利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

6 条记录 (耗时 0.03 秒)

    Reactor design to reduce particle deposition during process abatement
    1.
    发明申请
    Reactor design to reduce particle deposition during process abatement 失效
    反应器设计，以减少过程减少过程中的颗粒沉积

    公开(公告)号：US20060104879A1

    公开(公告)日：2006-05-18

    申请号：US10987921

    申请日：2004-11-12

    申请人： Ho-Man Chiu ,  Daniel Clark ,  Shaun Crawford ,  Jay Jung ,  Leonard Todd ,  Robbert Vermeulen

    发明人： Ho-Man Chiu ,  Daniel Clark ,  Shaun Crawford ,  Jay Jung ,  Leonard Todd ,  Robbert Vermeulen

    IPC分类号： B01D53/72

    CPC分类号： F23M5/085 ,  F23D2900/00016 ,  F23G7/065 ,  F23J9/00 ,  F23M2900/05002 ,  F23M2900/05004

    摘要： The present invention relates to systems and methods for controlled combustion and decomposition of gaseous pollutants while reducing deposition of unwanted reaction products from within the treatment systems. The systems include a novel thermal reaction chamber design having stacked reticulated ceramic rings through which fluid, e.g., gases, may be directed to form a boundary layer along the interior wall of the thermal reaction chamber, thereby reducing particulate matter buildup thereon. The systems further include the introduction of fluids from the center pilot jet to alter the aerodynamics of the interior of the thermal reaction chamber.

    摘要翻译： 本发明涉及用于气态污染物的受控燃烧和分解的系统和方法，同时减少不需要的反应产物从处理系统内的沉积。 该系统包括具有堆叠的网状陶瓷环的新型热反应室设计，通过该陶瓷环可以使流体（例如气体）被引导以沿着热反应室的内壁形成边界层，从而减少其上积累的颗粒物质。 这些系统还包括从中心先导射流引入流体以改变热反应室内部的空气动力学。

    REACTOR DESIGN TO REDUCE PARTICLE DEPOSITION DURING PROCESS ABATEMENT
    2.
    发明申请
    REACTOR DESIGN TO REDUCE PARTICLE DEPOSITION DURING PROCESS ABATEMENT 失效
    反应器设计，以减少过程中的颗粒沉积

    公开(公告)号：US20070274876A1

    公开(公告)日：2007-11-29

    申请号：US11838435

    申请日：2007-08-14

    申请人： Ho-Man Chiu ,  Daniel Clark ,  Shaun Crawford ,  Jay Jung ,  Leonard Todd ,  Robbert Vermeulen

    发明人： Ho-Man Chiu ,  Daniel Clark ,  Shaun Crawford ,  Jay Jung ,  Leonard Todd ,  Robbert Vermeulen

    IPC分类号： F01N3/26

    CPC分类号： F23M5/085 ,  F23D2900/00016 ,  F23G7/065 ,  F23J9/00 ,  F23M2900/05002 ,  F23M2900/05004

    摘要： The present invention relates to systems and methods for controlled combustion and decomposition of gaseous pollutants while reducing deposition of unwanted reaction products from within the treatment systems. The systems include a novel thermal reaction chamber design having stacked reticulated ceramic rings through which fluid, e.g., gases, may be directed to form a boundary layer along the interior wall of the thermal reaction chamber, thereby reducing particulate matter buildup thereon. The systems further include the introduction of fluids from the center pilot jet to alter the aerodynamics of the interior of the thermal reaction chamber.

    摘要翻译： 本发明涉及用于气态污染物的受控燃烧和分解的系统和方法，同时减少不需要的反应产物从处理系统内的沉积。 该系统包括具有堆叠的网状陶瓷环的新型热反应室设计，通过该陶瓷环可以使流体（例如气体）被引导以沿着热反应室的内壁形成边界层，从而减少其上积累的颗粒物质。 这些系统还包括从中心先导射流引入流体以改变热反应室内部的空气动力学。

    Methods and apparatuses for monitoring organic additives in electrochemical deposition solutions
    4.
    发明授权
    Methods and apparatuses for monitoring organic additives in electrochemical deposition solutions 有权
    用于监测电化学沉积溶液中有机添加剂的方法和装置

    公开(公告)号：US07435320B2

    公开(公告)日：2008-10-14

    申请号：US10836546

    申请日：2004-04-30

    申请人： Jianwen Han ,  Mackenzie E. King ,  Weihua Wang ,  Glenn Tom ,  Jay Jung

    发明人： Jianwen Han ,  Mackenzie E. King ,  Weihua Wang ,  Glenn Tom ,  Jay Jung

    IPC分类号： G01N27/403

    CPC分类号： C25D5/18 ,  C25D1/00 ,  C25D3/38 ,  C25D21/12 ,  C25D21/14 ,  G01N27/42 ,  H05K3/188 ,  H05K2203/163

    摘要： The present invention relates in general to real-time analysis of electrochemical deposition (ECD) metal plating solutions, for the purpose of reducing plating defects and achieving high quality metal deposition. The present invention provides various new electrochemical analytical cell designs for reducing cross-contamination and increasing analytical signal strength. The present invention also provides improved plating protocols for increasing potential signal strength and reducing the time required for each measurement cycle. Further, the present invention provides new methods and algorithms for simultaneously determining concentrations of suppressor, accelerator, and leveler in a sample ECD solution within three experimental runs. A particularly preferred embodiment of the present invention provides a method for simultaneously determining concentrations of all three organic additives within a single experimental run by using a single analytical cell, while interactions between such additives are properly accounted for.

    摘要翻译： 本发明一般涉及电化学沉积（ECD）金属电镀溶液的实时分析，以减少电镀缺陷并实现高质量的金属沉积。 本发明提供用于减少交叉污染和增加分析信号强度的各种新的电化学分析池设计。 本发明还提供改进的电镀方案，用于增加潜在的信号强度并减少每个测量周期所需的时间。 此外，本发明提供了用于在三个实验运行中同时测定样品ECD溶液中的抑制剂，促进剂和矫味剂的浓度的新方法和算法。 本发明的一个特别优选的实施方案提供了一种通过使用单一分析电池同时测定单个实验运行中所有三种有机添加剂的浓度的方法，同时适当地考虑了这些添加剂之间的相互作用。

    Methods and apparatuses for monitoring organic additives in electrochemical deposition solutions
    5.
    发明申请
    Methods and apparatuses for monitoring organic additives in electrochemical deposition solutions 有权
    用于监测电化学沉积溶液中有机添加剂的方法和装置

    公开(公告)号：US20050241948A1

    公开(公告)日：2005-11-03

    申请号：US10836546

    申请日：2004-04-30

    申请人： Jianwen Han ,  MacKenzie King ,  Weihua Wang ,  Glenn Tom ,  Jay Jung

    发明人： Jianwen Han ,  MacKenzie King ,  Weihua Wang ,  Glenn Tom ,  Jay Jung

    IPC分类号： C25D3/38 ,  C25D5/18 ,  C25D21/12 ,  C25D21/14 ,  G01N27/26 ,  G01N27/42

    CPC分类号： C25D5/18 ,  C25D1/00 ,  C25D3/38 ,  C25D21/12 ,  C25D21/14 ,  G01N27/42 ,  H05K3/188 ,  H05K2203/163

    摘要： The present invention relates in general to real-time analysis of electrochemical deposition (ECD) metal plating solutions, for the purpose of reducing plating defects and achieving high quality metal deposition. The present invention provides various new electrochemical analytical cell designs for reducing cross-contamination and increasing analytical signal strength. The present invention also provides improved plating protocols for increasing potential signal strength and reducing the time required for each measurement cycle. Further, the present invention provides new methods and algorithms for simultaneously determining concentrations of suppressor, accelerator, and leveler in a sample ECD solution within three experimental runs. A particularly preferred embodiment of the present invention provides a method for simultaneously determining concentrations of all three organic additives within a single experimental run by using a single analytical cell, while interactions between such additives are properly accounted for.

    摘要翻译： 本发明一般涉及电化学沉积（ECD）金属电镀溶液的实时分析，以减少电镀缺陷并实现高质量的金属沉积。 本发明提供用于减少交叉污染和增加分析信号强度的各种新的电化学分析池设计。 本发明还提供改进的电镀方案，用于增加潜在的信号强度并减少每个测量周期所需的时间。 此外，本发明提供了用于在三个实验运行中同时测定样品ECD溶液中的抑制剂，促进剂和矫味剂的浓度的新方法和算法。 本发明的一个特别优选的实施方案提供了一种通过使用单一分析电池同时测定单个实验运行中所有三种有机添加剂的浓度的方法，同时适当地考虑了这些添加剂之间的相互作用。