Process for the production of a monolithic integrated optical device
incorporating a semiconductor laser and device obtained by this process
    1.
    发明授权
    Process for the production of a monolithic integrated optical device incorporating a semiconductor laser and device obtained by this process 失效
    包含半导体激光器的单片集成光学器件的制造方法以及通过该方法获得的器件

    公开(公告)号:US4720468A

    公开(公告)日:1988-01-19

    申请号:US800601

    申请日:1985-11-13

    摘要: Process for the production of a monolithic integrated optical device incorporating a semiconductor laser and an optical waveguide, as well as to a device obtained by this process.The substrate is given a profile having at least one step. On said substrate is deposited by a single epitaxy operation performed in the vapour phase and in a successive manner a first confinement layer, a guidance layer made from a material transparent for the radiation emitted by the laser, a second confinement layer, an active layer, a third confinement layer and a contact layer. The transparent material has a refractive index higher than the indices of the confinement layers surrounding the same. Thickness values are given to the different layers such that the active layer of the lower stack faces the transparent layer of the upper stack.Application to optical telecommunications.

    摘要翻译: PCT No.PCT / FR85 / 00067 Sec。 371日期:1985年11月13日 102(e)1985年11月13日PCT PCT公布1985年3月29日PCT公布。 公开号WO85 / 04491 1985年10月10日。用于生产包含半导体激光器和光波导的单片集成光学器件的方法以及通过该方法获得的器件。 给予衬底具有至少一个步骤的轮廓。 在所述衬底上通过在气相中以连续方式执行的单次外延操作沉积第一限制层,由对于由激光器发射的辐射透明的材料制成的引导层,第二限制层,活性层, 第三限制层和接触层。 透明材料的折射率高于围绕其的限制层的折射率。 厚度值被赋予不同的层,使得下堆叠的活性层面向上堆叠的透明层。 应用于光通信。

    Method of manufacturing a semiconductor structure suitable for producing
a multi-wavelength laser effect
    2.
    发明授权
    Method of manufacturing a semiconductor structure suitable for producing a multi-wavelength laser effect 失效
    制造适于产生多波长激光效应的半导体结构的方法

    公开(公告)号:US4925811A

    公开(公告)日:1990-05-15

    申请号:US224879

    申请日:1988-06-30

    摘要: A double heterostructure stack comprising confinement layers (CC) enclosing active layers (CA) is formed on a substrate (S), e.g. a N+ type gallium arsenide substrate. Selective etching is performed so as to lay bare the confinement layers at different depths, e.g. CC4, CC3, CC2. The confinement layers initially receive contact layers (CP) made of P-type gallium arsenide. Regions R1, R2, and R3 are formed through the contact layers to constitute junctions with the uppermost active layers (respectively CA1, CA2, CA3). Valleys (V10, V21, V32) are formed to isolate the above-defined elementary stacks. After a metal contact layer has been formed, and after the end surfaces have been optically prepared, a multi-wavelength laser device is obtained.

    摘要翻译: PCT No.PCT / FR87 / 00414 Sec。 371日期:1988年6月30日 102(e)1988年6月30日PCT PCT。于1987年10月23日提交。包含有源层(CA)的限制层(CC)的双异质结构叠层形成在衬底(S)上。 一种N +型砷化镓衬底。 执行选择性蚀刻,以便将限制层放置在不同的深度,例如, CC4,CC3,CC2。 限制层最初接收由P型砷化镓制成的接触层(CP)。 区域R1,R2和R3通过接触层形成,以与最上面的活性层(分别为CA1,CA2,CA3)形成结。 形成Valleys(V10,V21,V32)以隔离上述基本堆叠。 在形成金属接触层之后,并且在端面已经被光学制备之后,获得多波长激光器件。

    Multi-wavelength laser-emitting component
    3.
    发明授权
    Multi-wavelength laser-emitting component 失效
    多波长激光发射元件

    公开(公告)号:US5930278A

    公开(公告)日:1999-07-27

    申请号:US789846

    申请日:1997-01-28

    申请人: Louis Menigaux

    发明人: Louis Menigaux

    摘要: A multi-wavelength laser-emitting component presenting a plurality of Bragg grating laser-emitting sources, wherein the Bragg gratings of said sources correspond to a diffraction grating common to the various sources, with the pitch thereof varying continuously from one source to another.

    摘要翻译: 呈现多个布拉格光栅激光发射源的多波长激光发射部件,其中所述光源的布拉格光栅对应于各种光源共用的衍射光栅,其间距从一个光源连续变化到另一个源。

    Process for forming a structure with integrated optical waveguide and
mirror, and structure obtained
    4.
    发明授权
    Process for forming a structure with integrated optical waveguide and mirror, and structure obtained 失效
    用于形成具有集成光波导和反射镜的结构的方法,以及获得的结构

    公开(公告)号:US5373570A

    公开(公告)日:1994-12-13

    申请号:US93814

    申请日:1993-07-19

    CPC分类号: G02B6/12004 G02B6/131

    摘要: The invention relates to a process for producing a structure with integrated optical waveguide and mirror, comprising the stages consisting in:etching a substrate to form an inclined plane on the substrate,depositing by epitaxy, on the face of the substrate carrying the inclined plane, various layers of materials capable of forming an optical waveguide,clearing away the substrate, via its face opposite the epitaxed layers, up to the inclined plane, to form a mirror capable of reflecting light from the optical waveguide in a given direction.

    摘要翻译: 本发明涉及一种用于制造具有集成光波导和反射镜的结构的方法,其包括以下步骤:蚀刻基板以在基板上形成倾斜平面,通过外延沉积在承载倾斜平面的基板的表面上, 能够形成光波导的各种材料层,通过其与上述表面相对的面清除基板直到倾斜平面,以形成能够沿给定方向反射来自光波导的光的反射镜。

    Process for manufacturing a semiconductor laser having a buried ribbon
    5.
    发明授权
    Process for manufacturing a semiconductor laser having a buried ribbon 失效
    具有掩埋带的半导体激光器的制造方法

    公开(公告)号:US4648940A

    公开(公告)日:1987-03-10

    申请号:US806802

    申请日:1985-12-10

    摘要: Process for manufacturing a semiconductor laser having a buried ribbon. After making a double heterostructure (2, 3, 4, 5) on a substrate (1), there is implanted in the contact layer (5) a p-type doping material, which has the effect of rendering it amorphous. The unit, except for a ribbon, is etched which leaves a mesa. A resumption of epitaxy makes it possible to bury the channel. This resumption does not lead to a crystalline growth on the upper surface of the contact layer, although the annealing that takes place during the resumption of epitaxy gives good ohmic contacts at the level of the implanted layer.

    摘要翻译: 具有掩埋带的半导体激光器的制造方法。 在衬底(1)上制造双异质结构(2,3,4,5)之后,在接触层(5)中注入p型掺杂材料,其具有使其变为无定形的效果。 除了丝带之外,该单元被蚀刻,留下台面。 恢复外延使得可以掩埋通道。 这种恢复不会导致接触层的上表面上的结晶生长,尽管在恢复外延期间发生的退火在注入层的水平上产生良好的欧姆接触。

    Method of producing a quasi-flat semiconductor device capable of a
multi-wavelength laser effect and the corresponding device
    8.
    发明授权
    Method of producing a quasi-flat semiconductor device capable of a multi-wavelength laser effect and the corresponding device 失效
    制造能够具有多波长激光效果的准平面半导体器件的方法及相应的器件

    公开(公告)号:US5039627A

    公开(公告)日:1991-08-13

    申请号:US466591

    申请日:1990-01-17

    IPC分类号: H01L33/00 H01S5/40

    摘要: A method of producing a quasi-flat semiconductor device capable of a multi-wavelength laser effect and the device thus produced.On the basis of a double heterostructure stack supported by a substrate comprising steps, following levelling of the stack and diffusion through a flat surface, a semiconductor device is obtained which is capable of a multi-wavelength laser effect, of which the different junctions are situated in a plane parallel with the base of the substrate.

    摘要翻译: 一种能够产生多波长激光效应的准平面半导体器件的制造方法和由此制造的器件。 基于由包括步骤的基板支撑的双异质结构叠层,在堆叠的平整化和通过平坦表面扩散之后,获得能够具有多波长激光效应的半导体器件,其中不同的连接点位于 在与基板的基部平行的平面内。

    Process for producing a structure integrating a cleaved optical guide
with an optical fibre support for a guide-fibre optical coupling
    9.
    发明授权
    Process for producing a structure integrating a cleaved optical guide with an optical fibre support for a guide-fibre optical coupling 失效
    用于制造将切割的光导与光导纤维光耦合的光纤支架相结合的结构的方法

    公开(公告)号:US5518965A

    公开(公告)日:1996-05-21

    申请号:US273435

    申请日:1994-07-11

    摘要: In a process for producing integrated structures having at least one cleaved optical guide, the following are successively epitaxied onto a planar surface of a monocrystalline substrate parallel to a plane of the substrate having crystal orientation : an etching barrier layer for the substrate, a lower optical confinement layer, an active layer and an upper optical confinement layer. Then, the epitaxied layers are etched to form an optical guide strip having a portion oriented parallel to a first direction of crystal orientation of the substrate.

    摘要翻译: 在用于制造具有至少一个切割光导的集成结构的方法中,将下列连续地表面地平行于具有晶体取向<1,0,0>的基板的平面的单晶基板的平坦表面上:蚀刻阻挡层 用于基板,下部光限制层,有源层和上部光限制层。 然后,对所述表面层进行蚀刻以形成具有平行于所述衬底的晶体取向的第一方向的部分的导光条。

    Optoelectronic device with integrated optical guide and photo-detector.
    10.
    发明授权
    Optoelectronic device with integrated optical guide and photo-detector. 失效
    带集成光导和光电检测器的光电器件。

    公开(公告)号:US5261014A

    公开(公告)日:1993-11-09

    申请号:US939614

    申请日:1992-09-02

    CPC分类号: G02B6/42 G02B6/12004 G02B6/34

    摘要: An optoelectronic device having an optical guide and photodetector integrated on a common substrate is provided with a light coupling means for increasing the absorption of light within the photodetector. This means consists of freeing the lower portion of the guide layer--opposite the photodetector--to bring it into contact with air. The use of air has the effect of repelling the light propagating through the guide layer towards the absorbent layer of the photodetector thereby increasing the photodetector efficiency.

    摘要翻译: 具有集成在公共基板上的光导和光电检测器的光电子器件设置有用于增加光检测器内的光的吸收的光耦合装置。 这意味着释放引导层的与光电检测器相对的下部,以使其与空气接触。 使用空气具有将通过引导层传播的光朝向光电检测器的吸收层排斥的作用,从而增加了光电检测器的效率。