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    Anti-Glare Coatings with Sacrificial Surface Roughening Agents and Methods for Forming the Same
    1.
    发明申请
    Anti-Glare Coatings with Sacrificial Surface Roughening Agents and Methods for Forming the Same 审中-公开
    具有牺牲表面粗化剂的防眩涂料及其形成方法

    公开(公告)号：US20140272127A1

    公开(公告)日：2014-09-18

    申请号：US14064921

    申请日：2013-10-28

    Applicant: Intermolecular Inc.

    Inventor： Nikhil Kalyankar ,  Scott Jewhurst

    IPC: G02B1/11

    CPC classification number: G02B1/113 ,  C09D5/006 ,  C09D7/63 ,  G02B1/12 ,  G02B5/0294 ,  G02B2207/107 ,  G02B2207/109 ,  Y10T428/25 ,  Y10T428/259

    Abstract: Embodiments provided herein describe optical coatings, panels having optical coatings thereon, and methods for forming optical coatings and panels. A sol-gel matrix is formed above a surface of a substrate. Organic micro-particles are embedded in a surface of the sol-gel matrix. A heat treatment is applied to the sol-gel matrix and the embedded plurality of organic micro-particles. Substantially all of the organic micro-particles are removed during the heat treatment, and after the heat treatment, the sol-gel matrix has a surface roughness suitable to provide anti-glare properties.

    Abstract translation: 本文提供的实施方案描述了光学涂层，其上具有光学涂层的面板，以及用于形成光学涂层和面板的方法。 溶胶 - 凝胶基质形成在基材表面上方。 有机微粒子嵌入溶胶 - 凝胶基质的表面。 对溶胶 - 凝胶基质和嵌入的多个有机微粒子进行热处理。 在热处理期间，基本上所有的有机微粒被去除，并且在热处理之后，溶胶 - 凝胶基质具有适于提供抗眩光性能的表面粗糙度。

    Anti-Reflective Coatings with Porosity Gradient and Methods for Forming the Same
    3.
    发明申请
    Anti-Reflective Coatings with Porosity Gradient and Methods for Forming the Same 审中-公开
    具有孔隙度梯度的抗反射涂层及其形成方法

    公开(公告)号：US20140268348A1

    公开(公告)日：2014-09-18

    申请号：US13801123

    申请日：2013-03-13

    Applicant: INTERMOLECULAR INC.

    Inventor： Scott Jewhurst ,  Nikhil Kalyankar

    IPC: G02B1/11

    CPC classification number: G02B1/11 ,  C09D127/18

    Abstract: Embodiments provided herein provide anti-reflective coatings with porosity gradients and methods for forming such anti-reflective coatings. A transparent substrate is provided. A primary material and a sacrificial material are simultaneously deposited above the transparent substrate to form a coating above the transparent substrate. At least some of the sacrificial material is removed from the coating to form a plurality of pores in the coating.

    Abstract translation: 本文提供的实施例提供具有孔隙度梯度的抗反射涂层和用于形成这种抗反射涂层的方法。 提供透明基板。 同时在透明衬底上方沉积初级材料和牺牲材料，以在透明衬底之上形成涂层。 至少一些牺牲材料从涂层中去除以在涂层中形成多个孔。

    Anti-Glare Coatings with Aqueous Particle Dispersions and Methods for Forming the Same
    4.
    发明申请
    Anti-Glare Coatings with Aqueous Particle Dispersions and Methods for Forming the Same 审中-公开
    具有水性颗粒分散体的防眩涂料及其形成方法

    公开(公告)号：US20140272387A1

    公开(公告)日：2014-09-18

    申请号：US14044234

    申请日：2013-10-02

    Applicant: Intermolecular Inc.

    Inventor： Scott Jewhurst ,  Nikhil Kalyankar

    IPC: C09D5/00 ,  G02B1/11

    CPC classification number: G02B1/113 ,  C09D5/006 ,  C09D7/63 ,  G02B1/12 ,  G02B5/0294 ,  G02B2207/107 ,  G02B2207/109 ,  Y10T428/25 ,  Y10T428/259

    Abstract: Embodiments provided herein describe optical coatings, panels having optical coatings thereon, and methods for forming optical coatings and panels. A substrate is provided. A coating formulation is applied to the substrate. The coating formulation includes an aqueous-based suspension of particles. The particles have a sheet-like morphology and a thickness of less than about 100 nanometers (nm). The coating formulation is cured to form an anti-glare coating above the substrate. The anti-glare coating has a thickness of between 1 micrometer (μm) and 100 μm.

    Abstract translation: 本文提供的实施方案描述了光学涂层，其上具有光学涂层的面板，以及用于形成光学涂层和面板的方法。 提供基板。 将涂料制剂施用于基材。 涂层制剂包括颗粒的水性悬浮液。 颗粒具有片状形态和小于约100纳米（nm）的厚度。 固化涂料配方以在基材上形成防眩涂层。 抗眩光涂层的厚度为1微米（μm）至100μm。

    Silicon Texturing Formulations
    6.
    发明申请
    Silicon Texturing Formulations 审中-公开
    硅纹制剂

    公开(公告)号：US20140231704A1

    公开(公告)日：2014-08-21

    申请号：US14261739

    申请日：2014-04-25

    Applicant: Intermolecular, Inc.

    Inventor： Zhi-Wen Sun ,  Nikhil Kalyankar ,  Nitin Kumar ,  Minh Anh Nguyen ,  Sagar Vijay

    IPC: H01L31/0236

    CPC classification number: H01L31/02366 ,  C23F1/16 ,  H01L31/0236 ,  H01L31/02363 ,  Y02E10/50

    Abstract: The present disclosure includes a texture formulation that includes an aliphatic diol, an alkaline compound and water which provides a consistent textured region across a silicon surface suitable for solar cell applications. The current invention describes silicon texturing formulations that include at least one high boiling point additive. The high boiling point additive may be a derivative compound of propylene glycol or a derivative compound of ethylene glycol. Processes for texturing a crystalline silicon substrate using these formulations are also described. Additionally, a combinatorial method of optimizing the textured surface of a crystalline silicon substrate is described.

    Abstract translation: 本公开内容包括包含脂族二醇，碱性化合物和水的纹理制剂，其在适于太阳能电池应用的硅表面上提供一致的纹理区域。 本发明描述了包含至少一种高沸点添加剂的硅纹理配方。 高沸点添加剂可以是丙二醇或乙二醇的衍生化合物的衍生化合物。 还描述了使用这些制剂对晶体硅衬底进行纹理化的工艺。 另外，描述了优化结晶硅衬底的纹理表面的组合方法。

    ANTIREFLECTION COATINGS
    7.
    发明申请
    ANTIREFLECTION COATINGS 审中-公开
    抗反射涂层

    公开(公告)号：US20140178657A1

    公开(公告)日：2014-06-26

    申请号：US13723954

    申请日：2012-12-21

    Applicant: INTERMOLECULAR INC.

    Inventor： Scott Jewhurst ,  Nikhil Kalyankar

    IPC: B32B7/02 ,  B05D5/06

    CPC classification number: G02B1/115 ,  C03C17/25 ,  C03C17/30 ,  C03C2217/241 ,  C03C2217/732 ,  C03C2218/113 ,  Y10T428/24942

    Abstract: Fluorine-doped antireflection coatings, methods for preparing the coatings and articles comprising the coatings are disclosed. The fluorine-doped antireflection coating comprises a fluorine-doped xerogel coating disposed on a substrate. The index of refraction of the xerogel coating is less than the index of refraction of the substrate, generally between about 1.15 and about 1.45. The fluorine atoms can be distributed uniformly through the thickness of the coating, disposed at the surface of the coating, or the distribution can be graded from the surface through the thickness of the coating. The methods comprise applying a coating precursor solution comprising a sol-gel precursor to a glass substrate, heating the coating to form a xerogel coating, and fluorine-doping the coating. The fluorine-doping can be performed by utilizing a coating precursor solution comprising a first fluorine source, contacting the cured coating with a second fluorine source, or a combination thereof.

    Abstract translation: 公开了氟掺杂抗反射涂层，制备涂层的方法和包含涂层的制品。 氟掺杂抗反射涂层包括设置在基底上的掺氟干凝胶涂层。 干凝胶涂层的折射率小于基材的折射率，通常在约1.15至约1.45之间。 氟原子可以均匀地分布在涂层的厚度上，设置在涂层的表面，或者分布可以从表面通过涂层的厚度分级。 所述方法包括将包含溶胶 - 凝胶前体的涂层前体溶液涂覆到玻璃基底上，加热涂层以形成干凝胶涂层，并对该涂层进行氟掺杂。 氟掺杂可以通过利用包含第一氟源的涂覆前体溶液，使固化的涂层与第二氟源接触或其组合来进行。

    Anti-Glare Using a Two-Step Texturing Process
    8.
    发明申请
    Anti-Glare Using a Two-Step Texturing Process 审中-公开
    使用两步纹理过程的防眩光

    公开(公告)号：US20140161989A1

    公开(公告)日：2014-06-12

    申请号：US13712048

    申请日：2012-12-12

    Applicant: INTERMOLECULAR, INC.

    Inventor： Nikhil Kalyankar ,  Scott Jewhurst ,  Minh Huu Le

    IPC: B05D5/06

    CPC classification number: G02B5/0294 ,  B82Y30/00 ,  C23C18/1212 ,  C23C18/1216 ,  C23C18/1254 ,  C23C18/1295 ,  G02B2207/107 ,  G02B2207/109

    Abstract: Methods for forming anti-glare coatings including forming a layer using a sol-gel process are described. The layer further includes at least one of porogens, nanoparticles, or photosensitive macromolecules. The porogens, nanoparticles, or photosensitive macromolecules are removed using a thermal treatment or UV treatment to impart porosity and surface roughness to the layer. Alternatively, the layer may be roughened using a mechanical process. The layer can optionally be subjected to a curing step. The curing step may be a thermal curing process or a chemical curing process.

    Abstract translation: 描述了形成抗眩光涂层的方法，包括使用溶胶 - 凝胶法形成层。 该层还包括致孔剂，纳米颗粒或光敏大分子中的至少一种。 使用热处理或UV处理除去致孔剂，纳米颗粒或光敏大分子，以赋予层的孔隙率和表面粗糙度。 或者，可以使用机械方法使该层变粗糙。 该层可以任选地进行固化步骤。 固化步骤可以是热固化过程或化学固化过程。

    Silicon texturing formulations
    10.
    发明授权
    Silicon texturing formulations 有权
    硅纹理配方

    公开(公告)号：US09099582B2

    公开(公告)日：2015-08-04

    申请号：US14261739

    申请日：2014-04-25

    Applicant: Intermolecular, Inc.

    Inventor： Zhi-Wen Sun ,  Nikhil Kalyankar ,  Nitin Kumar ,  Minh Anh Nguyen ,  Sagar Vijay

    IPC: C09K13/02 ,  H01L31/0236 ,  C23F1/16

    CPC classification number: H01L31/02366 ,  C23F1/16 ,  H01L31/0236 ,  H01L31/02363 ,  Y02E10/50

    Abstract: The present disclosure includes a texture formulation that includes an aliphatic diol, an alkaline compound and water which provides a consistent textured region across a silicon surface suitable for solar cell applications. The current invention describes silicon texturing formulations that include at least one high boiling point additive. The high boiling point additive may be a derivative compound of propylene glycol or a derivative compound of ethylene glycol. Processes for texturing a crystalline silicon substrate using these formulations are also described. Additionally, a combinatorial method of optimizing the textured surface of a crystalline silicon substrate is described.

    Abstract translation: 本公开内容包括包含脂族二醇，碱性化合物和水的纹理制剂，其在适于太阳能电池应用的硅表面上提供一致的纹理区域。 本发明描述了包含至少一种高沸点添加剂的硅纹理配方。 高沸点添加剂可以是丙二醇或乙二醇的衍生化合物的衍生化合物。 还描述了使用这些制剂对晶体硅衬底进行纹理化的工艺。 另外，描述了优化结晶硅衬底的纹理表面的组合方法。

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