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公开(公告)号：US20190311874A1
公开(公告)日：2019-10-10
申请号：US16340449
申请日：2017-10-19
Applicant: Excillum AB
Inventor： Tomi TUOHIMAA , Per TAKMAN , Andrii SOFIIENKO
Abstract: A system and method for generating X-ray radiation. The system includes an electron source operable to generate an electron beam and an X-ray target for generating X-ray radiation upon interaction with the electron beam. The method includes moving the electron beam over an edge separating a first region and a second region of the X-ray target, wherein the first region and the second region have different capability to generate X-ray radiation upon interaction with the electron beam. The system allows for a lateral extension of the electron beam to be determined based on a change in a quantity indicative of the interaction between the electron beam and the first region and between the electron beam and the second region, and the movement of the electron beam.
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公开(公告)号：US20210027974A1
公开(公告)日：2021-01-28
申请号：US16766935
申请日：2018-11-30
Applicant: Excillum AB
Inventor： Björn HANSSON , Per TAKMAN , Yuli WANG , Shiho TANAKA
Abstract: The present inventive concept relates to an X-ray source comprising: a liquid target source configured to provide a liquid target moving along a flow axis; an electron source configured to provide an electron beam; and a liquid target shaper configured to shape the liquid target to comprise a non-circular cross section with respect to the flow axis, wherein the non-circular cross section has a first width along a first axis and a second width along a second axis, wherein the first width is shorter than the second width, and wherein the liquid target comprises an impact portion being intersected by the first axis; wherein the x-ray source is configured to direct the electron beam towards the impact portion such that the electron beam interacts with the liquid target within the impact portion to generate X-ray radiation.
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公开(公告)号：US20220230832A1
公开(公告)日：2022-07-21
申请号：US17609655
申请日：2020-05-07
Applicant: Excillum AB
Inventor： Björn HANSSON , Per TAKMAN , Ulf LUNDSTRÖM , Tomi TUOHIMAA
Abstract: A liquid metal jet X-ray source including an electromagnetic pump for pumping the liquid metal. The electromagnetic pump includes a core having a core diameter and an outer yoke with a thickness of at least 20% of the core diameter. Preferably, the thickness of the outer yoke is at least 20% of the core diameter plus 6% of a radial distance between an outside of the core and an inside of the yoke.
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公开(公告)号：US20230176239A1
公开(公告)日：2023-06-08
申请号：US18155314
申请日：2023-01-17
Applicant: Excillum AB
Inventor： Per TAKMAN , Tomi TUOHIMAA , Ulf LUNDSTRÖM
IPC: G01T1/34
CPC classification number: G01T1/34
Abstract: A method for characterizing an electron beam in a liquid metal jet X-ray source. The method includes providing the electron beam and directing the electron beam to an interaction region; providing an electron beam dump connected to ground potential for receiving the electron beam after it has traversed the interaction region; scanning the electron beam over at least part of the interaction region; measuring X-ray radiation generated by interaction between the electron beam and the electron beam dump during the scanning to obtain an X-ray profile; and calculating an electron beam characteristic based on the X-ray profile. Also, a corresponding liquid metal jet X-ray source.
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公开(公告)号：US20220404514A1
公开(公告)日：2022-12-22
申请号：US17777747
申请日：2020-11-12
Applicant: Excillum AB
Inventor： Per TAKMAN , Tomi TUOHIMAA , Ulf LUNDSTRÖM
IPC: G01T1/34
Abstract: A method for characterizing an electron beam in a liquid metal jet X-ray source. The method includes providing the electron beam and directing the electron beam to an interaction region; providing an electron beam dump connected to ground potential for receiving the electron beam after it has traversed the interaction region; scanning the electron beam over at least part of the interaction region; measuring X-ray radiation generated by interaction between the electron beam and the electron beam dump during the scanning to obtain an X-ray profile; and calculating an electron beam characteristic based on the X-ray profile. Also a corresponding liquid metal jet X-ray source.
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Patent Agency Ranking
公开(公告)号：US20220254595A1
公开(公告)日：2022-08-11
申请号：US17725152
申请日：2022-04-20
Applicant: Excillum AB
Inventor： Björn HANSSON , Per TAKMAN , Yuli WANG , Shiho TANAKA
Abstract: An X-ray source including: a liquid target source configured to provide a liquid target moving along a flow axis; an electron source configured to provide an electron beam; and a liquid target shaper configured to shape the liquid target to include a non-circular cross section with respect to the flow axis, wherein the non-circular cross section has a first width along a first axis and a second width along a second axis, wherein the first width is shorter than the second width, and wherein the liquid target includes an impact portion being intersected by the first axis; wherein the x-ray source is configured to direct the electron beam towards the impact portion such that the electron beam interacts with the liquid target within the impact portion to generate X-ray radiation.
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公开(公告)号：US20210195724A1
公开(公告)日：2021-06-24
申请号：US17057192
申请日：2019-06-07
Applicant: Excillum AB
Inventor： Per TAKMAN , Ulf LUNDSTRÖM
Abstract: A method for controlling an X-ray source configured to emit, from an X-ray spot on a target, X-ray radiation generated by an interaction between an electron beam and the target, wherein the X-ray spot is determined by the field of view of an X-ray optical system of the X-ray source. The method includes providing the target, providing the electron beam forming an electron spot on the target and interacting with the target to generate X-ray radiation, and adjusting a width and total power of the electron beam such that a maximum of the power density profile in the electron spot is below a predetermined limit, and such that a total power delivered to the target in the X-ray spot is increased.
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公开(公告)号：US20240015875A1
公开(公告)日：2024-01-11
申请号：US18471588
申请日：2023-09-21
Applicant: Excillum AB
Inventor： Johan KRONSTEDT , Ulf LUNDSTRÖM , Per TAKMAN
IPC: H05G2/00
Abstract: X-ray sources including an electron source, an adjustment means for adjusting an orientation of the electron beam generated by the electron source, a focusing means configured to focus the electron beam in accordance with a focusing setting, a beam orientation sensor arranged to generate a signal indicating an orientation of the electron beam relative to a target position, and a controller that is operably connected to the focusing means, the beam orientation sensor and the adjustment means. Also, X-ray sources including a target orientation sensor and a target adjustment means, wherein the controller is configured to cause the beam adjustment means and/or target adjustment means to adjust the relative orientation between the electron beam and the target.
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公开(公告)号：US20220220951A1
公开(公告)日：2022-07-14
申请号：US17595064
申请日：2020-05-07
Applicant: Excillum AB
Inventor： Ulf LUNDSTRÖM , Björn HANSSON , Per TAKMAN , Tomi TUOHIMAA
Abstract: An electromagnetic pump for pumping an electrically conductive liquid, including a first conduit section and a second conduit section. The electromagnetic pump further includes a current generator arranged to provide an electric current through the liquid in the first conduit section and the liquid in the second conduit section such that a direction of the electric current is intersecting the flow of the liquid in the first conduit section and in the second conduit section, and a magnetic field generating arrangement arranged to provide a magnetic field passing through the liquid in the first conduit section and the second conduit section such that a direction of the magnetic field is intersecting the flow of the liquid and the direction of the electric current.
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公开(公告)号：US20210410260A1
公开(公告)日：2021-12-30
申请号：US17290580
申请日：2019-11-04
Applicant: Excillum AB
Inventor： Johan KRONSTEDT , Ulf LUNDSTRÖM , Per TAKMAN
Abstract: X-ray sources including an electron source, an adjustment means for adjusting an orientation of the electron beam generated by the electron source, a focusing means configured to focus the electron beam in accordance with a focusing setting, a beam orientation sensor arranged to generate a signal indicating an orientation of the electron beam relative to a target position, and a controller that is operably connected to the focusing means, the beam orientation sensor and the adjustment means. Also, X-ray sources including a target orientation sensor and a target adjustment means, wherein the controller is configured to cause the beam adjustment means and/or target adjustment means to adjust the relative orientation between the electron beam and the target.
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