公开(公告)号：US20110200953A1

公开(公告)日：2011-08-18

申请号：US13025490

申请日：2011-02-11

申请人： Hiroshi ARIMA ,  Kousuke YOSHIHARA ,  Yuichi YOSHIDA ,  Yasushi TAKIGUCHI ,  Taro YAMAMOTO

发明人： Hiroshi ARIMA ,  Kousuke YOSHIHARA ,  Yuichi YOSHIDA ,  Yasushi TAKIGUCHI ,  Taro YAMAMOTO

IPC分类号： G03F7/30 ,  G03B27/52

CPC分类号： G03F7/3021

摘要： There is provided a developing apparatus capable of achieving high throughput. The developing apparatus includes an airtightly sealed processing vessel that forms a processing atmosphere therein; an atmosphere gas supply unit that supplies an atmosphere gas containing mist of a developing solution into the processing vessel in order to form a liquid film of the developing solution on a surface of a substrate loaded into the processing vessel; and a drying unit that dries the substrate in order to stop a developing process by the liquid film. A reaction between a resist and the developing solution can be stopped. Therefore, a developing process can be performed in parallel with a cleaning process performed by a cleaning module and high throughput is achieved.

摘要翻译： 提供了能够实现高产量的显影装置。 显影装置包括在其中形成处理气氛的气密密封处理容器; 气氛气体供给单元，其将含有显影液雾的气氛气体供给到处理容器中，以在装载到处理容器中的基板的表面上形成显影液的液膜; 以及干燥单元，其干燥基板以便通过液膜来停止显影处理。 可以停止抗蚀剂与显影液的反应。 因此，可以与由清洁模块执行的清洁处理并行执行显影处理，并且实现高生产率。

公开(公告)号：US20100233638A1

公开(公告)日：2010-09-16

申请号：US12720072

申请日：2010-03-09

申请人： Yuichi YOSHIDA ,  Hiroshi ARIMA ,  Taro YAMAMOTO ,  Kousuke YOSHIHARA

发明人： Yuichi YOSHIDA ,  Hiroshi ARIMA ,  Taro YAMAMOTO ,  Kousuke YOSHIHARA

IPC分类号： G03F7/20 ,  G03B27/42

CPC分类号： H01L21/67748 ,  H01L21/67109 ,  H01L21/6715

摘要： The substrate treatment apparatus includes a heating plate that heats the substrate prepared by coating a surface of the substrate with a resist and exposing the resist-coated substrate to light; a surface treatment liquid atomizing unit that atomizes a surface treatment liquid used to improve wettability of the substrate with a developer that is supplied onto the resist; a cooling unit that cools the substrate heated by the heating plate; and a surface treatment liquid supply unit that supplies the atomized surface treatment liquid onto the substrate for a portion of the period from the time when the substrate is heated until the cooling means terminates the cooling of the substrate.

摘要翻译： 基板处理装置包括加热板，其加热通过用抗蚀剂涂布基板的表面而制备的基板，并将抗蚀剂涂覆的基板曝光; 表面处理液体雾化单元，其用提供给抗蚀剂的显影剂使用于改善基材的润湿性的表面处理液雾化; 冷却单元，其冷却由所述加热板加热的所述基板; 以及表面处理液体供给单元，其从基板被加热直到冷却单元终止基板的冷却的期间的一部分，将雾化表面处理液供给到基板上。

公开(公告)号：US20100233637A1

公开(公告)日：2010-09-16

申请号：US12718104

申请日：2010-03-05

申请人： Hiroshi ARIMA ,  Yuichi Yoshida ,  Taro Yamamoto ,  Kousuke Yoshihara

发明人： Hiroshi ARIMA ,  Yuichi Yoshida ,  Taro Yamamoto ,  Kousuke Yoshihara

IPC分类号： G03F7/20 ,  G03B27/52 ,  G06F17/00

CPC分类号： G03F7/3021 ,  H01L21/6715

摘要： A developing apparatus including a substrate holder that holds a substrate horizontally; means for atomizing a surface treatment liquid used to improve wettability of the substrate with a developer; a first spray nozzle that sprays the atomized surface treatment liquid onto the substrate; and a developer supply nozzle that supplies a developer onto the substrate to which the substrate treatment liquid has been sprayed. The surface tension of the atomized surface treatment liquid with respect to the substrate is lower than the surface tension of the surface treatment liquid with respect to the substrate. The atomization suppresses the fact that the surface treatment liquid gathers on a certain portion of the surface of the substrate. The surface treatment liquid can be easily supplied onto the entire surface of the substrate, and improve wettability of the substrate with the developer.

摘要翻译： 一种显影装置，包括：水平保持基板的基板支架; 用于使用显影剂使用于改善基材的润湿性的表面处理液体雾化的装置; 将雾化的表面处理液体喷射到基板上的第一喷嘴; 以及将显影剂供给到已经喷射了基板处理液的基板上的显影剂供给喷嘴。 雾化表面处理液相对于基材的表面张力低于表面处理液相对于基材的表面张力。 雾化抑制了表面处理液体聚集在基材表面的某一部分上的事实。 可以容易地将表面处理液体提供到基板的整个表面上，并且改善基板与显影剂的润湿性。

公开(公告)号：US20120111373A1

公开(公告)日：2012-05-10

申请号：US13288255

申请日：2011-11-03

申请人： Hiroshi ARIMA ,  Yuichi YOSHIDA ,  Kousuke YOSHIHARA

发明人： Hiroshi ARIMA ,  Yuichi YOSHIDA ,  Kousuke YOSHIHARA

IPC分类号： B08B7/00 ,  B08B5/00 ,  B08B3/04

CPC分类号： G03F7/422 ,  H01L21/67051

摘要： A method for cleaning a surface of a substrate having a circuit pattern formed thereon, includes: forming a liquid film on the surface by feeding a cleaning solution onto the center of the surface while rotating the substrate with the substrate kept horizontal; forming a dry region by discharging gas to the center while moving a position of feed of the cleaning solution on the surface by a distance from the center toward the periphery of the substrate with the substrate being rotated; moving the position of feed of the cleaning solution on the surface toward the periphery at a speed equal to a speed at which the dry region is expanded toward the periphery while rotating the substrate; and controlling temperature of the cleaning solution to form the liquid film such that the temperature becomes higher than process atmosphere temperature on the surface during feed of the cleaning solution.

摘要翻译： 一种用于清洗其上形成有电路图案的基板的表面的方法，包括：通过在将基板保持水平的同时旋转基板的同时将清洁溶液馈送到表面的中心而在表面上形成液膜; 通过在基板旋转的同时将清洁溶液的进料位置从基板的中心向外周移动到表面上的方式将气体排出到中心而形成干燥区域; 在旋转基板的同时，以与干燥区域朝向周边膨胀的速度相等的速度将清洁溶液的表面朝向周边移动的位置; 以及控制清洁溶液的温度以形成液膜，使得在清洁溶液的进料期间温度变得高于表面上的处理气氛温度。

公开(公告)号：US20100244514A1

公开(公告)日：2010-09-30

申请号：US12410706

申请日：2009-03-25

申请人： Hiroshi ARIMA

发明人： Hiroshi ARIMA

IPC分类号： A47C31/00

CPC分类号： B60N2/20

摘要： An arrangement of operation unit in one upper corner portion of seat back of automotive seat is disclosed, in which an operating lever of the operation unit is accommodated in a housing fixed to a connecting bracket disposed in such one upper corner portion, and a shape retaining bracket is fixed to the connecting bracket to retain the peripheral edge region of opening of a trim cover assembly through which an operating lever of the operation unit projects outwardly. The peripheral edge region is inserted between the shape regaining bracket and a bezel, and further, the connecting bracket, housing and trim cover assembly are connected with one another at a connecting point, thereby effectively retaining the peripheral edge region of opening of the trim cover assembly in a predetermined shape conforming to outer contour of the one upper corner portion of seat back.

摘要翻译： 公开了一种在汽车座椅的座椅靠背的一个上角部分中的操作单元的布置，其中操作单元的操作杆被容纳在固定到设置在这样的一个上角部中的连接托架的壳体中，并且形状保持 支架固定在连接支架上，以保持装饰罩组件的周边边缘区域，操作单元的操作杆通过该边缘区域向外伸出。 外围边缘区域被插入在形状恢复支架和边框之间，此外，连接托架，壳体和装饰盖组件在连接点处彼此连接，从而有效地保持装饰盖的开口的周边边缘区域 组装成符合座椅靠背的一个上角部的外轮廓的预定形状。