公开(公告)号：US20050235243A1

公开(公告)日：2005-10-20

申请号：US11083960

申请日：2005-03-21

申请人： Ippei Hachiya ,  Tetsuo Sasaki ,  Katsuyuki Itoh ,  Hiroyuki Suzuki

发明人： Ippei Hachiya ,  Tetsuo Sasaki ,  Katsuyuki Itoh ,  Hiroyuki Suzuki

IPC分类号： G06F17/50 ,  H03K17/693 ,  H05K3/00

CPC分类号： G06F17/5077

摘要： By deciding a draw wiring route from a part to eliminate an intersection of wire connections generated by the part direction and the terminal arrangement order, it is possible to reduce the wiring layer used and increase the mounting density. Draw wiring processing from terminals of parts is performed prior to the entire wiring processing. In order to optimally perform the draw wiring processing, the parts connected to an object to be wired are moved onto a virtual wiring board and wiring processing is performed there. When moving a part from the real wiring board, an area around the part is cut out from the real wiring board and moved onto the virtual wiring board. On the virtual wiring board, the part direction is rotated and parallel-displaced to arrange it in the optimal state for the wiring to decide the draw wiring direction and perform wiring between the respective terminals.

摘要翻译： 通过决定从零件的布线路线消除由部分方向和端子布置顺序产生的线连接，可以减少所使用的布线层并增加安装密度。 在整个接线处理之前进行从零件端子的接线处理。 为了最佳地执行拉制布线处理，连接到待布线对象的部件移动到虚拟布线板上，并且在那里执行布线处理。 当从真正的布线板移动零件时，将零件周围的区域从真正的布线板切出并移动到虚拟布线板上。 在虚拟布线板上，部件方向旋转并且平行移位，以使布线成为布线的最佳状态，以决定拉丝方向并执行各端子之间的布线。

公开(公告)号：US07251802B2

公开(公告)日：2007-07-31

申请号：US11083960

申请日：2005-03-21

申请人： Ippei Hachiya ,  Tetsuo Sasaki ,  Katsuyuki Itoh ,  Hiroyuki Suzuki

发明人： Ippei Hachiya ,  Tetsuo Sasaki ,  Katsuyuki Itoh ,  Hiroyuki Suzuki

IPC分类号： G06F17/50

CPC分类号： G06F17/5077

摘要： A wiring route deciding system, for a wiring board containing a multi-pin part, includes an input unit for receiving wiring board and wire connection information, wiring constraint information and wiring setting information, for example. The system further contains a draw wiring processing unit which decides a wiring route of a draw wiring from a part pin to a part periphery boundary based on wiring information inputted by the input unit, an inter-draw wire wiring processing unit which decides the wiring route taken between end points of the draw wiring decided by the draw wiring processing unit, and an output unit which outputs a wiring route information based on that decided by both the draw wiring processing unit and the inter-draw wire wiring processing unit. There is also provided a method counterpart for a wire routing scheme for a wiring board containing a multi-pin part.

摘要翻译： 对于包含多针部分的布线板，布线路径决定系统包括例如用于接收布线板的输入单元和布线连接信息，布线约束信息和布线设置信息。 该系统还包括一个拉线布线处理单元，该布线处理单元根据由输入单元输入的布线信息，确定从一个引脚到一部分边界边界的布线的布线路线;布线布线处理单元， 在由拉丝布线处理单元决定的拉丝布线的端点之间取出，以及输出单元，该输出单元基于由拉丝布线处理单元和拉伸布线处理单元决定的布线路线信息。 还提供了一种用于包含多引脚部分的布线板的布线方案的方法。

公开(公告)号：US06288407B1

公开(公告)日：2001-09-11

申请号：US08918165

申请日：1997-08-25

申请人： Katsuyuki Itoh

发明人： Katsuyuki Itoh

IPC分类号： H01L21027

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/31776

摘要： An electron beam-writing apparatus comprising a first beam-shaping aperture means and a second beam-shaping aperture means, wherein the first and/or second beam-shaping aperture means has an aperture(s) of a shape(s) corresponding to the desired patterns to be written on a semiconductor substrate; and an electron beam-writing method of improved throughput using the apparatus.

摘要翻译： 一种电子束写入装置，包括第一光束成形孔装置和第二光束成形孔装置，其中第一和/或第二光束整形孔装置具有对应于形状的孔的一个或多个孔， 要写在半导体衬底上的期望图案; 以及使用该装置提高吞吐量的电子束写入方法。

公开(公告)号：US07735040B2

公开(公告)日：2010-06-08

申请号：US11624788

申请日：2007-01-19

申请人： Katsuyuki Itoh ,  Hironori Iwamoto

发明人： Katsuyuki Itoh ,  Hironori Iwamoto

IPC分类号： G06F17/50

CPC分类号： G06F17/5068

摘要： With a conventional method for designing cell layout, it is necessary to give relative positional information in advance to all cells to be arranged. Furthermore, the method is troublesome because it is necessary to correct relative positional information of cells after confirming a result of temporary layout. Therefore, it takes time to obtain a layout result.The present invention extracts cells of a specific type specified from outside or cells satisfying specific conditions, arranges these specific cells first or limits a layout position by specifying a layout position, then arranges the remaining cells using a general layout algorithm.

摘要翻译： 利用用于设计单元布局的常规方法，需要预先给予要布置的所有单元的相对位置信息。 此外，该方法是麻烦的，因为在确认临时布局的结果之后需要校正单元的相对位置信息。 因此，获取布局结果需要时间。 本发明提取从外部指定的特定类型的细胞或满足特定条件的细胞，首先布置这些特定细胞或通过指定布局位置来限制布局位置，然后使用一般布局算法布置剩余的细胞。

公开(公告)号：US5438207A

公开(公告)日：1995-08-01

申请号：US334225

申请日：1994-11-04

申请人： Katsuyuki Itoh ,  Hiroshi Yamashita

发明人： Katsuyuki Itoh ,  Hiroshi Yamashita

IPC分类号： G21K5/04 ,  G03F7/20 ,  H01J37/09 ,  H01J37/317 ,  H01L21/027 ,  H01J37/304

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/30455 ,  H01J2237/31754

摘要： In an electron beam direct writing system having an aperture member, an evaluation aperture is provided for the aperture member for mapping evaluation patterns in a drawn pattern on a semiconductor substrate. Short lines having a predetermined width are arranged at first pitches in horizontal and vertical directions in peripheral portions of a first shot pattern to form a first line/interval pattern. Similarly, short lines are arranged at second pitches slightly different from the first pitches in the horizontal and vertical directions in peripheral portions of second and third shot patterns to form second line/interval patterns. Quantities of rotation and gain of a shot are determined from matching positions between evaluation patterns of the shot patterns. It is permitted in a short period of time to adjust the exposure dose, correct positional errors such as a stitching error, align component members and achieve an evaluation on reproductivity.

摘要翻译： 在具有孔径构件的电子束直接写入系统中，为孔径构件提供评估孔，用于在半导体衬底上以绘制图案映射评估图案。 具有预定宽度的短线在第一射出图案的周边部分中以水平和垂直方向的第一间距布置，以形成第一线/间隔图案。 类似地，在第二和第三射击图案的周边部分中，短线以与水平和垂直方向上的第一间距稍微不同的第二间距布置，以形成第二线/间隔图案。 通过拍摄图案的评估图案之间的匹配位置确定拍摄的旋转量和增益。 允许在短时间内调整曝光剂量，纠正位置错误，如拼接错误，对准组件，并对再现性进行评估。

公开(公告)号：US4545670A

公开(公告)日：1985-10-08

申请号：US540292

申请日：1983-10-11

申请人： Katsuyuki Itoh ,  Shinichi Itoh ,  Michiaki Otsuki

发明人： Katsuyuki Itoh ,  Shinichi Itoh ,  Michiaki Otsuki

IPC分类号： G03G15/09 ,  G03G15/00

CPC分类号： G03G15/09

摘要： A developing apparatus for electrophotography is disclosed which comprises a toner hopper as a vessel of a magnetic developer, the toner hopper having an opening formed between one side plate of the toner hopper and a developing sleeve to effect delivery and recovery of the magnetic developer, the developing sleeve being rotated from a developing zone for developing a latent image on a latent image-bearing member with the magnetic developer toward the opening and the plate of said toner hopper other than the opening being in abutting contact with the surface of the developing sleeve, a magnet roll comprising a plurality of magnets, which is rotated in the same direction as the rotation direction of the developing sleeve on the inner side of the developing sleeve, and a stopper for regulating the zone of delivery of a layer of the magnetic developer on the surface of the developing sleeve by causing the top end of the stopper to abut on or come close to the surface of the developing sleeve along the direction of the rotation axis of the developing sleeve, wherein the rotational speed of the developing sleeve and the number of rotations of the magnet roll are set so that the thickness of the layer of the magnetic developer is adjusted to a desired value.

摘要翻译： 公开了一种用于电子照相的显影装置，其包括作为磁性显影剂的容器的调色剂料斗，所述调色剂料斗具有形成在调色剂料斗的一个侧板和显影套筒之间的开口，以实现磁性显影剂的输送和回收， 显影套筒从显影区域旋转，用于将具有磁性显影剂的潜像承载部件上的潜像显影向显影套筒的表面与开口不同的所述调色剂料斗的开口和平板， 包括多个磁体的磁辊，该多个磁体在与显影套筒的内侧上的显影套筒的旋转方向相同的方向上旋转，以及用于调节磁性显影剂层的输送区域的止动器 显影套筒的表面通过使止动器的顶端邻接或接近显影槽的表面 沿着显影套筒的旋转轴线的方向前进，其中显影套筒的旋转速度和磁辊的旋转数量被设定为使得磁性显影剂的层的厚度被调节到期望的值。

公开(公告)号：US06627357B2

公开(公告)日：2003-09-30

申请号：US09837721

申请日：2001-04-17

申请人： Katsuyuki Itoh

发明人： Katsuyuki Itoh

IPC分类号： G03F900

CPC分类号： G03F1/50

摘要： A reticle includes a first substrate including a first light-permeable substrate, and a first pattern formed on the first light-permeable substrate and having a first light transmittance, and a second substrate including a second light-permeable substrate, and a second pattern formed on the second light-permeable substrate and having a second light transmittance. The first and second substrates are coupled to each other such that the first and second patterns face each other. A part of the first and second patterns at which the first and second patterns overlap each other defines a light-impermeable pattern.

摘要翻译： 标线片包括：第一基板，包括第一透光性基板和形成在第一透光性基板上的具有第一透光性的第一图案，以及包括第二透光性基板的第二基板和形成为第二透明基板的第二图案 在第二透光性基板上，具有第二透光性。 第一和第二基板彼此连接，使得第一和第二图案彼此面对。 第一和第二图案的第一和第二图案的一部分彼此重叠定义了不透光图案。

公开(公告)号：US06296925B1

公开(公告)日：2001-10-02

申请号：US08923177

申请日：1997-09-04

申请人： Katsuyuki Itoh

发明人： Katsuyuki Itoh

IPC分类号： B32B324

CPC分类号： G03F1/20 ,  H01J37/09 ,  H01J2237/0453 ,  H01J2237/3175 ,  Y10T428/24273 ,  Y10T428/24322 ,  Y10T428/24331

摘要： An aperture plate for a charged beam drawing machine includes a body substrate having such a construction that opposite sides of a center plane in a thickness direction have the same structure. With this arrangement, it is possible to minimize a warp occurring in the course of forming the aperture plate, and therefore, the forming yield can be elevated.

摘要翻译： 用于带电束束机的孔板包括具有这样一种构造的主体基板，即在厚度方向上的中心平面的相对侧具有相同的结构。 通过这种布置，可以最小化在形成孔板的过程中发生的翘曲，因此可以提高成形率。

公开(公告)号：US5784150A

公开(公告)日：1998-07-21

申请号：US749956

申请日：1996-11-14

申请人： Katsuyuki Itoh

发明人： Katsuyuki Itoh

IPC分类号： H01L21/027 ,  G03F7/20 ,  H01J37/22 ,  H01J37/304 ,  G03B27/42

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/226 ,  H01J37/3045 ,  H01J2237/30438 ,  H01J2237/3175

摘要： An electron-beam cell projection lithography apparatus includes an electron-beam source, a first aperture through which an electron-beam transmitted from the electron-beam source passes is shaped, and a second aperture formed with an aperture in a desired transfer pattern. The electron beam passes through the second aperture and irradiates an object. The second aperture is placed on a stage, which is movable in X and Y axes directions. A registration mark is placed or positioned on at least one of the second aperture and the stage. The apparatus also includes a device such as a microscope, a charge coupled device (CCD) for observing the registration mark to position the second aperture. The observing device has variable magnifications. The second aperture can be positioned by observing the registration mark with the observing device having variable magnifications. Thus, the second aperture is first roughly positioned by virtue of the registration mark by observing the second aperture and a wide area of the stage with the observing device adjusted to have low magnifications, and then accurately positioned with the observing device adjusted to have high magnifications. Thus, it is possible to align the registration mark with a reference point in a short period of time, thereby accomplishing rapid positional adjustment of the stage on which the second aperture is placed. In addition, since the second aperture can be wholly observed, it is possible to find defects and damages of a transfer pattern.

摘要翻译： 电子束单元投影光刻设备包括电子束源，从电子束源发射的电子束通过的第一孔成形，以及形成有所需转印图案的孔的第二孔。 电子束通过第二孔并照射物体。 第二孔被放置在能沿X和Y轴方向移动的平台上。 登记标记放置或定位在第二孔径和台架中的至少一个上。 该装置还包括诸如显微镜的装置，用于观察对准标记以定位第二孔的电荷耦合装置（CCD）。 观察装置具有可变放大倍率。 可以通过用具有可变放大率的观察装置观察对准标记来定位第二孔。 因此，通过观察第二孔径和将观察装置调整为具有低放大率的阶段的宽区域，首先通过对准标记大致定位第二孔径，然后将观察装置调整为具有高倍率的精确定位 。 因此，可以在短时间内对准标记与参考点，从而实现放置第二孔的台的快速位置调整。 此外，由于可以完全观察到第二孔，所以可以发现转印图案的缺陷和损坏。

公开(公告)号：US5557110A

公开(公告)日：1996-09-17

申请号：US375487

申请日：1995-01-19

申请人： Katsuyuki Itoh

发明人： Katsuyuki Itoh

IPC分类号： H01L21/027 ,  G01D4/00 ,  G05B19/042 ,  H01J37/09 ,  H01J37/317 ,  H04L12/28 ,  H04M11/00

CPC分类号： H04M11/00 ,  B82Y10/00 ,  B82Y40/00 ,  G05B19/0423 ,  H01J37/09 ,  H01J37/3174 ,  H01J37/3175 ,  H01J2237/0453 ,  H01J2237/31776

摘要： Window-like openings are cut through an aperture with cell projecting blocks using an electron beam system with pattern writing capability, and isolated patterns are supported by microbridges in respective openings. Widths of the microbridges are less than the resolution limitation of the electron beam, and thereby isolated patterns, such as frame-shaped shading patterns, can be written of a resist film, and the through-put of the lithography process can be increased. The aperture with cell projecting blocks can be formed so as to utilize both positive and negative resist film masks.

摘要翻译： 通过具有图案写入能力的电子束系统的具有单元突出块的孔切割窗形开口，并且隔离图案由相应开口中的微桥支撑。 微桥的宽度小于电子束的分辨率限制，从而可以形成诸如框状阴影图案的隔离图案，并且可以增加光刻工艺的通过。 可以形成具有单元突出块的孔径，以便利用正面和负面抗蚀剂膜掩模。