公开(公告)号：US11746295B2

公开(公告)日：2023-09-05

申请号：US17154468

申请日：2021-01-21

Applicant: FUJIFILM Corporation

Inventor： Daisuke Hayashi ,  Aiko Yoshida ,  Toru Watanabe ,  Keita Takahashi

IPC: C09K19/04 ,  C09K19/30 ,  C09K19/34 ,  C08F20/26 ,  G02F1/1335 ,  G02F1/13363 ,  G02F1/1337 ,  G02B5/30

CPC classification number: C09K19/3059 ,  C08F20/26 ,  C09K19/3497 ,  G02B5/30 ,  G02F1/1335 ,  G02F1/1337 ,  G02F1/13363 ,  C09K2019/0448 ,  C09K2019/3069 ,  C09K2019/3074 ,  C09K2019/3075 ,  C09K2019/3077 ,  C09K2323/00 ,  C09K2323/03 ,  C09K2323/031 ,  C09K2323/035

Abstract: An object of the present invention is to provide a polymerizable liquid crystal composition used for formation of an optically anisotropic film having excellent moisture-heat resistance and an excellent surface condition, an optically anisotropic film, an optical film, a polarizing plate, and an image display device. The polymerizable liquid crystal composition of an embodiment of the present invention is a polymerizable liquid crystal composition containing a polymerizable liquid crystal compound and a compound represented by Formula (1): L1-SP1-(E3-A1)m-E1-G1-C(═O)—O—C(═O)-G2-E2-(A2-E4)n-SP2-L2, in which a content of the compound represented by Formula (1) is 0.01 to 5 parts by mass with respect to 100 parts by mass of the polymerizable liquid crystal compound.

公开(公告)号：US09815812B2

公开(公告)日：2017-11-14

申请号：US15238784

申请日：2016-08-17

Applicant: FUJIFILM Corporation

Inventor： Akira Takeda ,  Toru Watanabe ,  Taiji Katsumata ,  Takayuki Ito ,  Toshihiko Sawada

IPC: C07D335/02 ,  C07C69/63 ,  C07C69/78 ,  C07C309/68 ,  C07C309/73 ,  C07H1/00 ,  C07H5/10 ,  C07H13/08 ,  C07H15/18

CPC classification number: C07D335/02 ,  C07C69/63 ,  C07C69/78 ,  C07C309/68 ,  C07C309/73 ,  C07H1/00 ,  C07H5/10 ,  C07H13/08 ,  C07H15/18

Abstract: There is provided a production method of a thiopyranose compound represented by the following Formula (2) by reacting a compound represented by the following Formula (1) with a sulfur compound. X represents a leaving group. A represents an oxygen atom or a sulfur atom. Further, each of R1A to R4B, R1B to R4B, and R5 represents a hydrogen atom or a specific substituent.

公开(公告)号：US20160137855A1

公开(公告)日：2016-05-19

申请号：US15002464

申请日：2016-01-21

Applicant: FUJIFILM Corporation

Inventor： Hiroaki Tsuyama ,  Toru Watanabe ,  Yuuichi Hayata

IPC: C09D5/24

CPC classification number: C09D5/24 ,  B22F2003/248 ,  C08K5/053 ,  C08K2003/085 ,  C08K2003/2248 ,  C09D1/00 ,  C09D7/40 ,  C09D7/61 ,  C09D7/63 ,  C09D201/00 ,  C22C29/12 ,  C22C32/0021 ,  C23C18/08 ,  H01B1/22 ,  H05K1/097 ,  H05K2203/1157

Abstract: An electroconductive-film-forming composition capable of forming an electroconductive film having excellent conductivity and few voids and a method for producing an electroconductive film using the same. The electroconductive-film-forming composition contains copper particles having an average particle diameter of 1 nm to 10 copper oxide particles having an average particle diameter of 1 nm to 500 nm, a reducing agent having a hydroxy group, a metal catalyst including metals other than copper, and a solvent, in which the content of the copper oxide particles is 50% by mass to 300% by mass with respect to the content of the copper particles, the content of the reducing agent is 100 mol % to 800 mol % with respect to the content of the copper oxide particles, and the content of the metal catalyst is 10% by mass or less with respect to the content of the copper oxide particles.

Abstract translation: 一种导电膜形成组合物，其能够形成导电性优异且孔隙少的导电膜，以及使用该导电膜的导电膜的制造方法。 导电膜形成组合物包含平均粒径为1nm至10的平均粒径为1nm至500nm的氧化铜颗粒的铜颗粒，具有羟基的还原剂，除金属以外的金属的金属催化剂 铜和溶剂，其中相对于铜颗粒的含量，氧化铜颗粒的含量为50质量％至300质量％，还原剂的含量为100摩尔％至800摩尔％，而 相对于氧化铜粒子的含量，金属催化剂的含量为10质量％以下。

公开(公告)号：US09884882B2

公开(公告)日：2018-02-06

申请号：US15238232

申请日：2016-08-16

Applicant: FUJIFILM Corporation

Inventor： Takayuki Ito ,  Toru Watanabe ,  Hideki Okada ,  Hidenobu Kuniyoshi

IPC: C07H13/08 ,  C07D333/32 ,  C07H15/04 ,  C07H15/18

CPC classification number: C07H13/08 ,  C07D333/32 ,  C07H15/04 ,  C07H15/18

Abstract: There is provided a production method of a compound represented by the following formula (II) through a step of reacting a compound represented by the following General Formula (I) with a sulfur compound. In General Formulas (I) and (II), R1 represents a hydrogen atom or an acyl group, R2 represents a hydrogen atom, a fluorine atom, an acyloxy group, an arylmethyloxy group, an allyloxy group, an arylmethyloxycarbonyloxy group, or an allyloxycarbonyloxy group, R3 represents a hydrogen atom or an acyloxy group, R5 represents an alkyl group or an aryl group, and X represents a leaving group. Here, in a case where R2 is a fluorine atom, an acyloxy group, an arylmethyloxy group, an allyloxy group, an arylmethyloxycarbonyloxy group, or an allyloxycarbonyloxy group, R3 is an acyloxy group.

公开(公告)号：US09868864B2

公开(公告)日：2018-01-16

申请号：US15002464

申请日：2016-01-21

Applicant: FUJIFILM Corporation

Inventor： Hiroaki Tsuyama ,  Toru Watanabe ,  Yuuichi Hayata

IPC: C09D5/24 ,  C09D1/00 ,  C09D7/12 ,  C09D201/00 ,  H01B1/22 ,  H05K1/09 ,  C23C18/08

CPC classification number: C09D5/24 ,  B22F2003/248 ,  C08K5/053 ,  C08K2003/085 ,  C08K2003/2248 ,  C09D1/00 ,  C09D7/40 ,  C09D7/61 ,  C09D7/63 ,  C09D201/00 ,  C22C29/12 ,  C22C32/0021 ,  C23C18/08 ,  H01B1/22 ,  H05K1/097 ,  H05K2203/1157

Abstract: An electroconductive-film-forming composition capable of forming an electroconductive film having excellent conductivity and few voids and a method for producing an electroconductive film using the same. The electroconductive-film-forming composition contains copper particles having an average particle diameter of 1 nm to 10 μm, copper oxide particles having an average particle diameter of 1 nm to 500 nm, a reducing agent having a hydroxy group, a metal catalyst including metals other than copper, and a solvent, in which the content of the copper oxide particles is 50% by mass to 300% by mass with respect to the content of the copper particles, the content of the reducing agent is 100 mol % to 800 mol % with respect to the content of the copper oxide particles, and the content of the metal catalyst is 10% by mass or less with respect to the content of the copper oxide particles.