公开(公告)号：US12131882B2

公开(公告)日：2024-10-29

申请号：US17595807

申请日：2019-05-29

申请人： Hitachi High-Tech Corporation

发明人： Shuntaro Ito ,  Hiromi Mise

IPC分类号： H01J37/24

CPC分类号： H01J37/24 ,  H01J2237/2485

摘要： A charged particle beam device includes a charged particle beam device main body, a computer configured to control the charged particle beam device main body, including a CPU and a DRAM, and including software for controlling the charged particle beam device main body, a monitoring unit configured to monitor a resource usage status in the computer, an allocation availability determination unit configured to determine whether or not a resource for executing processing required by the software is allocatable in the computer according to a monitoring result of the monitoring unit, and a notification unit configured to notify, when the determination of the allocation availability determination unit is negative, information indicating that the determination is negative.

公开(公告)号：US20240290594A1

公开(公告)日：2024-08-29

申请号：US18176195

申请日：2023-02-28

申请人： NuFlare Technology, Inc. ,  NuFlare Technology America, Inc.

发明人： Victor Katsap

IPC分类号： H01J45/00 ,  H01J37/06 ,  H01J37/22 ,  H01J37/24

CPC分类号： H01J45/00 ,  H01J37/06 ,  H01J37/22 ,  H01J37/24

摘要： A method of assessing thermionic electron emitter quality, comprising heating a thermionic electron emitter to an emission temperature thereby causing the emitter to emit electrons, forming the electrons emitted by the emitter into an electron beam, directing the electron beam to an image detector thereby forming an image corresponding to electron emission from a surface of the emitter, and detecting a presence or absence in the image of a pair of intersecting bright band features, each band feature being formed from two parallel lines, the band features corresponding to crystal lattice planes of the emitter. The presence of one pair of intersecting bright band features indicates a single-crystal emitter. The absence of a pair of intersecting band features indicates an amorphous or contaminated emitter. The presence of more than a single pair of intersecting bright band features indicates a polycrystalline emitter. The method is particularly useful for rare-earth hexaboride emitters.

公开(公告)号：US20240222067A1

公开(公告)日：2024-07-04

申请号：US18393233

申请日：2023-12-21

申请人： FEI Company

发明人： Radek Smolka ,  Lukas Zabransky ,  Branislav Straka ,  Marek Melichar

IPC分类号： H01J37/244 ,  H01J37/10 ,  H01J37/24

CPC分类号： H01J37/244 ,  H01J37/10 ,  H01J37/24 ,  H01J2237/24578 ,  H01J2237/2826

摘要： Disclosed herein are systems and methods for calibration of a charged particle beam microscope, including a source configured to generate a CPB comprising a plurality of charged particles having a known energy; at least one lens; a detector; and a controller. According to various disclosed embodiments, the controller may determine, based on a calibration characteristic, that the CPB microscope requires recalibration. Based on that determination, the controller may operate the source to generate a calibration CPB and configure the at least one lens to act as a charged particle mirror. The controller may receive data from the detector associated with the plurality of charged particles after reflecting off the charged particle mirror. The controller may then analyze the data from the detector and automatically recalibrate the CPB microscope based on calibration characteristics in the data from the detector.

公开(公告)号：US20240186106A1

公开(公告)日：2024-06-06

申请号：US18284839

申请日：2022-03-03

申请人： ASML Netherlands B.V.

发明人： Yongxin WANG ,  Bruno LA FONTAINE

IPC分类号： H01J37/24 ,  H01J37/244

CPC分类号： H01J37/24 ,  H01J37/244

摘要： An improved method of performing a self-diagnosis of a charged particle inspection system is disclosed. An improved method comprises triggering a self-diagnosis based on output data of the charged particle inspection system; in response to the triggering of the self-diagnosis, receiving diagnostic data of a sub-system of the charged particle inspection system; identifying an issue associated with the output data based on the diagnostic data of the sub-system; and generating a control signal to adjust an operation parameter of the sub-system according to the identified issue.

公开(公告)号：US20240055219A1

公开(公告)日：2024-02-15

申请号：US18269269

申请日：2021-11-29

申请人： ASML Netherlands B.V.

发明人： Mans Johan Bertil OSTERBERG ,  Kenichi KANAI

IPC分类号： H01J37/147 ,  H01J37/05 ,  H01J37/153 ,  H01J37/28 ,  H01J37/24

CPC分类号： H01J37/1472 ,  H01J37/05 ,  H01J37/153 ,  H01J37/28 ,  H01J37/24 ,  H01J2237/1508

摘要： Apparatus and methods for directing a beam of primary electrons along a primary beam path onto a sample are disclosed. In one arrangement, a beam separator diverts away from the primary beam path a beam of secondary electrons emitted from the sample along the primary beam path. A dispersion device is upbeam from the beam separator. The dispersion device compensates for dispersion induced in the primary beam by the beam separator. One or more common power supplies drive both the beam separator and the dispersion device.

公开(公告)号：US20180190891A1

公开(公告)日：2018-07-05

申请号：US15740131

申请日：2016-06-01

申请人： SUMITOMO ELECTRIC INDUSTRIES, LTD.

发明人： Masahiro ADACHI ,  Takashi MATSUURA

IPC分类号： H01L35/26 ,  H01L35/22 ,  H01L35/34 ,  G01J1/04

CPC分类号： H01L35/26 ,  B82Y15/00 ,  B82Y20/00 ,  B82Y30/00 ,  B82Y40/00 ,  C01B33/06 ,  G01J1/02 ,  G01J1/0407 ,  G01J5/046 ,  G01J5/12 ,  H01J37/24 ,  H01L35/22 ,  H01L35/34 ,  Y10S977/773 ,  Y10S977/814 ,  Y10S977/90 ,  Y10S977/954

摘要： This invention relates to a thermoelectric material constituted of nanostructures and a thermoelectric element and an optical sensor including the same, as well as to a method for manufacturing a thermoelectric material constituted of nanostructures. An object of the present disclosure is to achieve better thermoelectric characteristics of the thermoelectric material containing nanoparticles. The thermoelectric material includes a first material having a band gap and a second material different from the first material. The thermoelectric material contains a plurality of nanoparticles distributed in a base material which is a mixture of the first material and the second material. A composition of the second material in the thermoelectric material is not lower than 0.01 atomic % and not higher than 2.0 atomic % of the thermoelectric material.

公开(公告)号：US20180108512A1

公开(公告)日：2018-04-19

申请号：US15556400

申请日：2015-03-31

申请人： Hitachi High-Technologies Corporation

发明人： Kazuki ISHIZAWA ,  Hiroyuki CHIBA ,  Yoshihiro TAKAHOKO ,  Daichi NARA

IPC分类号： H01J37/28 ,  H01J37/147

CPC分类号： H01J37/28 ,  H01J37/1471 ,  H01J37/20 ,  H01J37/22 ,  H01J37/24 ,  H01J2237/1501 ,  H01J2237/20292 ,  H01J2237/2814 ,  H01J2237/2816 ,  H01J2237/2826

摘要： The present invention shortens the time spent in a search for a visual field by a user in a charged particle beam apparatus in which an observation range on a sample is set by using a captured image of the sample. When the contour of a sample table is circularly configured, for example, the central position of a sample table image on an optical image is quickly, easily, and accurately obtained by calculating, from the coordinates of the respective vertices of a triangle circumscribed about the contour created on the optical image by the user, the incenter of the triangle without direct recognition by automatic image analysis, which is complex and time-consuming, of the contour of the sample table image on the optical image.

公开(公告)号：US09939728B2

公开(公告)日：2018-04-10

申请号：US14344067

申请日：2012-09-12

申请人： Jerry Johannes Martinus Peijster

发明人： Jerry Johannes Martinus Peijster

IPC分类号： H01J37/16 ,  H01J37/18 ,  H01J37/24 ,  G03F7/20 ,  H01L21/67 ,  H01J37/317 ,  B82Y10/00 ,  B82Y40/00 ,  G01N21/88 ,  H01J37/20 ,  H01J37/26

CPC分类号： G03F7/2014 ,  B82Y10/00 ,  B82Y40/00 ,  G01N21/88 ,  G01N2201/022 ,  G03F7/70841 ,  G03F7/7085 ,  H01J37/16 ,  H01J37/18 ,  H01J37/20 ,  H01J37/24 ,  H01J37/261 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/28 ,  H01L21/6719

摘要： A target processing machine (100), such as a lithography or inspection machine, comprising a rigid base plate (150), a projection column (101) for projecting one or more optical or particle beams on to a target (130), a support frame (102) supporting the projection column, the support frame being supported by and fixed to the base plate, a stage comprising a movable part (128) for carrying the target and a fixed part (132, 133) being supported by and fixed to the base plate, a beam sensor (160) for detecting one or more of the beams projected by the column, the beam sensor at least in part being supported by and fixed to the base plate, and a vacuum chamber (110) enclosing the support frame and the column, for maintaining a vacuum environment in the interior space of the chamber, the vacuum chamber formed with the base plate forming part thereof, and supporting a plurality of wall panels (171, 172) including a plurality of side wall panels (171) supported by and fixed thereto.

公开(公告)号：US20170133194A1

公开(公告)日：2017-05-11

申请号：US15411538

申请日：2017-01-20

申请人： Carl Zeiss Microscopy GmbH

发明人： Dirk Zeidler ,  Thomas Kemen ,  Christof Riedesel ,  Ralf Lenke

IPC分类号： H01J37/10 ,  H01J37/24 ,  H01J37/26

CPC分类号： H01J37/10 ,  H01J37/09 ,  H01J37/12 ,  H01J37/24 ,  H01J37/26 ,  H01J37/28 ,  H01J2237/0453 ,  H01J2237/1202

摘要： Particle beam system comprising a particle source; a first multi-aperture plate with a multiplicity of openings downstream of which particle beams are formed; a second multi-aperture plate with a multiplicity of openings which are penetrated by the particle beams; an aperture plate with an opening which is penetrated by all the particles which also penetrate the openings in the first and the second multi-aperture plate; a third multi-aperture plate with a multiplicity of openings which are penetrated by the particle beams, and with a multiplicity of field generators which respectively provide a dipole field or quadrupole field for a beam; and a controller for feeding electric potentials to the multi-aperture plates and the aperture plate so that the second openings in the second multi-aperture plate respectively act as a lens on the particle beams 3 and feed adjustable excitations to the field generators.

公开(公告)号：US20170133191A1

公开(公告)日：2017-05-11

申请号：US15341699

申请日：2016-11-02

申请人： Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V.

发明人： Rainer Labitzke ,  Severin Dominok ,  Gösta Mattausch ,  Stefan Weiss

IPC分类号： H01J29/98

CPC分类号： H01J29/98 ,  H01J37/24 ,  H01J2237/0206 ,  H01J2237/06366 ,  H01J2237/3132

摘要： An apparatus for suppression of arcs in an electron beam generator including: a first module providing an operating voltage; a second module including a coil suitable for a voltage of at least 10 kV, and at least one free-wheeling diode connected in parallel to the coil; a third module including a first circuit component configured to detect a first actual value for electric voltage, and a first signal is producible when the first actual value falls below a first threshold value, a second circuit component by which a second actual value for electric current is detectable, and a second signal is generated when the second actual value exceeds a second threshold value, a control logic, which optionally links the first and second signals and a resultant output signal is producible; a semiconductor-based switch suitable for the voltage of at least 10 kV, which is opened based on the output signal.