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1.发明申请公开(公告)号：US20150183931A1
公开(公告)日：2015-07-02
申请号：US14409126
申请日：2013-06-25
Applicant: KANEKA CORPORATION
Inventor： Mari Fujii , Shinji Ozawa , Tomohiro Abo
CPC classification number: C08G73/1042 , C08G69/00 , C08G73/1053 , C08G73/1082 , C08G73/16 , C09D179/08
Abstract: The object of the present invention is to obtain the polyimide and the polyamic acid excellent in heat resistance, low thermal expansion property, and transparency and achieve low birefringence and to provide a product or a member, demanded to have high heat resistance and transparency, by using the polyimide or the polyamic acid. In particular, the object is to provide a product and a member in which the polyimide or the polyamic acid of the present invention is formed on a surface of an inorganic substance such as glass, metal, a metal oxide, or a single crystal silicon. The objects are attained by introducing a rigid structure and an alicyclic structure into a skeleton and using a monomer having a fluorene skeleton together.
Abstract translation: 本发明的目的是获得耐热性，低热膨胀性和透明性优异的聚酰亚胺和聚酰胺酸，并且实现低双折射并提供要求具有高耐热性和透明性的产品或部件，通过 使用聚酰亚胺或聚酰胺酸。 特别是，本发明的目的在于提供一种在玻璃，金属，金属氧化物或单晶硅等无机物质的表面上形成本发明的聚酰亚胺或聚酰胺酸的物质和成分。 通过将刚性结构和脂环结构引入骨架并使用具有芴骨架的单体在一起来实现。
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Patent Agency Ranking
公开(公告)号：US20200025989A1
公开(公告)日：2020-01-23
申请号：US16583814
申请日：2019-09-26
Applicant: KANEKA CORPORATION
Inventor： Ryutaro MUKAI , Hiroto Koma , Shinsuke Akao , Takahiro Yasumoto , Tomohiro Abo
Abstract: Provided are: a novel retardation film which has low photoelastic coefficient, while having good linear thermal expansion coefficient and water absorption; and the novel retardation film which additionally has high heat resistance. The above-described problem is solved by a retardation film which has an absolute value of the linear thermal expansion coefficient of 100 ppm/° C. or less, a glass transition temperature of 180° C. or more, a photoelastic coefficient of from 5×10−12 m2/N to 30×10−12 m2/N and a water absorption of 2.0 wt % or less, or a retardation film which has an absolute value of the linear thermal expansion coefficient of 100 ppm/° C. or less, a photoelastic coefficient of from 5×10−12 m2/N to 30×10−12 m2/N and a water absorption of 2.0 wt % or less.
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公开(公告)号：US09671544B2
公开(公告)日：2017-06-06
申请号：US15030683
申请日：2014-10-20
Applicant: KANEKA CORPORATION
Inventor： Ryutaro Mukai , Tomohiro Abo
IPC: G02F1/13363 , G02B5/30 , B29C55/06 , C08J5/18 , B29C55/04 , B29D11/00 , G02B1/111 , G02F1/1335 , B29K1/00 , B29L11/00
CPC classification number: G02B5/3083 , B29C55/04 , B29C55/06 , B29D11/00788 , B29K2001/08 , B29L2011/00 , C08J5/18 , C08J2301/00 , G02B1/111 , G02B5/305 , G02F1/133528 , G02F1/13363 , G02F2001/133541 , G02F2001/133635 , G02F2202/40 , G02F2413/13 , Y10T428/105
Abstract: The present invention achieves a phase difference film that is excellent in wavelength dispersion property, in-plane retardation, and film thickness, by using a polymeric material (i) which is composed of at least one type of cellulose derivative having a specific alkoxyl group substitution degree D1 and a specific 2-naphthoyl group substitution degree D2 and (ii) which has a specific total 2-naphthoyl group substitution degree D3.
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公开(公告)号：US10851180B2
公开(公告)日：2020-12-01
申请号：US15766265
申请日：2016-10-06
Applicant: KANEKA CORPORATION
Inventor： Ryutaro Mukai , Hiroto Koma , Takahiro Yasumoto , Katsuya Fujisawa , Tomohiro Abo
IPC: C08B15/05 , C08J5/18 , B29C55/06 , C08B13/00 , B29C55/00 , G02B5/30 , C08B3/08 , B29K1/00 , B29L31/34 , B29L11/00
Abstract: Provided is a polymer material containing at least one kind of a cellulose derivative having (a) an organosilyl group (the organosilyl group having a first aliphatic group, an unsaturated aliphatic group, or an aromatic group), and (b) an acyl group or a second aliphatic group.
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公开(公告)号：US10663621B2
公开(公告)日：2020-05-26
申请号：US15566960
申请日：2016-04-15
Applicant: KANEKA CORPORATION
Inventor： Hiroto Koma , Ryutaro Mukai , Tomohiro Abo
Abstract: The retardation film according to the present invention is characterized by: including a polymer material that includes at least one cellulose derivative which includes specific monomer units: having an in-plane retardation Re(550) of 105-160 nm, reverse wavelength dispersion property, Re(450)/Re(550), of 0.80-0.89, and a thickness of 20-50 μm; and containing inorganic particles. In particular, the present invention exhibits the effect of reducing the photoelastic coefficient.
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6.发明授权Polyamic acid, polyimide, polyamic acid solution, and use of polyimide 有权聚酰胺酸，聚酰亚胺，聚酰胺酸溶液，以及聚酰亚胺的用途公开(公告)号：US09353223B2
公开(公告)日：2016-05-31
申请号：US14409126
申请日：2013-06-25
Applicant: KANEKA CORPORATION
Inventor： Mari Fujii , Shinji Ozawa , Tomohiro Abo
IPC: C08G73/10 , B29C41/24 , C08G73/16 , C08G69/00 , C09D179/08
CPC classification number: C08G73/1042 , C08G69/00 , C08G73/1053 , C08G73/1082 , C08G73/16 , C09D179/08
Abstract: The object of the present invention is to obtain the polyimide and the polyamic acid excellent in heat resistance, low thermal expansion property, and transparency and achieve low birefringence and to provide a product or a member, demanded to have high heat resistance and transparency, by using the polyimide or the polyamic acid. In particular, the object is to provide a product and a member in which the polyimide or the polyamic acid of the present invention is formed on a surface of an inorganic substance such as glass, metal, a metal oxide, or a single crystal silicon. The objects are attained by introducing a rigid structure and an alicyclic structure into a skeleton and using a monomer having a fluorene skeleton together.
Abstract translation: 本发明的目的是获得耐热性，低热膨胀性和透明性优异的聚酰亚胺和聚酰胺酸，并且实现低双折射并提供要求具有高耐热性和透明性的产品或部件，通过 使用聚酰亚胺或聚酰胺酸。 特别是，本发明的目的在于提供一种在玻璃，金属，金属氧化物或单晶硅等无机物质的表面上形成本发明的聚酰亚胺或聚酰胺酸的物质和成分。 通过将刚性结构和脂环结构引入骨架并使用具有芴骨架的单体在一起来实现。
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