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    PRECURSOR MATERIAL DELIVERY SYSTEM WITH THERMAL ENHANCEMENTS FOR ATOMIC LAYER DEPOSITION
    3.
    发明申请
    PRECURSOR MATERIAL DELIVERY SYSTEM WITH THERMAL ENHANCEMENTS FOR ATOMIC LAYER DEPOSITION 审中-公开
    用于原子层沉积的热增强的前体材料输送系统

    公开(公告)号：US20070089674A1

    公开(公告)日：2007-04-26

    申请号：US11564276

    申请日：2006-11-28

    申请人： Bradley Aitchison ,  Jarmo Maula ,  Hannu Leskinen ,  Teemu Lang ,  Pekka Kuosmanen ,  Kari Harkonen ,  Martti Sonninen ,  Tommy Turkulainen

    发明人： Bradley Aitchison ,  Jarmo Maula ,  Hannu Leskinen ,  Teemu Lang ,  Pekka Kuosmanen ,  Kari Harkonen ,  Martti Sonninen ,  Tommy Turkulainen

    IPC分类号： C23C16/00 ,  B01D46/00

    CPC分类号： B01D45/06 ,  C23C16/4402 ,  C23C16/4404 ,  C23C16/4412 ,  C23C16/45525 ,  C23C16/45544 ,  C23C16/4557 ,  C30B25/14 ,  Y10S55/14

    摘要： A precursor delivery system includes a flow path from a precursor container to a reaction space of a thin film deposition system, such as an atomic layer deposition (ALD) reactor. At least a portion of the flow path may be formed in one or more blocks of thermally conductive material forming an elongate thermally conductive body extending from the precursor container toward the reaction space. In some embodiments, a heater is thermally associated with the thermally conductive body to inhibit condensation of precursor vapor in the flow path. A high conductivity particle filter having inertial traps is preferably included for filtering particles from the precursor material. The particle filter preferably include a filter passage including turns and inertial traps adjacent the turns. In some embodiments, the filter passage and the inertial traps may be formed in the thermally conductive body between the precursor container and the reaction space.

    摘要翻译： 前体递送系统包括从前体容器到诸如原子层沉积（ALD）反应器的薄膜沉积系统的反应空间的流动路径。 流路的至少一部分可以形成在一个或多个导热材料块中，形成从前体容器朝向反应空间延伸的细长导热体。 在一些实施例中，加热器与导热体热关联，以阻止前述流体在流路中的冷凝。 优选包括具有惯性陷阱的高电导率粒子滤波器，用于从前体材料过滤颗粒。 颗粒过滤器优选包括过滤器通道，该过滤器通道包括与匝相邻的匝和惯性掣子。 在一些实施例中，过滤器通道和惯性陷阱可以形成在前体容器和反应空间之间的导热体中。

    DIAPHRAGM VALVE FOR ATOMIC LAYER DEPOSITION
    4.
    发明申请
    DIAPHRAGM VALVE FOR ATOMIC LAYER DEPOSITION 有权
    用于原子层沉积的膜片阀

    公开(公告)号：US20060174945A1

    公开(公告)日：2006-08-10

    申请号：US11278482

    申请日：2006-04-03

    申请人： Jarmo Maula ,  Hannu Leskinen ,  Teemu Lang ,  Pekka Kuosmanen ,  Kari Harkonen ,  Bradley Aitchison

    发明人： Jarmo Maula ,  Hannu Leskinen ,  Teemu Lang ,  Pekka Kuosmanen ,  Kari Harkonen ,  Bradley Aitchison

    IPC分类号： F16K7/12

    CPC分类号： F16K31/0693 ,  F16K7/14 ,  F16K31/06 ,  F16K49/002 ,  Y10T137/6606

    摘要： A shut-off type diaphragm valve adapted for use in an atomic layer deposition system includes a flexible diaphragm operable to flex between an open position whereby a valve passage is at least partially open and a closed position whereby a substantial portion of a first side of the diaphragm is pressed against a valve seat to thereby block the valve passage and facilitate heat transfer between the valve seat and the diaphragm. In some embodiments, a heating body thermally contacts the valve body and extends proximal to a second side of the diaphragm opposite the first side thereof to form a thermally conductive pathway that facilitates maintaining an operating temperature at the diaphragm. A thermally resistive member may be interposed between the valve passage and an actuator, such as a solenoid, for attenuating heat transfer between the valve passage and the actuator.

    摘要翻译： 适于在原子层沉积系统中使用的截止型隔膜阀包括可操作以在打开位置之间弯曲的柔性隔膜，由此阀通道至少部分打开，并且闭合位置，从而使第 隔膜被压靠在阀座上，从而阻塞阀通道并促进阀座与隔膜之间的热传递。 在一些实施例中，加热体与阀体热接触并且在隔膜的与其第一侧相对的第二侧附近延伸，以形成便于维持隔膜处的工作温度的导热通路。 可以在阀通道和诸如螺线管的致动器之间插入热阻构件，用于减弱阀通道和致动器之间的热传递。

    Precursor material delivery system for atomic layer deposition
    5.
    发明授权
    Precursor material delivery system for atomic layer deposition 有权
    用于原子层沉积的前体材料输送系统

    公开(公告)号：US07141095B2

    公开(公告)日：2006-11-28

    申请号：US10660365

    申请日：2003-09-10

    申请人： Bradley J. Aitchison ,  Jarmo Maula ,  Hannu Leskinen ,  Teemu Lang ,  Pekka Kuosmanen ,  Kari Härkönen ,  Martti Sonninen

    发明人： Bradley J. Aitchison ,  Jarmo Maula ,  Hannu Leskinen ,  Teemu Lang ,  Pekka Kuosmanen ,  Kari Härkönen ,  Martti Sonninen

    IPC分类号： B01D45/04 ,  C23C16/00

    CPC分类号： B01D45/06 ,  C23C16/4402 ,  C23C16/4404 ,  C23C16/4412 ,  C23C16/45525 ,  C23C16/45544 ,  C23C16/4557 ,  C30B25/14 ,  Y10S55/14

    摘要： A precursor delivery system includes a flow path from a precursor container to a reaction space of a thin film deposition system, such as an atomic layer deposition (ALD) reactor. A staging volume is preferably established between the precursor container and the reaction space for receiving at least one dose of the precursor material from the precursor container, from which a series of pulses is released toward the reaction space. The precursor material is typically vaporized after loading it in the precursor container by heating or reducing the pressure inside the precursor container. A vacuum line is preferably coupled to the precursor container and bypasses the reaction space for reducing pressure inside the precursor container without drawing particles into the reaction space. A high conductivity particle filter having inertial traps may be included, preferably between the precursor container and a staging volume, for filtering particles from the precursor material.

    摘要翻译： 前体递送系统包括从前体容器到诸如原子层沉积（ALD）反应器的薄膜沉积系统的反应空间的流动路径。 优选地，在前体容器和反应空间之间建立分级体积，用于从前体容器接收至少一个剂量的前体材料，从该容器中向反应空间释放一系列脉冲。 通过加热或降低前体容器内的压力，将前体材料通常在将其加载到前体容器中之后进行蒸发。 真空管线优选地连接到前体容器并绕过反应空间，用于减小前体容器内部的压力，而不会将颗粒吸入反应空间。 可以包括具有惯性陷阱的高导电性粒子过滤器，优选在前体容器和分级体积之间，用于从前体材料过滤粒子。

    GAS DEPOSITION REACTOR
    6.
    发明申请
    GAS DEPOSITION REACTOR 审中-公开
    气体沉积反应器

    公开(公告)号：US20110265720A1

    公开(公告)日：2011-11-03

    申请号：US13143306

    申请日：2010-02-11

    申请人： Jarmo Maula ,  Hannu Leskinen ,  Kari Harkonen

    发明人： Jarmo Maula ,  Hannu Leskinen ,  Kari Harkonen

    IPC分类号： C23C16/46

    CPC分类号： C23C16/46 ,  C23C16/45546 ,  C30B25/10

    摘要： A reactor is provided for a gas deposition method, in which method the surface of a substrate is subjected to alternate starting material surface reactions. The reactor includes a first chamber, a second chamber mounted inside the first chamber, and heating means for heating the first chamber. The reactor also includes one or more heat transfer elements for equalising temperature differences inside the first chamber.

    摘要翻译： 提供了一种用于气体沉积方法的反应器，其中基板的表面经历了交替的起始材料表面反应。 反应器包括第一室，安装在第一室内的第二室和用于加热第一室的加热装置。 反应器还包括用于均衡第一室内的温度差的一个或多个传热元件。

    Diaphragm valve with reliability enhancements for atomic layer deposition
    8.
    发明授权
    Diaphragm valve with reliability enhancements for atomic layer deposition 失效
    隔膜阀具有原子层沉积的可靠性增强

    公开(公告)号：US07021330B2

    公开(公告)日：2006-04-04

    申请号：US10609339

    申请日：2003-06-26

    申请人： Jarmo Ilmari Maula ,  Hannu Leskinen ,  Teemu Lang ,  Pekka Kuosmanen ,  Kari Härkönen ,  Bradley J. Aitchison

    发明人： Jarmo Ilmari Maula ,  Hannu Leskinen ,  Teemu Lang ,  Pekka Kuosmanen ,  Kari Härkönen ,  Bradley J. Aitchison

    IPC分类号： F16K49/00 ,  F16K31/126

    CPC分类号： F16K31/0693 ,  F16K7/14 ,  F16K31/06 ,  F16K49/002 ,  Y10T137/6606

    摘要： A shut-off type diaphragm valve adapted for use in an atomic layer deposition system includes a valve seat having an annular seating surface that surrounds an inlet of the valve and extends radially therefrom. The seating surface contacts a substantial portion of the first side of a flexible diaphragm when the diaphragm is closed, to facilitate heat transfer and counteract dissipative cooling of the diaphragm, thereby inhibiting condensation of a medium flowing through the valve passage. The seating surface is preferably flat and smooth, to prevent shearing of an elastomeric diaphragm. For a plastic diaphragm, a ring-shaped seating ridge may extend from the seating surface to cause localized permanent deformation of the diaphragm and enhanced sealing, while still allowing a substantial portion of the diaphragm to contact the seating surface for enhanced heat transfer. Valve speed enhancements and other reliability enhancing features are also described.

    摘要翻译： 适用于原子层沉积系统的截止型隔膜阀包括阀座，阀座具有围绕阀的入口并从其径向延伸的环形就座表面。 当隔膜闭合时，座面接触柔性膜片的第一侧的大部分，以便于传热并抵消隔膜的耗散冷却，从而阻止流过阀通道的介质的冷凝。 座面优选是平坦且光滑的，以防止弹性膜片的剪切。 对于塑料隔膜，环形的座脊可以从座面延伸，导致隔膜的局部永久变形和增强的密封，同时仍允许隔膜的大部分与座面接触以增强热传递。 还描述了阀速度增强和其他可靠性增强特征。

    Diaphragm valve for high-temperature precursor supply in atomic layer deposition
    9.
    发明授权
    Diaphragm valve for high-temperature precursor supply in atomic layer deposition 失效
    隔膜阀用于原子层沉积中的高温前体供应

    公开(公告)号：US06907897B2

    公开(公告)日：2005-06-21

    申请号：US10609136

    申请日：2003-06-26

    申请人： Jarmo Ilmari Maula ,  Hannu Leskinen ,  Teemu Lang ,  Pekka Kuosmanen ,  Kari Härkönen ,  Bradley J. Aitchison

    发明人： Jarmo Ilmari Maula ,  Hannu Leskinen ,  Teemu Lang ,  Pekka Kuosmanen ,  Kari Härkönen ,  Bradley J. Aitchison

    IPC分类号： F16K7/14 ,  F16K31/06 ,  F16K49/00 ,  F16K31/04

    CPC分类号： F16K31/0693 ,  F16K7/14 ,  F16K49/00 ,  F16K49/002 ,  Y10T137/6416

    摘要： A diaphragm valve includes a heating body that thermally contacts a valve body of the valve and extends proximal to a diaphragm of the valve opposite a valve passage through which medium flows. The heating body forms a thermally conductive pathway between the valve body and the diaphragm that facilitates maintaining an operating temperature at the diaphragm. When used in an atomic layer deposition (ALD) system, the diaphragm valve inhibits condensation or freezing of high-temperature ALD precursor gases in the valve passage. A plunger including thermally insulating features preferably extends through a central opening in the heating body to operably couple a valve actuator to the diaphragm. In some embodiments, a thermally resistive member may be interposed between the valve passage and the actuator for attenuating heat transfer between the valve passage and the actuator.

    摘要翻译： 隔膜阀包括加热体，该加热体与阀的阀体热接触并且靠近阀的隔膜延伸，该隔膜与介质流过的阀通道相对。 加热体在阀体和隔膜之间形成有助于保持隔膜操作温度的导热通路。 当用于原子层沉积（ALD）系统时，隔膜阀阻止阀通道中高温ALD前体气体的冷凝或冷冻。 包括隔热特征的柱塞优选地延伸穿过加热体中的中心开口，以将阀致动器可操作地连接到隔膜。 在一些实施例中，可以在阀通道和致动器之间插入热阻构件，用于衰减阀通道和致动器之间的热传递。

    Diaphragm valve for atomic layer deposition
    10.
    发明授权
    Diaphragm valve for atomic layer deposition 有权
    用于原子层沉积的隔膜阀

    公开(公告)号：US07191793B2

    公开(公告)日：2007-03-20

    申请号：US11278482

    申请日：2006-04-03

    申请人： Jarmo Ilmari Maula ,  Hannu Leskinen ,  Teemu Lang ,  Pekka Kuosmanen ,  Kari Härkönen ,  Bradley J. Aitchison

    发明人： Jarmo Ilmari Maula ,  Hannu Leskinen ,  Teemu Lang ,  Pekka Kuosmanen ,  Kari Härkönen ,  Bradley J. Aitchison

    IPC分类号： F16K7/12

    CPC分类号： F16K31/0693 ,  F16K7/14 ,  F16K31/06 ,  F16K49/002 ,  Y10T137/6606

    摘要： A shut-off type diaphragm valve adapted for use in an atomic layer deposition system includes a flexible diaphragm operable to flex between an open position whereby a valve passage is at least partially open and a closed position whereby a substantial portion of a first side of the diaphragm is pressed against a valve seat to thereby block the valve passage and facilitate heat transfer between the valve seat and the diaphragm. In some embodiments, a heating body thermally contacts the valve body and extends proximal to a second side of the diaphragm opposite the first side thereof to form a thermally conductive pathway that facilitates maintaining an operating temperature at the diaphragm. A thermally resistive member may be interposed between the valve passage and an actuator, such as a solenoid, for attenuating heat transfer between the valve passage and the actuator.

    摘要翻译： 适于在原子层沉积系统中使用的截止型隔膜阀包括可操作以在打开位置之间弯曲的柔性隔膜，由此阀通道至少部分打开，并且闭合位置，从而使第 隔膜被压靠在阀座上，从而阻塞阀通道并促进阀座与隔膜之间的热传递。 在一些实施例中，加热体与阀体热接触并且在隔膜的与其第一侧相对的第二侧附近延伸，以形成便于维持隔膜处的工作温度的导热通路。 可以在阀通道和诸如螺线管的致动器之间插入热阻构件，用于减弱阀通道和致动器之间的热传递。