-
公开(公告)号：US10656098B2
公开(公告)日：2020-05-19
申请号：US15279053
申请日：2016-09-28
Applicant: KLA-Tencor Corporation
Inventor： Shiyu Zhang
Abstract: Imaging objectives and inspection systems equipped with such imaging objectives are disclosed. The imaging objective may include a front objective configured to produce a diffraction limited intermediate image. The imaging objective may also include a relay configured to receive the intermediate image produced by the front objective. The relay may include three spherical mirrors positioned to deliver a projection of the intermediate image to a fixed image plane.
-
公开(公告)号：US10309907B2
公开(公告)日：2019-06-04
申请号：US15055292
申请日：2016-02-26
Applicant: KLA-Tencor Corporation
Inventor： Shiyu Zhang , Wei Zhao
Abstract: Disclosed are methods and apparatus for reflecting, towards a sensor, an Infrared to vacuum ultra-violet (VUV) light that is reflected from a target substrate. The system includes a first mirror arranged to receive and reflect the Infrared to VUV light that is reflected from the target substrate and a second mirror arranged to receive and reflect Infrared to VUV light that is reflected by the first mirror. The first and second mirrors are arranged and shaped so as to reflect Infrared to VUV light from the target substrate towards an optical axis of the apparatus. In another embodiment, the apparatus can also include a third mirror arranged to receive and reflect the Infrared to VUV light that is reflected by the second mirror and a fourth mirror arranged to receive and reflect such illuminating light that is reflected by the third mirror towards the sensor. In one more embodiment, a reflecting or refracting optics is used to relay the image by above optics to the sensor; various magnification is achieved by adjusting the distance between the intermediate image and the relay optics.
-
公开(公告)号：US10916462B2
公开(公告)日：2021-02-09
申请号：US16059184
申请日：2018-08-09
Applicant: KLA-Tencor Corporation
Inventor： Timothy Russin , Shiyu Zhang , Charles Amsden , Daniel Kapp
Abstract: A method of focusing includes irradiating an object by directing radiation output by a radiating source through an objective lens, measuring a first intensity of reflected radiation that is reflected from the object, adjusting a distance between the objective lens and the object, measuring a second intensity of reflected radiation, and analyzing the first intensity of reflected radiation and the second intensity of reflected radiation to determine a focal distance between the objective lens and the object. The distance between the objective lens and the object is adjusted to the focal distance and the irradiating intensity is increased to mark the object. In another example, measuring the first intensity of reflected radiation is performed by directing reflected radiation from the object through the objective lens, a beam splitter, a focusing lens, and a pinhole and onto a sensor that outputs a signal indicative of sensed radiation intensity.
-
公开(公告)号：US20170219807A1
公开(公告)日：2017-08-03
申请号：US15279053
申请日：2016-09-28
Applicant: KLA-Tencor Corporation
Inventor： Shiyu Zhang
CPC classification number: G02B17/0828 , G01N21/9501 , G02B13/22 , G02B17/004 , G02B17/0892 , G02B17/0896 , G02B21/04
Abstract: Imaging objectives and inspection systems equipped with such imaging objectives are disclosed. The imaging objective may include a front objective configured to produce a diffraction limited intermediate image. The imaging objective may also include a relay configured to receive the intermediate image produced by the front objective. The relay may include three spherical mirrors positioned to deliver a projection of the intermediate image to a fixed image plane.
-
Patent Agency Ranking
5.发明申请公开(公告)号：US20160258878A1
公开(公告)日：2016-09-08
申请号：US15055292
申请日：2016-02-26
Applicant: KLA-Tencor Corporation
Inventor： Shiyu Zhang , Wei Zhao
CPC classification number: G01N21/8806 , G01N21/9501 , G01N21/956 , G01N2021/8845 , G02B13/143 , G02B17/0652 , G03F1/84 , G03F7/7065
Abstract: Disclosed are methods and apparatus for reflecting, towards a sensor, an Infrared to vacuum ultra-violet (VUV) light that is reflected from a target substrate. The system includes a first mirror arranged to receive and reflect the Infrared to VUV light that is reflected from the target substrate and a second mirror arranged to receive and reflect Infrared to VUV light that is reflected by the first mirror. The first and second mirrors are arranged and shaped so as to reflect Infrared to VUV light from the target substrate towards an optical axis of the apparatus. In another embodiment, the apparatus can also include a third mirror arranged to receive and reflect the Infrared to VUV light that is reflected by the second mirror and a fourth mirror arranged to receive and reflect such illuminating light that is reflected by the third mirror towards the sensor. In one more embodiment, a reflecting or refracting optics is used to relay the image by above optics to the sensor; various magnification is achieved by adjusting the distance between the intermediate image and the relay optics.
Abstract translation: 公开了一种用于向传感器反射从目标衬底反射的红外到真空紫外（VUV）光的方法和装置。 该系统包括：第一反射镜，被布置成接收和反射从目标基板反射的红外到VUV光;以及第二反射镜，布置成将红外接收并反射到由第一反射镜反射的VUV光。 第一和第二反射镜被布置和成形为将红外线反射到来自目标基板的VUV光朝向装置的光轴。 在另一个实施例中，该装置还可以包括第三反射镜，其布置成接收和反射由第二反射镜反射的红外至VUV光，第四反射镜被布置成接收和反射由第三反射镜反射的照明光朝向 传感器。 在另一个实施例中，使用反射或折射光学器件将上述光学器件的图像中继到传感器; 通过调整中间图像和中继光学器件之间的距离来实现各种放大倍率。
-
公开(公告)号：US09423357B2
公开(公告)日：2016-08-23
申请号：US14288622
申请日：2014-05-28
Applicant: KLA-Tencor Corporation
Inventor： Shiyu Zhang , Charles N. Wang , Yevgeniy Churin , Yong-Mo Moon , Hyoseok Daniel Yang , Mark S. Wang
CPC classification number: G01N21/8806 , G01N21/9501
Abstract: One embodiment relates to an oblique illuminator. The oblique illuminator includes a light source emitting a light beam, a first reflective surface, and a second reflective surface. The first reflective surface has a convex cylindrical shape with a projected parabolic profile along the non-powered direction which is configured to reflect the light beam from the light source and which defines a focal line. The second reflective surface has a concave cylindrical shape with a projected elliptical profile which is configured to reflect the light beam from the first reflective surface and which defines first and second focal lines. The focal line of the first reflective surface is coincident with the first focal line of the second reflective surface. The first and second focal lines of the second reflective surface may be a same line in which case the elliptical curvature is a projected spherical profile. Other embodiments, aspects and features are also disclosed.
Abstract translation: 一个实施例涉及一种倾斜照明器。 倾斜照明器包括发射光束的光源，第一反射表面和第二反射表面。 第一反射表面具有凸起的圆柱形形状，具有沿着非供电方向的投影抛物线轮廓，其被配置为反射来自光源的光束并且限定焦线。 第二反射表面具有凹入的圆柱形形状，其具有突出的椭圆形轮廓，其被配置为反射来自第一反射表面的光束并且限定第一和第二焦线。 第一反射面的焦线与第二反射面的第一焦线重合。 第二反射表面的第一和第二焦线可以是相同的线，在这种情况下，椭圆曲率是投影的球形轮廓。 还公开了其它实施例，方面和特征。
-
公开(公告)号：US10823943B2
公开(公告)日：2020-11-03
申请号：US16165842
申请日：2018-10-19
Applicant: KLA-Tencor Corporation
Inventor： Shiyu Zhang , Ilya Bezel
Abstract: A plasma light source with lamp house correction is disclosed. The system may include a pump source configured to generate pump illumination. The pump illumination may be directed, by an elliptical reflector element, to a volume of gas contained within a plasma lamp in order to generate a plasma. The plasma may be configured to generate broadband illumination. The system may also include a correction plate and/or an aspherical elliptical reflector element configured to alter the pump illumination to correct for aberrations introduced by the plasma lamp. The system may also include an additional aspherical correction plate configured to alter the broadband illumination to correct for aberrations introduced by optical elements of the system.
-
公开(公告)号：US20200041774A1
公开(公告)日：2020-02-06
申请号：US16165842
申请日：2018-10-19
Applicant: KLA-Tencor Corporation
Inventor： Shiyu Zhang , Ilya Bezel
Abstract: A plasma light source with lamp house correction is disclosed. The system may include a pump source configured to generate pump illumination. The pump illumination may be directed, by an elliptical reflector element, to a volume of gas contained within a plasma lamp in order to generate a plasma. The plasma may be configured to generate broadband illumination. The system may also include a correction plate and/or an aspherical elliptical reflector element configured to alter the pump illumination to correct for aberrations introduced by the plasma lamp. The system may also include an additional aspherical correction plate configured to alter the broadband illumination to correct for aberrations introduced by optical elements of the system.
-
公开(公告)号：US20190122912A1
公开(公告)日：2019-04-25
申请号：US16059184
申请日：2018-08-09
Applicant: KLA-Tencor Corporation
Inventor： Timothy Russin , Shiyu Zhang , Charles Amsden , Daniel Kapp
Abstract: A method of focusing includes irradiating an object by directing radiation output by a radiating source through an objective lens, measuring a first intensity of reflected radiation that is reflected from the object, adjusting a distance between the objective lens and the object, measuring a second intensity of reflected radiation, and analyzing the first intensity of reflected radiation and the second intensity of reflected radiation to determine a focal distance between the objective lens and the object. The distance between the objective lens and the object is adjusted to the focal distance and the irradiating intensity is increased to mark the object. In another example, measuring the first intensity of reflected radiation is performed by directing reflected radiation from the object through the objective lens, a beam splitter, a focusing lens, and a pinhole and onto a sensor that outputs a signal indicative of sensed radiation intensity.
-
-
-
-
-
-
-
-
Search Results
9
records
(took 0.013 seconds)
