LED PATTERN PROJECTOR FOR 3D CAMERA PLATFORMS

    公开(公告)号:US20200004126A1

    公开(公告)日:2020-01-02

    申请号:US16403313

    申请日:2019-05-03

    Abstract: A light pattern projector with a pattern mask to spatially modulate an intensity of a wideband illumination source, such as an LED, and a projector lens to reimage the spatially modulated emission onto regions of a scene that is to be captured with an image sensor. The projector lens may comprise a microlens array (MLA) including a first lenslet to reimage the spatially modulated emission onto a first portion of a scene, and a second lenslet to reimage the spatially modulated emission onto a first portion of a scene. The MLA may have a fly's eye architecture with convex curvature over a diameter of the projector lens in addition to the lenslet curvature. The pattern mask may be an amplitude mask comprising a mask pattern of high and low amplitude transmittance regions. In the alternative, the pattern mask may be a phase mask, such as a refractive or diffractive mask.

    LED PATTERN PROJECTOR FOR 3D CAMERA PLATFORMS

    公开(公告)号:US20190041736A1

    公开(公告)日:2019-02-07

    申请号:US16024024

    申请日:2018-06-29

    Abstract: A light pattern projector with a pattern mask to spatially modulate an intensity of a wideband illumination source, such as an LED, and a projector lens to reimage the spatially modulated emission onto regions of a scene that is to be captured with an image sensor. The projector lens may comprise a microlens array (MLA) including a first lenslet to reimage the spatially modulated emission onto a first portion of a scene, and a second lenslet to reimage the spatially modulated emission onto a first portion of a scene. The MLA may have a fly's eye architecture with convex curvature over a diameter of the projector lens in addition to the lenslet curvature. The pattern mask may be an amplitude mask comprising a mask pattern of high and low amplitude transmittance regions. In the alternative, the pattern mask may be a phase mask, such as a refractive or diffractive mask.

    Stereo depth camera using VCSEL with spatially and temporally interleaved patterns

    公开(公告)号:US09992474B2

    公开(公告)日:2018-06-05

    申请号:US14998253

    申请日:2015-12-26

    Abstract: In accordance with disclosed embodiments, there are provided systems, methods, and apparatuses for implementing a stereo depth camera using a VCSEL projector with spatially and temporally interleaved patterns. For instance, a depth camera is described having therein a Vertical-Cavity Surface-Emitting Laser projector (VCSEL projector); in which the VCSEL projector embodies a VCSEL array, the VCSEL being comprised of a plurality of VCSEL elements divided into a plurality of individually addressable subsets of the plurality of VCSEL elements; processing circuitry to activate one or more of the individually addressable subsets of the plurality of VCSEL elements to cause the VCSEL projector to emit a plurality of infrared beams through a projection lens to form a projected pattern which is projected onto a scene; stereoscopic image capture devices to capture stereoscopic imagery from the scene having the projected pattern projected thereupon; and processing circuitry to determine depth to an object in the scene based on the captured stereoscopic imagery from the scene having the projected pattern represented therein as projected from the VCSEL projector. Other related embodiments are disclosed.

    METHODS AND APPARATUS TO CALIBRATE SPATIAL LIGHT MODULATORS

    公开(公告)号:US20210325828A1

    公开(公告)日:2021-10-21

    申请号:US17359151

    申请日:2021-06-25

    Abstract: Methods and apparatus to calibrate spatial light modulators are disclosed. Examples include processor circuitry to execute and/or instantiate instructions to provide a greyscale image to a spatial light modulator (SLM) to define voltages to be applied to individual pixels of the SLM. The voltages associated with pixel values in the greyscale image. The pixel values arranged in a double-slit grating pattern. The SLM to produce an interference pattern based on the double-slit grating pattern. The processor circuitry is to determine a phase difference between first and second gratings of the double-slit grating pattern based on the interference pattern. The processor circuitry is to generate a phase curvature based on the phase difference.

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