公开(公告)号：US07315029B2

公开(公告)日：2008-01-01

申请号：US11241880

申请日：2005-09-30

申请人： Dieter Winkler ,  Henry Pearce-Percy ,  Juergen Frosien ,  William J. Devore

发明人： Dieter Winkler ,  Henry Pearce-Percy ,  Juergen Frosien ,  William J. Devore

IPC分类号： G21K1/08 ,  H01J3/14 ,  H01J3/26 ,  H01J49/42

CPC分类号： H01J37/1477 ,  H01J2237/1518 ,  H01J2237/28 ,  H01J2237/3175

摘要： Embodiments of the present invention may be utilized to improve electron beam deflection. One embodiment provides an electrostatic deflection system with electrodes that minimize aberrations and to achieve vertical incidence simultaneously. By using at least two stages of deflection for a deflection direction, the present invention allows the deflected electron beam to pass a back focal plane of an objective lens while deflection capacitors are not disposed across the back focal plane. As a result, deflection electrodes can have an angle of 120° to minimize aberrations and simultaneously achieve vertical incidence of the electron beam on a target to avoid distortions or changes in magnification with height variations of the target or focus variations.

摘要翻译： 本发明的实施例可用于改善电子束偏转。 一个实施例提供一种静电偏转系统，其具有最小化像差并且同时实现垂直入射的电极。 通过对偏转方向使用至少两个偏转级，本发明允许偏转的电子束通过物镜的后焦平面，而偏转电容器不跨过后焦平面设置。 结果，偏转电极可以具有120°的角度以最小化像差并且同时实现电子束在靶上的垂直入射，以避免目标或焦点变化的高度变化引起的变形或放大变化。

公开(公告)号：US07514682B2

公开(公告)日：2009-04-07

申请号：US11537062

申请日：2006-09-29

申请人： Benyamin Buller ,  William J. Devore ,  Juergen Frosien ,  Richard L. Lozes ,  Henry Pearce-Percy ,  Dieter Winkler

发明人： Benyamin Buller ,  William J. Devore ,  Juergen Frosien ,  Richard L. Lozes ,  Henry Pearce-Percy ,  Dieter Winkler

IPC分类号： H01J37/09 ,  G01N23/00 ,  G21K7/00

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/244 ,  H01J2237/004 ,  H01J2237/0213 ,  H01J2237/0262 ,  H01J2237/2448 ,  H01J2237/24571

摘要： Methods and apparatus to facilitate the measurement of the amount of scattered electrons collected by an anti-fogging baffle arrangement are provided. For some embodiments, by affixing a lead to an electrically isolated (floating) portion of the baffle arrangement, the amount of scattered electrons collected thereby may be read out, for example, as a current signal. Thus, for such embodiments, the baffle arrangement may double as a detector, allowing an image of surface (e.g., a mask or substrate surface) to be generated.

摘要翻译： 提供了有助于测量由防雾挡板装置收集的散射电子量的方法和装置。 对于一些实施例，通过将导线附接到挡板装置的电隔离（浮动）部分，由此收集的散射电子的量可以例如被读取为电流信号。 因此，对于这样的实施例，挡板装置可以作为检测器加倍，从而允许产生表面（例如，掩模或衬底表面）的图像。

公开(公告)号：US07227155B2

公开(公告)日：2007-06-05

申请号：US11241789

申请日：2005-09-30

申请人： Benyamin Buller ,  William J. Devore ,  Juergen Frosien ,  Eugene Mirro, Jr. ,  Henry Pearce-Percy ,  Dieter Winkler

发明人： Benyamin Buller ,  William J. Devore ,  Juergen Frosien ,  Eugene Mirro, Jr. ,  Henry Pearce-Percy ,  Dieter Winkler

IPC分类号： H01J37/147

CPC分类号： H01J37/147 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J37/24 ,  H01J37/3174 ,  H01J2237/0432 ,  H01J2237/1504 ,  H01J2237/28

摘要： An apparatus and method for deflecting electron beams with high precision and high throughput. At least one electrode of a deflecting capacitor is connected to a signal source via a coaxial cable. A termination resistor is further connected to the coaxial cable and the electrode at the joint of the coaxial cable and the electrode. The termination resistor has a resistance matched to the impedance of the coaxial cable and the electrode has an impedance matched to half of the impedance of the coaxial. The deflecting capacitors of the present invention have a minimized loss of precision due to eddy current. The spacing of electrodes in the deflecting capacitors is reduced by a factor of approximately two compared to the state-the-art system.

摘要翻译： 一种高精度高通量偏转电子束的装置和方法。 偏转电容器的至少一个电极通过同轴电缆连接到信号源。 终端电阻器还连接到同轴电缆和在同轴电缆和电极的接头处的电极。 终端电阻器具有与同轴电缆的阻抗匹配的电阻，并且电极具有与同轴电缆的阻抗的一半相匹配的阻抗。 本发明的偏转电容器由于涡电流而具有最小的精度损失。 与现有技术的系统相比，偏转电容器中的电极间距减小约2倍。

公开(公告)号：US4987311A

公开(公告)日：1991-01-22

申请号：US391202

申请日：1989-08-08

申请人： William J. Devore

发明人： William J. Devore

IPC分类号： H01L21/027 ,  H01J37/244 ,  H01J37/317 ,  H01L21/30

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/244 ,  H01J37/3174 ,  H01J2237/2441 ,  H01J2237/24475 ,  H01J2237/2449 ,  H01J2237/24507 ,  H01J2237/24578

摘要： Disclosed is a biassing scheme for a beam position location apparatus (50) which comprises electron detector diodes (52) in an electron beam lithography machine (10) such that the detector diodes (52) deposit fewer secondary electrons (62) on a substrate (16) being processed by the electron beam (22) and thus reduce or eliminate any charge buildup on said substrate which deflect the electron beam (22) causing pattern distortion.

公开(公告)号：US07372195B2

公开(公告)日：2008-05-13

申请号：US11286802

申请日：2005-11-22

申请人： Steven T. Coyle ,  Michael R. Scheinfein ,  William J. Devore

发明人： Steven T. Coyle ,  Michael R. Scheinfein ,  William J. Devore

IPC分类号： H01J27/02 ,  H01J27/26

CPC分类号： H01J37/065 ,  H01J37/143 ,  H01J2237/06316 ,  H01J2237/06341

摘要： An electron beam source for use in an electron gun. The electron beam source includes an emitter terminating in a tip. The emitter is configured to generate an electron beam. The electron beam source further includes a suppressor electrode laterally surrounding the emitter such that the tip of the emitter protrudes through the suppressor electrode and an extractor electrode disposed adjacent the tip of the emitter. The extractor electrode comprises a magnetic disk whose magnetic field is aligned with an axis of the electron beam.

摘要翻译： 一种用于电子枪的电子束源。 电子束源包括终端在尖端中的发射器。 发射极被配置为产生电子束。 电子束源还包括横向围绕发射器的抑制电极，使得发射极的尖端突出通过抑制电极和与发射极的顶端相邻设置的提取电极。 提取器电极包括其磁场与电子束的轴线对齐的磁盘。