摘要:
The invention relates to a process for the purification's of silicon tetrachloride or germanium tetrachloride contaminated with at least one hydrogen-containing compound, in which the silicon tetrachloride or germanium tetrachloride to be purified is treated in a targeted manner by means of a cold plasma and purified silicon tetrachloride or germanium tetrachloride is isolated from the phase which has been treated in this way. The present invention further relates to an apparatus for carrying out the process of the invention, which comprises a stock and vaporization unit for silicon or germanium tetrachloride (4.1 or 5.1) which is connected via a connecting line with the inlet of the reactor (4.3 or 5.3) with control unit (4.4 or 5.4) for producing the dielectrically hindered discharges whose outlet leads via a pipe either directly or indirectly via at least one further reactor (5.5) to a condensation unit (4.5 or 5.11) with downstream collection vessel (4.6 or 5.12) which is connected via an offtake line (4.6.2 or 5.12.1) to a distillation unit (4.8 or 5.13) and, if appropriate, is equipped with a feed line (4.6.1) to the unit (4.1).
摘要:
The invention relates to a process for the purification's of silicon tetrachloride or germanium tetrachloride contaminated with at least one hydrogen-containing compound, in which the silicon tetrachloride or germanium tetrachloride to be purified is treated in a targeted manner by means of a cold plasma and purified silicon tetrachloride or germanium tetrachloride is isolated from the phase which has been treated in this way. The present invention further relates to an apparatus for carrying out the process of the invention, which comprises a stock and vaporization unit for silicon or germanium tetrachloride (4.1 or 5.1) which is connected via a connecting line with the inlet of the reactor (4.3 or 5.3) with control unit (4.4 or 5.4) for producing the dielectrically hindered discharges whose outlet leads via a pipe either directly or indirectly via at least one further reactor (5.5) to a condensation unit (4.5 or 5.11) with downstream collection vessel (4.6 or 5.12) which is connected via an offtake line (4.6.2 or 5.12.1) to a distillation unit (4.8 or 5.13) and, if appropriate, is equipped with a feed line (4.6.1) to the unit (4.1).
摘要:
A reactor, a plant, and a continuous, industrial process carried out therein for preparing high-purity silicon tetrachloride or high-purity germanium tetrachloride by treating the silicon tetrachloride or germanium tetrachloride to be purified, which is contaminated by at least one hydrogen-containing compound, by a cold plasma and isolating purified high-purity silicon tetrachloride or germanium tetrachloride from the resulting treated phase by fractional distillation. The treatment is carried out in a plasma reactor in which longitudinal axes of a dielectric, of a high-voltage electrode, and of a grounded, metallic heat exchanger are oriented parallel to one another and at the same time parallel to the force vector of gravity.
摘要:
A reactor and a plant containing the reactor for conducting a continuous, industrial process for preparing high-purity silicon tetrachloride or high-purity germanium tetrachloride is provided. The plant contains a plasma reactor having a dielectric, a high voltage electrode and an earthed, metallic heat exchanger, in which the longitudinal axes of the dielectric, of the high-voltage electrode and of the earthed, metallic heat exchanger are oriented parallel to one another and at the same time parallel to the force vector of gravity.
摘要:
The invention relates to an empty container (1) for receiving air- and/or moisture-sensitive compounds, comprising a connecting unit (2) and an inner volume of at least 300 liters and adapters for connecting the empty container, and to the use thereof.
摘要:
The invention relates to an empty container (1) for receiving air- and/or moisture-sensitive compounds, comprising a connecting unit (2) and an inner volume of at least 300 liters and adapters for connecting the empty container, and to the use thereof.
摘要:
A reactor, a plant, and a continuous, industrial process carried out therein for preparing high-purity silicon tetrachloride or high-purity germanium tetrachloride by treating the silicon tetrachloride or germanium tetrachloride to be purified, which is contaminated by at least one hydrogen-containing compound, by a cold plasma and isolating purified high-purity silicon tetrachloride or germanium tetrachloride from the resulting treated phase by fractional distillation. The treatment is carried out in a plasma reactor in which longitudinal axes of a dielectric, of a high-voltage electrode, and of a grounded, metallic heat exchanger are oriented parallel to one another and at the same time parallel to the force vector of gravity.
摘要:
Disclosed is a control system and process for operating same for nuclear reactors, particularly gas cooled nuclear reactors, comprising in the control system a means for measuring the output produced in the reactor core and the output removed by a primary circuit or a secondary circuit, a means for integrating the integral of the core produced output over the output level, during the same time, of the primary or secondary circuit of the reactor and a means for forming a control signal from the value of the integral.
摘要:
A process and an installation for the securing against excessive pressure in a prestressed concrete pressure vessel of a gas cooled high temperature reactor and for the prevention of activity release into the environment. The process comprises three steps and in each step pressure reducing installations become effective upon the rise of pressure in the prestressed concrete pressure vessel over a predetermined value. In the first step the pressure vessel is relieved by means of the operational gas purification apparatus and a conveying blower into the storage vessels for the cooling gas. In case of a further rise in pressure, in a second step a discharge path equipped with a safety valve and a check valve is opened, which also relieves into the storage vessels while by-passing the gas purification installation. In the third step, if the pressure continues to rise over a predetermined value, a line closed during normal operation by a rupture disk, is open, said line being connected with the discharge path and opening into the air circulation installation of the nuclear reactor plant. The air circulation installation is connected by means of a filter system with an exhaust stack.