Method to prevent cobalt recess
    3.
    发明授权

    公开(公告)号:US10109521B1

    公开(公告)日:2018-10-23

    申请号:US15606895

    申请日:2017-05-26

    Abstract: A method of forming hybrid Co and Cu CA/CB contacts and the resulting device are provided. Embodiments include forming a forming a plurality of trenches through an ILD down to a substrate; forming a first metal liner on side and bottom surfaces of each trench and over the ILD; annealing the first metal liner; forming a second metal liner over the first metal liner; forming a first plating layer over a portion of the second metal liner in each trench; forming a second plating layer over the second metal liner and first plating layer in a remaining portion of each trench, the first and second plating layers being different materials; and planarizing the second plating layer and the second and first metal liners down to the ILD.

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