyl, R11 is a monovalent group of formula —(O—CH2—CHR41)m—OR42, R12, R13, R14 are independently selected from H, R11, and R40; R15 is selected from H, R11, R40 and —X4—N(R21)2, X4 is a divalent group selected from (a) a linear or branched C1 to C12 alkanediyl, and (b) formula —(O—CH2—CHR41)o—, R21 is selected from R11 and R40, R40 is a linear or branched C1-C20 alkyl, R41 is selected from H and a linear or branched C1 to C5 alkyl, R42 is selected from H and a linear or branched C1-C20 alkyl, n is an integer of from 1 to 6, m is an integer of from 2 to 250, and o is an integer of from 1 to 250.

公开(公告)号：US11242606B2

公开(公告)日：2022-02-08

申请号：US17048770

申请日：2019-04-11

Applicant: BASF SE

Inventor： Alexander Fluegel ,  Marco Arnold ,  Nadine Engelhardt ,  Marcel Patrik Kienle

IPC: C25D3/32

Abstract: The present invention provides an aqueous composition comprising tin ions and at least one compound of formula I wherein X1 is selected from a linear or branched C1-C12 alkanediyl, which may optionally be interrupted by O or S or a C5 to C12 aromatic moiety, R11 is a copolymer of ethylene oxide and a further C3 to C6 alkylene oxide, wherein the content of ethylene oxide is from 5 to 30% by weight, R12 is selected from H, R11, R40, R13, R14, are (a) independently selected from H, R11, R40, or (b) may together form a divalent group X13; X13 is selected from a linear or branched C1-C12 alkanediyl, which may optionally be interrupted by O, S or NR43; R40 is H or a linear or branched C1-C20 alkyl, R43 is selected from H, R11 and a linear or branched C1-C20 alkyl.

公开(公告)号：US20220018035A1

公开(公告)日：2022-01-20

申请号：US17312737

申请日：2019-12-10

Applicant: BASF SE

Inventor： Sathana Katayaporn ,  Charlotte Emnet ,  Dieter Mayer ,  Nadine Engelhardt ,  Marco Arnold ,  Lucas Benjamin Henderson ,  Alexander Fluegel

IPC: C25D3/12 ,  C25D7/12 ,  C25D5/18

Abstract: Described herein is a composition including metal ions consisting essentially of cobalt ions, and a specific monomeric and polymeric suppressing agent including a carboxylic, sulfonic, sulfinic, phosphonic, or phosphinic acid functional groups which show a suppressing effect that is required for void-free bottom-up filling of nanometer-sized recessed features.

公开(公告)号：US12134834B2

公开(公告)日：2024-11-05

申请号：US17995186

申请日：2021-03-24

Applicant: BASF SE

Inventor： Marco Arnold ,  Alexander Fluegel ,  Charlotte Emnet ,  Nadine Engelhardt

IPC: C25D3/38

Abstract: Described herein is a composition including copper ions, an acid, and at least one polyaminoamide including, a group of formula L1 [A-B-A′-Z]n[Y—Z]m  (L1) where B is a diacid fragment of formula L2 A, A′ are amine fragments independently selected from the group consisting of formula L3a and formula L3b Y is a co-monomer fragment; Z is a coupling fragment of formula L4 n is an integer of from 1 to 400; and m is 0 or an integer of from 1 to 400.

公开(公告)号：US12098473B2

公开(公告)日：2024-09-24

申请号：US17312737

申请日：2019-12-10

Applicant: BASF SE

Inventor： Sathana Kitayaporn ,  Charlotte Emnet ,  Dieter Mayer ,  Nadine Engelhardt ,  Marco Arnold ,  Lucas Benjamin Henderson ,  Alexander Fluegel

IPC: C25D3/18 ,  C25D3/12 ,  C25D5/18 ,  C25D7/12

CPC classification number: C25D3/18 ,  C25D3/12 ,  C25D5/18 ,  C25D7/123

Abstract: Described herein is a composition including metal ions consisting essentially of cobalt ions, and a specific monomeric and polymeric suppressing agent including a carboxylic, sulfonic, sulfinic, phosphonic, or phosphinic acid functional groups which show a suppressing effect that is required for void-free bottom-up filling of nanometer-sized recessed features.

公开(公告)号：US11840771B2

公开(公告)日：2023-12-12

申请号：US17566426

申请日：2021-12-30

Applicant: BASF SE

Inventor： Alexander Fluegel ,  Marco Arnold ,  Nadine Engelhardt ,  Marcel Patrik Kienle

IPC: C25D3/32 ,  C25D3/30

CPC classification number: C25D3/32 ,  C25D3/30

Abstract: Described herein is an aqueous composition including tin ions and at least one compound of formula I






wherein
X1 is selected from a linear or branched C1-C12 alkanediyl, which may optionally be interrupted by O or S or a C5 to C12 aromatic moiety,
R11 is a copolymer of ethylene oxide and a further C3 to C6 alkylene oxide, wherein the content of ethylene oxide is from 5 to 30% by weight,
R11 is selected from H, R11, R40,
R13, R14 are (a) independently selected from H, R11, R40, or (b) may together form a divalent group X13;
X13 is selected from a linear or branched C1-C12 alkanediyl, which may optionally be
interrupted by O, S or NR43;
R40 is H or a linear or branched C1-C20 alkyl,
R43 is selected from H, R11 and a linear or branched C1-C20 alkyl.

公开(公告)号：US20230203694A1

公开(公告)日：2023-06-29

申请号：US17564979

申请日：2021-12-29

Applicant: BASF SE

Inventor： Charlotte Emnet ,  Lucas Benjamin Henderson ,  Alexander Fluegel ,  Sathana Kitayaporn ,  Nadine Engelhardt

IPC: C25D3/38 ,  C25D7/12 ,  C25D5/00

CPC classification number: C25D3/38 ,  C25D7/123 ,  C25D5/605

Abstract: Described herein is a composition for depositing copper on a semiconductor substrate, the composition including

(a) copper ions;
(b) a grain refiner of formula G1








or salts thereof


(c) a complexing agent; and
(d) optionally a buffer or a base capable of adjusting the pH to a pH of from 7 to 13;
where the variables are as defined herein; and
where the pH of the composition is from 7 to 13.