公开(公告)号：US20180207581A1

公开(公告)日：2018-07-26

申请号：US15746266

申请日：2016-06-15

Applicant: Edwards Limited

Inventor： Christopher Mark Bailey ,  Clive Marcus Lloyd Tunna ,  Jack Raymond Tattersall ,  Ingo Stephen Graham ,  Michael Roger Czerniak ,  Gary Peter Knight ,  Darren Mennie ,  Duncan Michael Price ,  Derek Martin Baker ,  Andrew James Seeley

IPC: B01D53/75 ,  B01D53/68 ,  B01D53/78 ,  C23C16/44 ,  C23C16/24 ,  H01J37/32 ,  F04C19/00 ,  F04C29/00 ,  F04C23/00 ,  A62C4/00 ,  F23G7/06

CPC classification number: B01D53/75 ,  A62C4/00 ,  B01D53/68 ,  B01D53/78 ,  B01D2252/103 ,  B01D2257/204 ,  B01D2257/206 ,  B01D2258/0216 ,  C23C16/24 ,  C23C16/4405 ,  C23C16/4408 ,  C23C16/4412 ,  F04C19/001 ,  F04C19/005 ,  F04C23/006 ,  F04C29/0092 ,  F23G7/06 ,  H01J37/32807 ,  H01J37/32862 ,  H01J2237/335 ,  Y02C20/30

Abstract: Dry pumps are used to pump a variety of gas mixtures from the semiconductor industry. The present invention provides a liquid ring pump located between the dry pump and an abatement device to remove soluble corrosive materials prior to the exhaust gases entry to the abatement device, the work fluid exhausted from the liquid ring pump being separated from the gas prior to entry to the abatement device.

公开(公告)号：US20130164147A1

公开(公告)日：2013-06-27

申请号：US13716957

申请日：2012-12-17

Applicant: EDWARDS LIMITED

Inventor： Ingo Stephen Graham

IPC: F04C28/00

CPC classification number: F04C28/00 ,  F04C23/001 ,  F04C25/02 ,  F04C28/02 ,  F04C29/0092 ,  F04C2270/56 ,  F04C2280/02

Abstract: In order to prevent excessive motor loading or system overheating due to the accumulation of particulate or dust, from SACVD type CVD processes, in the running clearances of the vacuum pump a vacuum pumping arrangement is provided having a plurality of vacuum pumping stages and comprising a first pump inlet through which process fluid from the vacuum chamber can enter the pump and pass through each of the pumping sections towards a pump outlet, and a second pump inlet through which process fluid can enter the pump and pass through only one or more pumping stages downstream of the most upstream pumping stage, wherein the apparatus configured to conveying process fluid from the vacuum chamber to the first pump inlet for pumping during the second processing step and conveying process fluid from the vacuum chamber to the second pump inlet for pumping during the first processing step.

Abstract translation: 为了防止由于来自SACVD型CVD工艺的颗粒或灰尘的积聚引起的过大的电动机负载或系统过热，在真空泵的运行间隙中，提供具有多个真空泵送级的真空泵送装置，并且包括第一 泵入口，通过该入口，来自真空室的过程流体可以进入泵并通过每个泵送部分朝向泵出口，以及第二泵入口，工艺流体可以通过第二泵入口进入泵并仅通过下游的一个或多个泵送级 其中所述设备被配置为将处理流体从真空室输送到第一泵入口以在第二处理步骤期间泵送并且将处理流体从真空室输送到第二泵入口以在第一处理期间泵送 步。

公开(公告)号：US11761452B2

公开(公告)日：2023-09-19

申请号：US17294347

申请日：2019-11-12

Applicant: Edwards Limited

Inventor： Ingo Stephen Graham

IPC: F04D29/08 ,  F16J15/02

CPC classification number: F04D29/083 ,  F16J15/025

Abstract: A seal for use in a vacuum pump comprises a seal element positioned between inner and outer seal carriers located at the inner and outer surfaces of the seal element. Each of the seal element and carriers is substantially toroidal in shape. The outer carrier comprises retention means to hold the seal element in position. The inner carrier comprises at least one recess located in a surface adjacent to the seal element, and the seal element comprises at least one protrusion on an inner surface, which extends into the at least one recess of the inner carrier. A seal system comprises the described seal and first and second flanges. Methods for enhancing the chemical resistance of a seal system for use in a vacuum pump, and the use of the seal or seal system to connect pipework, are also provided.

公开(公告)号：US20220003239A1

公开(公告)日：2022-01-06

申请号：US17294347

申请日：2019-11-12

Applicant: Edwards Limited

Inventor： Ingo Stephen Graham

IPC: F04D29/08 ,  F16J15/02

Abstract: A seal for use in a vacuum pump comprises a seal element positioned between inner and outer seal carriers located at the inner and outer surfaces of the seal element. Each of the seal element and carriers is substantially toroidal in shape. The outer carrier comprises retention means to hold the seal element in position. The inner carrier comprises at least one recess located in a surface adjacent to the seal element, and the seal element comprises at least one protrusion on an inner surface, which extends into the at least one recess of the inner carrier. A seal system comprises the described seal and first and second flanges. Methods for enhancing the chemical resistance of a seal system for use in a vacuum pump, and the use of the seal or seal system to connect pipework, are also provided.

公开(公告)号：US09726176B2

公开(公告)日：2017-08-08

申请号：US13716957

申请日：2012-12-17

Applicant: EDWARDS LIMITED

Inventor： Ingo Stephen Graham

IPC: F04C28/00 ,  F04C23/00 ,  F04C25/02 ,  F04C28/02 ,  F04C29/00

CPC classification number: F04C28/00 ,  F04C23/001 ,  F04C25/02 ,  F04C28/02 ,  F04C29/0092 ,  F04C2270/56 ,  F04C2280/02

Abstract: In order to prevent excessive motor loading or system overheating due to the accumulation of particulate or dust, from SACVD type CVD processes, in the running clearances of the vacuum pump a vacuum pumping arrangement is provided having a plurality of vacuum pumping stages and comprising a first pump inlet through which process fluid from the vacuum chamber can enter the pump and pass through each of the pumping sections towards a pump outlet, and a second pump inlet through which process fluid can enter the pump and pass through only one or more pumping stages downstream of the most upstream pumping stage, wherein the apparatus configured to conveying process fluid from the vacuum chamber to the first pump inlet for pumping during the second processing step and conveying process fluid from the vacuum chamber to the second pump inlet for pumping during the first processing step.